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1. 发明授权

US08831767B2 Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool 有权
标题翻译：用于在抛光期间监测测量装置的参数的方法和系统，在抛光期间对样本的损坏或抛光垫或工具的特性
公开(公告)号：US08831767B2
公开(公告)日：2014-09-09
申请号：US13219607
申请日：2011-08-27
申请人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
发明人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
IPC分类号： G06F19/00 , B24B37/013 , B24B49/10 , B24B41/04 , B24B49/12 , B24B49/04 , B24B37/04
CPC分类号： B24B37/013 , B24B37/042 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12
摘要： Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, a characteristic of a polishing pad, or a characteristic of a polishing tool are provided. One method includes scanning a specimen with a measurement device during polishing of a specimen to generate output signals at measurement spots on the specimen. The method also includes determining if the output signals are outside of a range of output signals. Output signals outside of the range may indicate that a parameter of the measurement device is out of control limits. In a different embodiment, output signals outside of the range may indicate damage to the specimen. Another method includes scanning a polishing pad with a measurement device to generate output signals at measurement spots on the polishing pad. The method also includes determining a characteristic of the polishing pad from the output signals.
摘要翻译：提供了用于在抛光期间监测测量装置的参数的方法和系统，在抛光期间对样本的损坏，抛光垫的特性或抛光工具的特性。一种方法包括在样品抛光期间用测量装置扫描样品，以在样品上的测量点产生输出信号。该方法还包括确定输出信号是否在输出信号的范围之外。超出范围的输出信号可能表示测量设备的参数失控。在不同的实施例中，在该范围之外的输出信号可以指示对样本的损伤。另一种方法包括用测量装置扫描抛光垫以在抛光垫上的测量点产生输出信号。该方法还包括从输出信号确定抛光垫的特性。

2. 发明申请

US20090248341A1 PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA 失效
标题翻译：使用光信号系统优化信号标准的过程控制
公开(公告)号：US20090248341A1
公开(公告)日：2009-10-01
申请号：US12057346
申请日：2008-03-27
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
IPC分类号： G06F19/00
CPC分类号： G01B11/02 , G01B11/24 , G03F7/70625
摘要： Provided is system and method for controlling a fabrication cluster using at least one parameter of a structure measured with an optical metrology system designed and configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for standalone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a signal measured using the optical metrology system is transmitted to a fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了用于使用被设计和配置为满足一个或多个信号标准的光学测量系统测量的结构的至少一个参数来控制制造集群的系统和方法。通过使用收集的信号数据来比较设置一个或多个信号标准来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

3. 发明申请

US20090240537A1 APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERATING TIME BUDGET 审中-公开
标题翻译：设计用于操作时间预算的光学计量系统的设备
公开(公告)号：US20090240537A1
公开(公告)日：2009-09-24
申请号：US12050919
申请日：2008-03-18
申请人： XINKANG TIAN , EDRIC TONG , CHING-LING MENG , MIHAIL MIHALOV , MANUEL MADRIAGA
发明人： XINKANG TIAN , EDRIC TONG , CHING-LING MENG , MIHAIL MIHALOV , MANUEL MADRIAGA
IPC分类号： G06Q10/00 , G06F17/00
CPC分类号： G01B11/24 , G01B2210/56 , G03F7/70625 , G06Q10/0637 , H01L21/67253
摘要： Provided is an apparatus for designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to achieve a time budget for completing metrology process steps. The design of the optical metrology system is optimized by using collected operating data in comparison to the selected operating criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with fabrication clusters in semiconductor manufacturing.
摘要翻译：提供了一种用于设计用于测量工件上的结构的光学测量系统的设备，其中光学测量系统被配置为实现用于完成计量过程步骤的时间预算。通过使用收集的操作数据与选定的操作标准进行比较，优化了光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学测量系统与半导体制造中的制造集成集成。

