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    • 6. 发明授权
    • Process for manufacturing wafers of semiconductor material by layer transfer
    • 通过层转移制造半导体材料的晶片的工艺
    • US07348257B2
    • 2008-03-25
    • US11225883
    • 2005-09-13
    • Gabriele BarlocchiFlavio Francesco Villa
    • Gabriele BarlocchiFlavio Francesco Villa
    • H01L21/30
    • H01L21/3247H01L21/3043H01L21/76251H01L21/76259
    • A process manufactures a wafer using semiconductor processing techniques. A bonding layer is formed on a top surface of a first wafer; a deep trench is dug in a substrate of semiconductor material belonging to a second wafer. A top layer of semiconductor material is formed on top of the substrate so as to close the deep trench at the top and form at least one buried cavity. The top layer of the second wafer is bonded to the first wafer through the bonding layer. The two wafers are subjected to a thermal treatment that causes bonding of at least one portion of the top layer to the first wafer and widening of the buried cavity. In this way, the portion of the top layer bonded to the first wafer is separated from the rest of the second wafer, to form a composite wafer.
    • 一种工艺使用半导体处理技术制造晶片。 在第一晶片的顶表面上形成接合层; 在属于第二晶片的半导体材料的衬底中挖出深沟槽。 半导体材料的顶层形成在衬底的顶部上,以封闭顶部的深沟槽并形成至少一个埋入空腔。 第二晶片的顶层通过结合层结合到第一晶片。 对这两个晶片进行热处理,其导致顶层的至少一部分与第一晶片的接合和掩埋腔的加宽。 以这种方式,将结合到第一晶片的顶层的部分与第二晶片的其余部分分离,以形成复合晶片。