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    • 5. 发明授权
    • Process and apparatus for treatment of volatile organic compounds
    • 用于处理挥发性有机化合物的方法和装置
    • US09504935B2
    • 2016-11-29
    • US14379386
    • 2012-11-02
    • CHENG YUAN ENVIRONMENTAL TECHNOLOGY CO., LTD.
    • Yi-Cheng Lin
    • B01D53/047B01D5/00B01D53/00B01D53/34B01D53/78B05D3/04
    • B01D5/0051B01D5/0027B01D5/0087B01D5/009B01D53/002B01D53/346B01D53/78B01D2252/103B01D2257/708B01D2258/02B05D3/0486
    • A process and apparatus for treatment of volatile organic compounds and the process comprises an untreated airflow dew point temperature sensing step of sensing a dew point temperature of the untreated airflow as a reference temperature, a humidification and condensation processing step of spraying water mist all over the exhaust gas flow and condensing the exhaust gas flow into condensate contained the volatile organic compounds, a treated exhaust gas flow dew point temperature sensing step of sensing a dew point temperature of the treated exhaust gas flow after the humidification and condensation processing step, a collection step of collecting dropped condensate from the humidification and condensation processing step and then transporting the dropped condensate back to the humidification and condensation processing step for circulation spray, and a control step of controlling the dew point temperature of the treated exhaust gas flow to be close to the reference temperature.
    • 一种用于处理挥发性有机化合物的方法和装置,该方法包括:未处理气流露点温度检测步骤,用于检测未处理气流的露点温度作为参考温度;加湿和冷凝处理步骤, 排气流并将废气流冷凝成含有挥发性有机化合物的处理废气流露点温度检测步骤,其在加湿冷凝处理步骤之后检测经处理的废气流的露点温度;收集步骤 从加湿冷凝处理步骤收集掉的冷凝物,然后将滴下的冷凝物输送到用于循环喷雾的加湿冷凝处理步骤,以及控制处理废气流的露点温度接近于 参考温度。
    • 7. 发明申请
    • SUBSTRATE PROCESSING METHOD
    • 基板处理方法
    • US20160089696A1
    • 2016-03-31
    • US14849845
    • 2015-09-10
    • SCREEN Holdings Co., Ltd.
    • Masahiro KIMURA
    • B05D5/08B05D3/10
    • B05D5/08B05D3/0486C03C17/30C03C2217/76H01L21/67028H01L21/67057
    • A substrate processing method includes the steps of cleaning a substrate in a processing tank, forming an organic solvent vapor atmosphere in a chamber, elevating the substrate to replace a rinse on a surface of the substrate with an organic solvent, draining the rinse from the processing tank, moving the substrate into the processing tank, making the surface of the substrate water-repellent, elevating the substrate and supplying an organic solvent vapor to the substrate to remove water repellent from the surface of the substrate, and drying the substrate with inert gas. The water repellent is removed above the processing tank, and thus the substrate can be dried while contamination of the substrate with particles that can be generated in the processing tank in this step is suppressed.
    • 基板处理方法包括以下步骤:清洗处理槽中的基板,在室内形成有机溶剂蒸气气氛,升高基板,用有机溶剂代替基板表面上的冲洗液,从处理液中排出冲洗液 将基板移动到处理槽中,使基板的表面防水,升高基板并向基板提供有机溶剂蒸气以除去基材表面的斥水性,并用惰性气体干燥基板 。 在处理槽上方除去防水剂,因此能够抑制基板的干燥,同时在该工序中能够在处理槽中产生的颗粒污染基板。