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1. 发明授权

US6014401A Device for controlling a laser source with multiple laser units for the energy and spatial optimization of a laser surface treatment 失效
标题翻译：用于控制具有多个激光单元的激光源用于激光表面处理的能量和空间优化的装置
公开(公告)号：US6014401A
公开(公告)日：2000-01-11
申请号：US11455
申请日：1998-01-22
申请人： Bruno Godard , Marc Stehle
发明人： Bruno Godard , Marc Stehle
IPC分类号： B23K26/00 , B23K26/06 , H01L31/04 , H01S3/00 , H01S3/23 , H01S3/082
CPC分类号： H01S3/2316 , B23K26/066 , H01S3/2383
摘要： A laser source has two or more laser units and coupling means for coupling the laser beams from each unit so as to deliver a resulting beam for treating a surface. Concurrently with the laser surface treatment, the characteristics of the laser beam from each unit are adjusted to produce a resulting laser beam with a time profile of energy optimally adapted to said laser surface treatment. Homogenizing means homogenize the energy distribution of the resulting laser beam, so that the energy and spatial distribution of said resulting laser beam are concurrently adapted for the selected surface treatment.
摘要翻译： PCT No.PCT / FR96 / 01060 Sec。 371日期：1998年1月22日 102（e）1998年1月22日PCT PCT 1996年7月5日PCT公布。出版物WO97 / 07578 日期1997年2月27日激光源具有两个或更多个激光单元和用于耦合来自每个单元的激光束的耦合装置，以便输送用于处理表面的所得光束。与激光表面处理同时，调整来自每个单元的激光束的特性，以产生最终适合于所述激光表面处理的能量时间分布的所得激光束。均匀化装置使得到的激光束的能量分布均匀化，使得所得到的激光束的能量和空间分布同时适用于所选择的表面处理。

2. 发明授权

US4112391A Gas laser generator 失效
标题翻译：气体激光发生器
公开(公告)号：US4112391A
公开(公告)日：1978-09-05
申请号：US713946
申请日：1976-08-12
申请人： Bruno Godard
发明人： Bruno Godard
IPC分类号： H01S3/03 , H01S3/097 , H01S3/0973 , H01S3/00
CPC分类号： H01S3/0973
摘要： The invention relates to a gas laser generator. This generator comprises two flat energization lines having the shape of arcs of a half parabola, these lines being in electrical continuity along a common segment connecting the merged focusses of the half parabola arcs and a joint situated near the apexes of the half parabola arcs. Application to nitrogen laser generators.
摘要翻译：本发明涉及一种气体激光发生器。该发生器包括具有半抛物线弧形形状的两个平坦通电线，这些线沿着连接半抛物线弧的合并聚焦的公共部分和位于半抛物线弧的顶点附近的接头处于电连续性。应用于氮激光发生器。

3. 发明授权

US4259617A Device for producing an electric discharge in a flat-plate transmission line 失效
标题翻译：用于在平板传输线中产生放电的装置
公开(公告)号：US4259617A
公开(公告)日：1981-03-31
申请号：US46129
申请日：1979-06-06
申请人： Bruno Godard
发明人： Bruno Godard
IPC分类号： H01S3/038 , H01S3/0973 , H01T2/02 , H01S3/09
CPC分类号： H01T2/02 , H01S3/0973
摘要： A device for producing an electric discharge in a flat-plate transmission line.The device includes at least a first electrode (8), a second electrode (9) opposite the first electrode and passing through a hole (5) in the transmission line (1). With this arrangement it is possible to avoid deposits of metal particles building up on the edges of the hole and eventually shorting together opposite sides of the transmission line.Such flat-plate transmission lines are used in particular in nitrogen laser generators.
摘要翻译：一种用于在平板传输线中产生放电的装置。该装置至少包括第一电极（8），与第一电极相对并通过传输线（1）中的孔（5）的第二电极（9）。通过这种布置，可以避免沉积在孔的边缘上的金属颗粒沉积并最终使传输线的相对侧短路。这种平板传输线特别用于氮激光发生器。

