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    • 6. 发明申请
    • PROBE SHAPE DETECTION APPARATUS AND PROBE SHAPE DETECTION METHOD
    • 探针形状检测装置和探头形状检测方法
    • US20130060082A1
    • 2013-03-07
    • US13596498
    • 2012-08-28
    • Daisuke SanoHirotaka AkibaHiroyuki UshifusaKyoko HiyamaTomohiko Oda
    • Daisuke SanoHirotaka AkibaHiroyuki UshifusaKyoko HiyamaTomohiko Oda
    • A61B1/005
    • A61B1/00158A61B1/05A61B5/062G02B23/2476
    • A probe shape detection apparatus includes a magnetic field sensing section for sensing a magnetic field generated by an electromagnetic coil in a flexible probe, a movement speed calculation section for calculating a movement speed of the coil, a coordinate computation section for calculating three-dimensional coordinates of the coil based on the sensed magnetic field, a moving average coordinate calculation section for calculating moving average coordinates of the coil, a comparison section for comparing the calculated movement speed with a predetermined threshold, a coil coordinate setting section for setting one of the moving average coordinates and the three-dimensional coordinates calculated by the coordinate computation section as the three-dimensional coordinates of the coil, based on a comparison result of the calculated moving speed, and a signal processing section for generating a video signal to display a shape of the probe, based on the set three-dimensional coordinates of the coil.
    • 探头形状检测装置包括用于感测由柔性探针中的电磁线圈产生的磁场的磁场检测部,用于计算线圈的移动速度的移动速度计算部,用于计算三维坐标的坐标计算部 基于感测到的磁场的线圈的移动平均坐标计算部,用于计算线圈的移动平均坐标的移动平均坐标计算部,用于将计算出的移动速度与预定阈值进行比较的比较部,线圈坐标设定部, 基于计算出的移动速度的比较结果,由坐标运算部算出的平均坐标和三维坐标作为线圈的三维坐标,以及用于产生视频信号以显示形状的信号处理部分 探头,基于设定的三维坐标 线圈。
    • 8. 发明授权
    • Method and apparatus for curing coated film
    • 固化涂膜的方法和设备
    • US08007874B2
    • 2011-08-30
    • US11909044
    • 2006-03-15
    • Kazuhiko NojoShuichi EndoDaisuke Sano
    • Kazuhiko NojoShuichi EndoDaisuke Sano
    • B01J19/08
    • B05C9/14B05D3/0486B05D3/067B05D3/12B05D2252/02
    • According to the method and the apparatus for curing a coated film of the present invention, since an ionization radiation is applied after the O2 concentration in the near-surface layer within 1 mm above the surface of the coated film is adjusted to 1000 ppm or lower, the coated film can be sufficiently cured by irradiation of the ionization radiation. In other words, according to the method and the apparatus for curing a coated film of the present invention, since the O2 concentration in a thin near-surface layer on the surface of a coated film is decreased, the coated film can be sufficiently cured by irradiation of an ionization radiation. As a result, the amount of inert gas supplied upon irradiation of an ionization radiation can be reduced, and downsizing and cost reduction of equipment can be achieved.
    • 根据本发明的涂膜固化方法和固化装置,由于在涂膜表面以上1mm以内的近表面层中的O2浓度调整为1000ppm以上,因此施加电离辐射 ,通过电离辐射的照射可以充分固化涂膜。 换句话说,根据本发明的涂膜固化方法和装置,由于涂膜表面的薄的近表面层中的O 2浓度降低,所以涂膜可以通过 照射电离辐射。 结果,可以减少在照射电离辐射时供应的惰性气体的量,并且可以实现设备的小型化和成本降低。
    • 9. 发明申请
    • OPTICAL ELEMENT AND OPTICAL APPARATUS
    • 光学元件和光学设备
    • US20100091376A1
    • 2010-04-15
    • US12446713
    • 2008-07-24
    • Daisuke SanoTakeharu Okuno
    • Daisuke SanoTakeharu Okuno
    • G02B27/12
    • G02B1/118G02B5/1809G02F2201/38
    • The optical element includes in order from a light-entering side, a first layer (012), a second layer (013), and a base member (011). The first layer includes a concavo-convex structure with convex portions (012a) and concave portions (012b) alternately formed at a pitch smaller than a wavelength λ of entering light, and the second layer satisfies the following conditions: nb · n   s - 0.15 ≤ n   A ≤ nb · n   s + 0.10 λ 8 · n   A ≤ dA ≤ λ n   A where ns represents an effective refractive index of the first layer, nb represents a refractive index of the base member, and nA and dA respectively represent a refractive index and a thickness of the second layer.
    • 光学元件从光入射侧依次包括第一层(012),第二层(013)和基底构件(011)。 第一层包括具有以比入射光的波长λ小的间距交替形成的凸部(012a)和凹部(012b)的凹凸结构,第二层满足以下条件:nb·n - 0.15≤nгA≤nb·nès±0.10λ8·nгA≤dA≤λnгA其中ns表示第一层的有效折射率,nb表示第一层的折射率 基底,nA和dA分别表示第二层的折射率和厚度。