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1. 发明授权

US08030632B2 Controlling angle of incidence of multiple-beam optical metrology tools 有权
标题翻译：控制多光束光学测量工具的入射角
公开(公告)号：US08030632B2
公开(公告)日：2011-10-04
申请号：US12414637
申请日：2009-03-30
申请人： Adam Norton , Xinkang Tian
发明人： Adam Norton , Xinkang Tian
IPC分类号： G01J4/00
CPC分类号： G01J1/02 , G01J1/0242 , G01J1/04 , G01J1/0411 , G01J1/0414 , G01J1/08 , G01N21/4788
摘要： Provided is a method of controlling multiple beams directed to a structure in a workpiece, the method comprising generating a first illumination beam with a first light source and a second illumination beam with a second light source, projecting the first and second illumination beams onto a separate illumination secondary mirror, reflecting the first and second illumination beams onto an illumination primary mirror, the reflected first and second illumination beams projected onto the structure at a first and second angle of incidence respectively, the reflected first and second illumination beams generating a first and second detection beams respectively. The separate illumination secondary mirror is positioned relative to the illumination primary mirror so as make the first angle of incidence substantially the same or close to a calculated optimum first angle of incidence and make the second angle of incidence substantially the same or close to a calculated optimum second angle of incidence. The first and second detection beams are diffracted off the structure at the corresponding angle of incidence to a detection primary mirror, reflected onto a separate secondary detection mirror and other optical components on the detection path, and onto spectroscopic detectors.
摘要翻译：提供了一种控制指向工件中的结构的多个光束的方法，该方法包括利用第一光源生成具有第一光源的第一照明光束和具有第二光源的第二照明光束，将第一和第二照明光束投射到单独的分别将第一和第二照明光束反射到照明主反射镜上，反射的第一和第二照明光束分别以第一和第二入射角投射到结构上，反射的第一和第二照明光束产生第一和第二照明光束检测光束。分离的照明次级反射镜相对于照明主反射镜定位，使得第一入射角基本上相同或接近于计算出的最佳第一入射角，并使第二入射角基本上相同或接近于计算的最佳第二个入射角。第一和第二检测光束以与检测主反射镜相对应的入射角度从结构衍射，反射到检测路径上的单独的次级检测镜和其它光学部件上，并被分布在光谱检测器上。

2. 发明申请

US20090319075A1 AUTOMATED PROCESS CONTROL USING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS 失效
标题翻译：使用优化设计目标的光学计量系统的自动化过程控制
公开(公告)号：US20090319075A1
公开(公告)日：2009-12-24
申请号：US12141892
申请日：2008-06-18
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
IPC分类号： G06F19/00 , G01B11/14
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8416 , G03F1/84 , G03F7/705 , G03F7/70625 , H01L22/12
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet a plurality of design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a diffraction signal measured using the optical metrology system is transmitted to the fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的衍射信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

3. 发明申请

US20090248339A1 DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA 失效
标题翻译：设计符合信号标准的光学计量系统
公开(公告)号：US20090248339A1
公开(公告)日：2009-10-01
申请号：US12057316
申请日：2008-03-27
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
IPC分类号： G06F19/00
CPC分类号： G01N21/956 , G01B2210/56
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to the one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足一个或多个信号标准。通过使用收集的信号数据与一个或多个信号标准相比较来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

4. 发明授权

US07538868B2 Pattern recognition matching for bright field imaging of low contrast semiconductor devices 失效
标题翻译：低对比度半导体器件的亮场成像模式识别匹配
公开(公告)号：US07538868B2
公开(公告)日：2009-05-26
申请号：US11311058
申请日：2005-12-19
申请人： Wei-Ning Shen , Xinkang Tian , Byeong Su Hwang , Tuan Van Tran
发明人： Wei-Ning Shen , Xinkang Tian , Byeong Su Hwang , Tuan Van Tran
IPC分类号： G01J1/10
CPC分类号： G03F9/7011 , G03F9/7019 , G03F9/7069 , G03F9/7088
摘要： Calibration of pattern recognition in bright field imaging systems is disclosed. A target pattern on a substrate on the stage is brought into focus of a bright field system. The image is scanned in a first direction while measuring an edge scattering pattern from a feature of the target pattern. The edge scattering pattern is characterized by first and second peaks. A position of the bright field system's illuminator or beam shaping and relay optics is adjusted perpendicular to an optical path until the first and second peaks are approximately equal in height.
摘要翻译：公开了明场成像系统中模式识别的校准。在舞台上的基板上的目标图案被引入明场系统的焦点。在从目标图案的特征测量边缘散射图案的同时沿第一方向扫描图像。边缘散射图案的特征在于第一和第二峰。亮场系统的照明器或光束成形和中继光学器件的位置垂直于光路被调节，直到第一和第二峰值高度近似相等。