4. 发明授权

US09396944B2 Method and apparatus for forming a straight line projection on a semiconductor substrate 有权
标题翻译：在半导体衬底上形成直线投影的方法和装置
公开(公告)号：US09396944B2
公开(公告)日：2016-07-19
申请号：US14007953
申请日：2012-03-28
申请人： Bruno Godard , Jean-Blaise Migozzi
发明人： Bruno Godard , Jean-Blaise Migozzi
IPC分类号： H01L21/00 , H01L21/02 , G02B19/00 , B23K26/00 , H01L21/268
CPC分类号： H01L21/02691 , B23K26/0006 , B23K26/354 , B23K2103/56 , G02B19/0023 , G02B19/0028 , G02B19/0047 , H01L21/268
摘要： An apparatus for irradiating a semiconductor is disclosed. The apparatus has a curved mirror with a reflective surface of revolution, and a point source generating an irradiation beam being incident on the curved mirror along an incident direction. The curved mirror and the point source form a system having an axis of revolution wherein the point source is provided on or near said axis of revolution. The axis of revolution substantially coincides with a straight line projection to be generated on a semiconductor substrate. Additionally, the use of such an apparatus for manufacturing a selective emitter grid, or for irradiating a large area semiconductor surface in a scanning movement, is disclosed.
摘要翻译：公开了一种照射半导体的装置。该装置具有具有反射旋转表面的曲面镜，以及产生沿入射方向入射在曲面镜上的照射光束的点光源。曲面镜和点光源形成具有旋转轴线的系统，其中点光源设置在所述旋转轴线上或附近。旋转轴线基本上与在半导体衬底上产生的直线投影一致。此外，公开了使用这种用于制造选择性发射极栅格的装置或用于在扫描运动中照射大面积半导体表面的装置。

5. 发明申请

US20120171876A1 METHOD AND APPARATUS FOR IRRADIATING A SEMICONDUCTOR MATERIAL SURFACE BY LASER ENERGY 有权
标题翻译：激光能量辐射半导体材料表面的方法和装置
公开(公告)号：US20120171876A1
公开(公告)日：2012-07-05
申请号：US13263219
申请日：2010-03-29
申请人： Julien Venturini , Bruno Godard , Cyril Dutems , Marc Bucchia
发明人： Julien Venturini , Bruno Godard , Cyril Dutems , Marc Bucchia
IPC分类号： H01L21/268 , H05B7/18
CPC分类号： B23K26/352 , B23K26/0006 , B23K26/04 , B23K26/073 , B23K26/08 , B23K26/40 , B23K2101/40 , B23K2103/50 , B23K2103/56 , G03F7/70383 , H01L21/02354 , H01L21/02678 , H01L21/268 , H01L23/5258
摘要： A method for irradiating semiconductor material is provided which includes selecting a region of a semiconductor layer surface, irradiating the region with an excimer laser which has a beam spot size, and adjusting the beam spot size to match the selected region size. Further, an apparatus for irradiating semiconductor material is provided. The apparatus includes an excimer laser for irradiating a selected region of a semiconductor layer surface, the laser has a laser beam spot size, and a system for adjusting the laser beam spot size to match the selected region size.
摘要翻译：提供了一种用于照射半导体材料的方法，其包括选择半导体层表面的区域，用具有束斑大小的准分子激光器照射该区域，并且调整束斑大小以匹配所选择的区域尺寸。此外，提供了一种用于照射半导体材料的设备。该装置包括用于照射半导体层表面的选定区域的激光准分子激光器，激光器具有激光束光斑尺寸，以及用于调整激光束光点尺寸以匹配所选择的区域尺寸的系统。

