会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明授权
    • High speed high density nand-based 2T-NOR flash memory design
    • 高速高密度基于nand的2T-NOR闪存设计
    • US08773903B2
    • 2014-07-08
    • US13535681
    • 2012-06-28
    • Peter Wung LeeFu-Chang Hsu
    • Peter Wung LeeFu-Chang Hsu
    • G11C16/10
    • G11C16/10G11C16/0425H01L27/11519H01L27/11521
    • A two transistor NOR flash memory cell has symmetrical source and drain structure manufactured by a NAND-based manufacturing process. The flash cell comprises a storage transistor made of a double-poly NMOS floating gate transistor and an access transistor made of a double-poly NMOS floating gate transistor, a poly1 NMOS transistor with poly1 and poly2 being shorted or a single-poly poly1 or poly2 NMOS transistor. The flash cell is programmed and erased by using a Fowler-Nordheim channel tunneling scheme. A NAND-based flash memory device includes an array of the flash cells arranged with parallel bit lines and source lines that are perpendicular to word lines. Write-row-decoder and read-row-decoder are designed for the flash memory device to provide appropriate voltages for the flash memory array in pre-program with verify, erase with verify, program and read operations in the unit of page, block, sector or chip.
    • 双晶体管NOR闪存单元具有由基于NAND的制造工艺制造的对称的源极和漏极结构。 闪存单元包括由双多晶硅NMOS浮栅晶体管构成的存储晶体管和由双多晶硅NMOS浮栅晶体管构成的存取晶体管,poly1和poly2短路的poly1NMOS晶体管或单聚poly1或poly2 NMOS晶体管。 使用Fowler-Nordheim通道隧道方案对闪存单元进行编程和擦除。 基于NAND的闪速存储器件包括与并行位线排列的闪存单元的阵列和垂直于字线的源极线。 写行解码器和读行解码器专为闪存器件而设计,可在预编程中为闪速存储器阵列提供适当的电压,通过验证,擦除,以页面,块为单位进行验证,编程和读取操作, 部门或芯片。
    • 8. 发明授权
    • Method and apparatus for operation of a NAND-like dual charge retaining transistor NOR flash memory device
    • 用于操作NAND类双电荷保持晶体管NOR闪存器件的方法和装置
    • US08355287B2
    • 2013-01-15
    • US12806848
    • 2010-08-23
    • Fu-Chang HsuPeter W. Lee
    • Fu-Chang HsuPeter W. Lee
    • G11C16/06G11C16/04
    • G11C16/0458G11C11/5628G11C11/5635G11C16/10G11C16/16G11C16/344G11C16/3445G11C16/3454G11C16/3459G11C16/3463G11C16/3477G11C2211/5621
    • A method and apparatus for operation for the NAND-like dual charge retaining transistor NOR flash memory cells begins by erasing, verifying over-erasing the threshold voltage level of the erased charge retaining transistors to an erased threshold voltage level. Then method progresses by programming one of two charge retaining transistors of the NAND-like dual charge retaining transistor NOR flash memory cells to a first programmed threshold voltage level, and programming the other of the two charge retaining transistors of the NAND-like dual charge retaining transistor NOR flash memory cells to the first programmed threshold voltage level or to a second programmed threshold voltage level. Combinations of the erased threshold voltage level and the first and second programmed threshold voltage levels determine an internal data state of the NAND-like dual charge retaining transistor NOR flash memory cells which are then decoded to ascertain the external data logical state.