5. 发明授权

US08173451B1 Etch stage measurement system 有权
标题翻译：蚀刻阶段测量系统
公开(公告)号：US08173451B1
公开(公告)日：2012-05-08
申请号：US13028960
申请日：2011-02-16
申请人： Xinkang Tian , Manuel Madriaga
发明人： Xinkang Tian , Manuel Madriaga
IPC分类号： G01R31/26 , H01L21/66 , C23F1/00
CPC分类号： H01J37/32963 , H01J37/32917
摘要： Provided is a system for measuring an etch stage of an etch process involving one or more layers in a substrate, the etch stage measurement system configured to meet two or more etch stage measurement objectives. The system includes an etch process tool, the etch process tool having an etch chamber, a controller, and process parameters. The etch process tool is coupled to two or more optical metrology devices and at least one etch sensor device measuring an etch process parameter with high correlation to the etch stage. The processor is coupled to the etch process tool and is configured to extract an etch measurement value using a correlation of etch stage measurements to actual etch stage data and etch stage measurement obtained from the two or more metrology devices and the at least one etch process sensor device.
摘要翻译：提供了一种用于测量涉及衬底中的一个或多个层的蚀刻工艺的蚀刻阶段的系统，所述蚀刻阶段测量系统被配置为满足两个或更多个蚀刻阶段测量目标。该系统包括蚀刻工艺工具，蚀刻工具具有蚀刻室，控制器和工艺参数。蚀刻工艺工具耦合到两个或更多个光学测量装置和至少一个蚀刻传感器装置，其测量与蚀刻阶段高度相关的蚀刻工艺参数。处理器耦合到蚀刻工艺工具，并且被配置为使用蚀刻阶段测量与实际蚀刻阶段数据的相关性和从两个或更多个测量装置获得的蚀刻阶段测量和至少一个蚀刻工艺传感器来提取蚀刻测量值设备。

6. 发明授权

US08173450B1 Method of designing an etch stage measurement system 有权
标题翻译：蚀刻台测量系统的设计方法
公开(公告)号：US08173450B1
公开(公告)日：2012-05-08
申请号：US13027227
申请日：2011-02-14
申请人： Xinkang Tian , Manuel Madriaga
发明人： Xinkang Tian , Manuel Madriaga
IPC分类号： H01L21/00 , H01L21/66 , H01L21/302 , G01R31/26
CPC分类号： H01L21/67069 , H01J37/32935 , H01L21/67253
摘要： Provided is a method for designing an etch stage measurement system involving an etch process for one or more layers on a substrate using an etch process tool. The etch process tool uses two or more metrology devices, at least one etch process sensor device, and a metrology processor, the etch stage measurement system configured to meet two or more etch stage measurement objectives. A correlation algorithm using the etch stage measurements to the actual etch stage data is developed and used to extract etch measurement value. If the set two or more etch stage measurement objectives are not met, the optical metrology devices are modified, a different etch process sensor device is selected, the correlation algorithm is refined, and/or the measurement data is enhanced by adjusting for noise.
摘要翻译：提供了一种用于使用蚀刻处理工具设计涉及用于衬底上的一个或多个层的蚀刻工艺的蚀刻阶段测量系统的方法。蚀刻工艺工具使用两个或更多个测量装置，至少一个蚀刻工艺传感器装置和计量处理器，该蚀刻阶段测量系统配置成满足两个或更多个蚀刻阶段测量目标。开发了使用蚀刻阶段测量到实际蚀刻阶段数据的相关算法，并用于提取蚀刻测量值。如果不满足设定的两个或多个蚀刻阶段测量目标，则修改光学测量装置，选择不同的蚀刻工艺传感器装置，相关算法被精炼，和/或通过调整噪声来增强测量数据。

7. 发明授权

US07742889B2 Designing an optical metrology system optimized with signal criteria 失效
标题翻译：设计采用信号标准优化的光学计量系统
公开(公告)号：US07742889B2
公开(公告)日：2010-06-22
申请号：US12057316
申请日：2008-03-27
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
IPC分类号： G06F19/00 , G01B11/24 , H01L21/66
CPC分类号： G01N21/956 , G01B2210/56
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to the one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足一个或多个信号标准。通过使用收集的信号数据与一个或多个信号标准相比较来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

8. 发明授权

US07734437B2 Apparatus for designing an optical metrology system optimized with signal criteria 失效
标题翻译：用于设计用信号标准优化的光学测量系统的装置
公开(公告)号：US07734437B2
公开(公告)日：2010-06-08
申请号：US12057332
申请日：2008-03-27
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
IPC分类号： G06F19/00 , G01B11/14
CPC分类号： G01B11/24 , G01B2210/56 , G01N21/956
摘要： Provided is an apparatus for designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种用于设计用于测量工件上的结构的光学测量系统的设备，其中光学测量系统被配置为满足一个或多个信号标准。通过使用收集的信号数据来比较设置一个或多个信号标准来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

9. 发明申请

US20090319214A1 OPTICAL METROLOGY SYSTEM OPTIMIZED WITH DESIGN GOALS 失效
标题翻译：光学计量系统优化设计目标
公开(公告)号：US20090319214A1
公开(公告)日：2009-12-24
申请号：US12141754
申请日：2008-06-18
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHAYLOV
IPC分类号： G01N37/00
CPC分类号： G01B11/24 , G01B21/042
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet two or more design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set two or more design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足两个或更多个设计目标。与设定的两个或多个设计目标相比，通过使用收集的设计目标数据来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

10. 发明申请

US20090248340A1 APPARATUS FOR DESIGNING AN OPTICAL METROLOGY SYSTEM OPTIMIZED WITH SIGNAL CRITERIA 失效
标题翻译：设计符合信号标准的光学计量系统的设备
公开(公告)号：US20090248340A1
公开(公告)日：2009-10-01
申请号：US12057332
申请日：2008-03-27
申请人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
发明人： XINKANG TIAN , MANUEL MADRIAGA , CHING-LING MENG , MIHAIL MIHALOV
IPC分类号： G06F19/00
CPC分类号： G01B11/24 , G01B2210/56 , G01N21/956
摘要： Provided is an apparatus for designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种用于设计用于测量工件上的结构的光学测量系统的设备，其中光学测量系统被配置为满足一个或多个信号标准。通过使用收集的信号数据来比较设置一个或多个信号标准来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

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