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    • 1. 发明授权
    • Negative-type photoresist composition for thick film and use thereof
    • 用于厚膜的负型光致抗蚀剂组合物及其用途
    • US09170491B2
    • 2015-10-27
    • US14222928
    • 2014-03-24
    • Everlight Chemical Industrial Corporation
    • Yi Jing ChenNai Tien ChouHsin Yi HuangYen-Cheng Li
    • G03F7/027G03F7/038
    • G03F7/0388G03F7/027G03F7/033G03F7/038Y10S430/111Y10S430/114
    • The present invention relates to a negative-type photoresist composition for thick film, comprising: (A) 20 to 50 wt % of an alkali-soluble resin which is polymerized from a plurality of kinds of monomers, wherein the monomers includes compounds represented by formulas (1A) and (1B), and based on the weight ratio of the monomers to the alkali-soluble resin, the sum of the formula (1A) compound and the formula (1B) compound are 20 to 60%, and X of the formula (1A) and (1B) may be independently H, methyl or ethyl. (B) 10 to 30 wt % of crosslinker which can be a bisphenol fluorene derivative monomer having at least one ethylenically unsaturated double bond; (C) 5 to 15 wt % of photo initiator; and (D) residual solvent. The present invention also relates to use of the above-mentioned negative-type photoresist compound for thick film.
    • 本发明涉及一种用于厚膜的负型光致抗蚀剂组合物,其包含:(A)20至50重量%的由多种单体聚合的碱溶性树脂,其中所述单体包括由式 (1A)和(1B),并且基于单体与碱溶性树脂的重量比,式(1A)化合物和式(1B)化合物的总和为20〜60%,X 式(1A)和(1B)可以独立地是H,甲基或乙基。 (B)10〜30重量%的交联剂,其可以是具有至少一个烯属不饱和双键的双酚芴衍生物单体; (C)5〜15重量%的光引发剂; 和(D)残留溶剂。 本发明还涉及上述负型光致抗蚀剂化合物用于厚膜的用途。