    • 用于NAND类型的双电荷保持晶体管NOR闪存单元的操作的方法和装置开始于擦除,验证将擦除的电荷保持晶体管的阈值电压电平擦除为已擦除的阈值电压电平。 然后,通过将NAND类双电荷保持晶体管NOR闪存单元的两个电荷保持晶体管中的一个编程为第一编程阈值电压电平,并编程NAND类似的双电荷保持的两个电荷保持晶体管中的另一个来进行方法 晶体管NOR闪存单元到第一编程阈值电压电平或第二编程阈值电压电平。 擦除阈值电压电平和第一和第二编程阈值电压电平的组合确定NAND类似的双电荷保持晶体管NOR闪存单元的内部数据状态,然后对其进行解码以确定外部数据逻辑状态。
    • 9. 发明授权
    • Bit line gate transistor structure for a multilevel, dual-sided nonvolatile memory cell NAND flash array
    • 位线栅晶体管结构,用于多层双面非易失性存储单元NAND闪存阵列
    • US08335108B2
    • 2012-12-18
    • US12291913
    • 2008-11-14
    • Peter Wung LeeFu-Chang Hsu
    • Peter Wung LeeFu-Chang Hsu
    • G11C11/34
    • G11C11/5621G11C16/0475G11C16/0483G11C16/08G11C16/24H01L29/7923
    • A nonvolatile memory structure with pairs of serially connected threshold voltage adjustable select transistors connected to the top and optionally to the bottom of NAND series strings of groups of the dual-sided charge-trapping nonvolatile memory cells for controlling connection of the NAND series string to an associated bit line. A first of the threshold voltage adjustable select transistors has its threshold voltage level adjusted to a first threshold voltage level and a second of the threshold voltage adjustable select transistors adjusted to a second threshold voltage level. The pair of serially connected threshold voltage adjustable select transistors is connected to a first of two associated bit lines. The NAND nonvolatile memory strings further is connected to a pair of serially connected threshold voltage adjustable bottom select transistors that is connected to the second associated bit line.
    • 连接到双极电荷捕获非易失性存储器单元的组的NAND系列的顶部和可选地连接到底部的具有串联连接的阈值电压可调选择晶体管的非易失性存储器结构,用于控制NAND系列串与 关联位线。 阈值电压可调选择晶体管中的第一个阈值电压电平被调整到第一阈值电压电平,而阈值电压可调选择晶体管中的第二阈值电压调整到第二阈值电压电平。 一对串联连接的阈值电压可调选择晶体管连接到两个相关位线中的第一个。 NAND非易失性存储器串还连接到连接到第二关联位线的一对串联连接的阈值电压可调底部选择晶体管。
    • 10. 发明授权
    • Row-decoder and select gate decoder structures suitable for flashed-based EEPROM operating below +/− 10v BVDS
    • 行解码器和选择栅极解码器结构,适用于低于+/- 10v BVDS的基于闪存的EEPROM
    • US08295087B2
    • 2012-10-23
    • US12456354
    • 2009-06-16
    • Peter Wung LeeFu-Chang HsuHsing-Ya Tsao
    • Peter Wung LeeFu-Chang HsuHsing-Ya Tsao
    • G11C16/04G11C11/4193
    • G11C16/12G11C16/08G11C16/16G11C16/3445G11C16/3459
    • A nonvolatile memory device includes an array of EEPROM configured nonvolatile memory cells each having a floating gate memory transistor for storing a digital datum and a floating gate select transistor for activating the floating gate memory transistor for reading, programming, and erasing. The nonvolatile memory device has a row decoder to transfer the operational biasing voltage levels to word lines connected to the floating gate memory transistors for reading, programming, verifying, and erasing the selected nonvolatile memory cells. The nonvolatile memory device has a select gate decoder circuit transfers select gate control biasing voltages to the select gate control lines connected to the control gate of the floating gate select transistor for reading, programming, verifying, and erasing the floating gate memory transistor of the selected nonvolatile memory cells. The operational biasing voltage levels are generated to minimize operational disturbances and preventing drain to source breakdown in peripheral devices.
    • 非易失性存储器件包括EEPROM配置的非易失性存储单元的阵列,每个存储单元具有用于存储数字数据的浮动栅极存储晶体管和用于激活用于读取,编程和擦除的浮动栅极存储晶体管的浮动栅极选择晶体管。 非易失性存储器件具有行解码器,用于将操作偏置电压电平传送到连接到浮置栅极存储晶体管的字线,用于读取,编程,验证和擦除所选择的非易失性存储器单元。 非易失性存储器件具有选择栅极解码器电路,将选择栅极控制偏置电压传输到连接到浮置栅极选择晶体管的控制栅极的选择栅极控制线,用于读取,编程,验证和擦除所选择的浮置栅极存储晶体管 非易失性存储单元。 产生操作偏置电压电平以最小化操作干扰并防止外围设备中的漏极损耗。