4. 发明申请

US20090234687A1 METHOD OF DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED FOR OPERATING TIME BUDGET 审中-公开
标题翻译：设计用于操作时间预算的光学计量系统的方法
公开(公告)号：US20090234687A1
公开(公告)日：2009-09-17
申请号：US12050053
申请日：2008-03-17
申请人： XINKANG TIAN , EDRIC TONG , CHING-LING MENG , MIHAIL MIHALOV , MANUEL MADRIAGA
发明人： XINKANG TIAN , EDRIC TONG , CHING-LING MENG , MIHAIL MIHALOV , MANUEL MADRIAGA
IPC分类号： G06Q10/00 , G06F17/00
CPC分类号： G06Q10/04 , G03F7/70625 , G06Q10/06 , G06Q10/1093 , G06Q30/0206
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to achieve a time budget for completing metrology process steps. The design of the optical metrology system is optimized by using collected operating data in comparison to the selected operating criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with fabrication clusters in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为实现用于完成计量过程步骤的时间预算。通过使用收集的操作数据与选定的操作标准进行比较，优化了光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学测量系统与半导体制造中的制造集成集成。

5. 发明授权

US07420681B1 Gas purge system and methods 有权
标题翻译：气体净化系统和方法
公开(公告)号：US07420681B1
公开(公告)日：2008-09-02
申请号：US11457524
申请日：2006-07-14
申请人： Ning-Yi Wang , Ching-Ling Meng , Anthony Tang
发明人： Ning-Yi Wang , Ching-Ling Meng , Anthony Tang
IPC分类号： G01N21/00 , G01J4/00
CPC分类号： G01N21/211 , G01J3/02 , G01J3/0205 , G01J3/0286 , G01J3/447 , G01J4/00 , G01N21/15 , G01N21/8422 , G01N2021/151 , G01N2021/213
摘要： Gas purge systems and methods and a spectroscopic ellipsometer are disclosed. A purge gas system may include an input beam optics housing, a collection optics housing and a gas purge manifold. The input beam optics housing may include a first gas flow path between a first gas inlet and an aperture in a first nose cone proximate a measurement position. The collection optics housing may include a second gas flow path between a second gas inlet and an aperture in a second nose cone proximate the measurement position. The gas purge manifold may be disposed between the input beam optics housing and the collection optics housing. The gas purge manifold has a third gas flow path between a third gas inlet and an aperture in the gas manifold proximate the measurement position. The ellipsometer may include input beam optics in the input beam optics housing and collection optics in the collection optics housing. First, second, and third flows of purge gas may be supplied through the input beam optics housing, collection optics housing and gas purge manifold respectively. The purge gas is delivered directly to a measurement position of a surface of a substrate through the gas purge manifold, the first nosecone and the second nose cone.
摘要翻译：公开了气体吹扫系统和方法以及分光椭偏仪。吹扫气体系统可以包括输入光束光学器件壳体，收集光学器件壳体和气体吹扫歧管。输入光束光学器件壳体可以包括在第一气体入口和靠近测量位置的第一鼻锥中的孔之间的第一气体流动路径。收集光学器件壳体可以包括在第二气体入口和靠近测量位置的第二鼻锥中的孔之间的第二气体流动路径。气体吹扫歧管可以设置在输入光束光学器件壳体和收集光学器件壳体之间。气体吹扫歧管在靠近测量位置的第三气体入口和气体歧管中的孔之间具有第三气体流动路径。椭偏仪可以包括输入光束光学器件中的输入光束，并且在收集光学器件壳体中收集光学元件。吹扫气体的第一，第二和第三流动可以分别通过输入光束光学器件壳体，收集光学器件壳体和气体吹扫歧管提供。净化气体通过气体净化歧管，第一鼻锥和第二鼻锥直接输送到衬底的表面的测量位置。

6. 发明授权

US06935922B2 Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing 有权
标题翻译：用于在抛光期间在样品上的测量点的相对或绝对位置产生特征的二维图的方法和系统
公开(公告)号：US06935922B2
公开(公告)日：2005-08-30
申请号：US10358106
申请日：2003-02-04
申请人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
发明人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
IPC分类号： B24B37/04 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12 , B24D49/00
CPC分类号： B24B37/013 , B24B37/042 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12
摘要： Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing are provided. One method includes scanning a specimen with a measurement device during polishing to generate output signals at measurement spots on the specimen. The method may also include determining a characteristic of polishing at the measurement spots from the output signals. In addition, the method may include determining relative or absolute locations of the measurement spots on the specimen. The method may further include generating a two-dimensional map of the characteristic at the relative or absolute locations of the measurement spots on the specimen. In some embodiments, the relative locations of the measurement spots may be determined from a representative scan path of the measurement device and an average spacing between starting points on individual scans.
摘要翻译：提供了用于在抛光期间在样本上的测量点的相对或绝对位置处产生特征的二维图的方法和系统。一种方法包括在抛光期间用测量装置扫描样品，以在样品上的测量点产生输出信号。该方法还可以包括从输出信号确定测量点处的抛光特性。此外，该方法可以包括确定样本上的测量点的相对或绝对位置。该方法还可以包括在样本上的测量点的相对或绝对位置处生成特征的二维图。在一些实施例中，测量点的相对位置可以从测量装置的代表性扫描路径和单个扫描上的起始点之间的平均间隔来确定。

