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    • 2. 发明授权
    • Display device and method of manufacturing the same
    • 显示装置及其制造方法
    • US08049255B2
    • 2011-11-01
    • US12155504
    • 2008-06-05
    • Takeshi SakaiToshio MiyazawaTakuo KaitohHidekazu Miyake
    • Takeshi SakaiToshio MiyazawaTakuo KaitohHidekazu Miyake
    • H01L31/062
    • H01L27/1214H01L29/41733H01L29/458H01L29/66765H01L29/78618H01L29/78678
    • A semiconductor device includes an insulating substrate and a TFT element disposed on the substrate. The TFT element includes a gate electrode, a gate insulating film, a semiconductor layer, and a source electrode and a drain electrode arranged in that order on the insulating substrate. The semiconductor layer includes an active layer composed of polycrystalline semiconductor and a contact layer segment interposed between the active layer and the source electrode and another contact layer segment interposed between the active layer and the drain electrode. The source and drain electrodes each have a first face facing the opposite face of the active layer from the interface with the gate insulating layer and a second face facing an etched side face of the active layer. Each contact layer segment is disposed between the active layer and each of the first and second faces of the source or drain electrode.
    • 半导体器件包括绝缘基板和设置在基板上的TFT元件。 TFT元件包括在绝缘基板上依次排列的栅电极,栅极绝缘膜,半导体层以及源电极和漏电极。 半导体层包括由多晶半导体构成的有源层和介于有源层与源电极之间的接触层段,以及介于有源层和漏电极之间的另一接触层段。 源极和漏极各自具有面对与有源层的界面相对的有源层的相对面的第一面和与有源层的蚀刻侧面对置的第二面。 每个接触层段设置在源极或漏极之间的有源层和第一和第二表面中的每一个之间。