6. 发明授权

US6055346A Fibre optic device for homogenizing a laser beam 失效
标题翻译：用于使激光束均匀化的光纤装置
公开(公告)号：US6055346A
公开(公告)日：2000-04-25
申请号：US111
申请日：1998-01-23
申请人： Bruno Godard , Robert Stehle
发明人： Bruno Godard , Robert Stehle
IPC分类号： B23K26/00 , B23K26/06 , G02B3/00 , G02B7/02 , G02B15/00 , G02B27/09 , G02B6/32
CPC分类号： G02B27/0961 , B23K26/0604 , B23K26/066 , G02B27/09 , G02B27/0905
摘要： An optical device for homogenizing a laser beam includes a plurality of abutting front lenses (LF.sub.nm) for dividing the laser beam to be homogenized into m.times.n laser beams, each having a substantially uniform cross section, and a substantially homogeneous energy distribution; a first intermediate plane (PI1) located in the focal plane of the front lenses (LF.sub.mn) and having a plurality of entrance pupils (PE.sub.ij) each of which is arranged at the focus of a front lens (LF.sub.mn) selected among said plurality of front lenses (LF.sub.mn); a second intermediate plane (PI2) having a plurality of exit pupils (PS.sub.ij), a collection lens (LC) capable of collecting the beams from the plurality of exit pupils (PS.sub.ij); and optical transmission means for individually transmitting the light beams from the plurality of entrance pupils (PS.sub.ij) to the plurality of exit pupils (PS.sub.kj).
摘要翻译： PCT No.PCT / FR96 / 01252 Sec。 371日期1998年1月23日 102（e）日期1998年1月23日PCT提交1996年8月6日PCT公布。公开号WO97 / 07424 日期1997年2月27日激光束均匀化的光学装置包括多个邻接的前透镜（LFnm），用于将待均匀的激光束分成m×n个激光束，每个激光束具有基本上均匀的横截面，并且基本均匀的能量分布 ; 位于前透镜（LFmn）的焦平面中的第一中间平面（PI1），并且具有多个入射光瞳（PEij），每个入射光瞳被布置在从所述多个前视镜中选择的前透镜（LFmn）的焦点处镜头（LFmn）; 具有多个出射光瞳（PSij）的第二中间平面（PI2），能够收集来自多个出射瞳孔（PSij）的光束的收集透镜（LC）; 以及光传输装置，用于将来自多个入射光瞳（PSij）的光束单独传输到多个出射光瞳（PSkj）。

7. 发明授权

US4011525A Gas laser generator 失效
标题翻译：气体激光发生器
公开(公告)号：US4011525A
公开(公告)日：1977-03-08
申请号：US645775
申请日：1975-12-31
申请人： Bruno Godard
发明人： Bruno Godard
IPC分类号： H01S3/03 , H01S3/097 , H01S3/0973 , H01S3/22
CPC分类号： H01S3/0973
摘要： Gas laser generator comprising a gaseous active medium, at least one electric excitation line formed by an insulating plate inserted between a first and second metallic plate, the first plate having a slot enclosing the gaseous medium, a circuit for setting up a progressive current wave in the line. The plates are cut in the shape of superimposed half parabolas. A variant consists in producing the generator in the form of two half parabolas such as above but insulated from each other and brought to different potentials. The invention is implemented in high-power lasers.
摘要翻译：气体激光发生器，其包括气体活性介质，至少一个电绝缘板形成的电激励线，该绝缘板插入在第一和第二金属板之间，第一板具有封闭气体介质的槽，用于设置逐行电流波的电路线。板被切成叠加的半抛物线的形状。一种变型包括以如上所述的两个半抛物线的形式生产发生器，但彼此绝缘并带来不同的电位。本发明在大功率激光器中实现。