7. 发明申请

US20110313558A1 METHODS AND SYSTEMS FOR MONITORING A PARAMETER OF A MEASUREMENT DEVICE DURING POLISHING, DAMAGE TO A SPECIMEN DURING POLISHING, OR A CHARACTERISTIC OF A POLISHING PAD OR TOOL 有权
标题翻译：用于在抛光期间监测测量装置的参数的方法和系统，在抛光期间对样品的损害，或抛光抛光或工具的特性
公开(公告)号：US20110313558A1
公开(公告)日：2011-12-22
申请号：US13219607
申请日：2011-08-27
申请人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
发明人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
IPC分类号： G06F19/00
CPC分类号： B24B37/013 , B24B37/042 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12
摘要： Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, a characteristic of a polishing pad, or a characteristic of a polishing tool are provided. One method includes scanning a specimen with a measurement device during polishing of a specimen to generate output signals at measurement spots on the specimen. The method also includes determining if the output signals are outside of a range of output signals. Output signals outside of the range may indicate that a parameter of the measurement device is out of control limits. In a different embodiment, output signals outside of the range may indicate damage to the specimen. Another method includes scanning a polishing pad with a measurement device to generate output signals at measurement spots on the polishing pad. The method also includes determining a characteristic of the polishing pad from the output signals.
摘要翻译：提供了用于在抛光期间监测测量装置的参数的方法和系统，抛光期间对样本的损坏，抛光垫的特性或抛光工具的特性。一种方法包括在样品抛光期间用测量装置扫描样品，以在样品上的测量点产生输出信号。该方法还包括确定输出信号是否在输出信号的范围之外。超出范围的输出信号可能表示测量设备的参数失控。在不同的实施例中，在该范围之外的输出信号可以指示对样本的损伤。另一种方法包括用测量装置扫描抛光垫以在抛光垫上的测量点产生输出信号。该方法还包括从输出信号确定抛光垫的特性。

8. 发明授权

US07761250B2 Optical metrology system optimized with design goals 失效
标题翻译：光学计量系统优化设计目标
公开(公告)号：US07761250B2
公开(公告)日：2010-07-20
申请号：US12141754
申请日：2008-06-18
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
IPC分类号： G01N37/00
CPC分类号： G01B11/24 , G01B21/042
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet two or more design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set two or more design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足两个或更多个设计目标。与设定的两个或多个设计目标相比，通过使用收集的设计目标数据来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

9. 发明授权

US07761178B2 Automated process control using an optical metrology system optimized with design goals 失效
标题翻译：使用优化设计目标的光学计量系统进行自动化过程控制
公开(公告)号：US07761178B2
公开(公告)日：2010-07-20
申请号：US12141892
申请日：2008-06-18
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
IPC分类号： G06F19/00 , G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8416 , G03F1/84 , G03F7/705 , G03F7/70625 , H01L22/12
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet a plurality of design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a diffraction signal measured using the optical metrology system is transmitted to the fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的衍射信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

10. 发明授权

US07595869B1 Optical metrology system optimized with a plurality of design goals 失效
标题翻译：光学计量系统用多个设计目标优化
公开(公告)号：US07595869B1
公开(公告)日：2009-09-29
申请号：US12141867
申请日：2008-06-18
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/4788 , G01N21/9501 , G01N2021/95615 , G03F7/70625
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet a plurality of design goals. Primary components of the optical metrology system affecting the design goals are determined and used in the initial design. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。影响设计目标的光学计量系统的主要组件在初始设计中得到确定和使用。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

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