8. 发明授权

US09779945B2 Method and apparatus for irradiating a semiconductor material surface by laser energy 有权
公开(公告)号：US09779945B2
公开(公告)日：2017-10-03
申请号：US13580902
申请日：2011-02-21
申请人： Hervé Besaucèle , Bruno Godard , Cyril Dutems
发明人： Hervé Besaucèle , Bruno Godard , Cyril Dutems
IPC分类号： G21K5/04 , H01L21/04 , B23K26/06 , B23K26/067 , B23K26/073 , G02B27/09 , B23K26/066 , H01L21/268
CPC分类号： H01L21/04 , B23K26/0608 , B23K26/066 , B23K26/0673 , B23K26/073 , G02B27/0955 , H01L21/268
摘要： An apparatus for irradiating semiconductor material is disclosed having, a laser generating a primary laser beam, an optical system and a means for shaping the primary laser beam, comprising a plurality of apertures for shaping the primary laser beam into a plurality of secondary laser beams. Wherein the shape and/or size of the individual apertures corresponds to that of a common region of a semiconductor material layer to be irradiated. The optical system is adapted for superposing the secondary laser beams to irradiate said common region. Further, the use of such an apparatus in semiconductor device manufacturing is disclosed.

9. 发明授权

US09700959B2 Method and apparatus for irradiating a semiconductor material surface by laser energy 有权
公开(公告)号：US09700959B2
公开(公告)日：2017-07-11
申请号：US13263219
申请日：2010-03-29
申请人： Julien Venturini , Bruno Godard , Cyril Dutems , Marc Bucchia
发明人： Julien Venturini , Bruno Godard , Cyril Dutems , Marc Bucchia
IPC分类号： H01L21/02 , B23K26/00 , H01L21/268 , B23K26/04 , B23K26/073 , B23K26/08 , G03F7/20 , B23K26/40 , H01L23/525 , B23K101/40 , B23K103/00
CPC分类号： B23K26/352 , B23K26/0006 , B23K26/04 , B23K26/073 , B23K26/08 , B23K26/40 , B23K2101/40 , B23K2103/50 , B23K2103/56 , G03F7/70383 , H01L21/02354 , H01L21/02678 , H01L21/268 , H01L23/5258
摘要： A method for irradiating semiconductor material is provided which includes selecting a region of a semiconductor layer surface, irradiating the region with an excimer laser which has a beam spot size, and adjusting the beam spot size to match the selected region size. Further, an apparatus for irradiating semiconductor material is provided. The apparatus includes an excimer laser for irradiating a selected region of a semiconductor layer surface, the laser has a laser beam spot size, and a system for adjusting the laser beam spot size to match the selected region size.

10. 发明申请

US20140080323A1 METHOD AND APPARATUS FOR FORMING A STRAIGHT LINE PROJECTION ON A SEMICONDUCTOR SUBSTRATE 有权
标题翻译：在半导体基板上形成直线投影的方法和装置
公开(公告)号：US20140080323A1
公开(公告)日：2014-03-20
申请号：US14007953
申请日：2012-03-28
申请人： Bruno Godard , Jean-Blaise Migozzi
发明人： Bruno Godard , Jean-Blaise Migozzi
IPC分类号： H01L21/02 , B23K26/00
CPC分类号： H01L21/02691 , B23K26/0006 , B23K26/354 , B23K2103/56 , G02B19/0023 , G02B19/0028 , G02B19/0047 , H01L21/268
摘要： An apparatus for irradiating a semiconductor is disclosed. The apparatus has a curved mirror with a reflective surface of revolution, and a point source generating an irradiation beam being incident on the curved mirror along an incident direction. The curved mirror and the point source form a system having an axis of revolution wherein the point source is provided on or near said axis of revolution. The axis of revolution substantially coincides with a straight line projection to be generated on a semiconductor substrate. Additionally, the use of such an apparatus for manufacturing a selective emitter grid, or for irradiating a large area semiconductor surface in a scanning movement, is disclosed.
摘要翻译：公开了一种照射半导体的装置。该装置具有具有反射旋转表面的曲面镜，以及产生沿入射方向入射在曲面镜上的照射光束的点光源。曲面镜和点光源形成具有旋转轴线的系统，其中点光源设置在所述旋转轴线上或附近。旋转轴线基本上与在半导体衬底上产生的直线投影一致。此外，公开了使用这种用于制造选择性发射极栅格的装置或用于在扫描运动中照射大面积半导体表面的装置。

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