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    • 2. 发明授权
    • Thin film magnetic head, thin film magnetic head device, and magnetic recording/reproducing apparatus
    • 薄膜磁头,薄膜磁头装置和磁记录/重放装置
    • US08760805B2
    • 2014-06-24
    • US13176134
    • 2011-07-05
    • Hisayoshi WatanabeHitoshi HatateHideyuki YatsuKoichi Otani
    • Hisayoshi WatanabeHitoshi HatateHideyuki YatsuKoichi Otani
    • G11B5/127
    • G11B5/3116G11B5/1278G11B5/3163
    • A thin-film magnetic head includes a slider substrate and a write element. The slider substrate has an air bearing surface at one side thereof. The write element has a recording magnetic pole film. The recording magnetic pole film is disposed on a plane crossing the air bearing surface over the slider substrate and has a large-width portion and a small-width portion continuously arranged in the named order toward the air bearing surface. The small-width portion has a smaller width than the large-width portion. Of the large-width portion and the small-width portion, at least the small-width portion has a first portion and a second portion. The second portion is continuous with an upper end of the first portion and has both side faces inclined in such a direction as to increase the width. An external angle of the first portion formed by a plane parallel to a bottom face and the side face is larger than an external angle of the second portion formed by a plane parallel to the bottom face and the side face.
    • 薄膜磁头包括滑块基板和写入元件。 滑块基板在其一侧具有空气轴承表面。 写元件具有记录磁极膜。 记录磁极膜设置在与滑动基板上的空气轴承表面相交的平面上,并且具有朝向空气轴承表面依次连续排列的大宽度部分和小宽度部分。 小宽度部分的宽度比宽度大的部分小。 在大宽度部分和小宽度部分中,至少小宽度部分具有第一部分和第二部分。 第二部分与第一部分的上端连续,并且具有在增加宽度的方向上倾斜的两个侧面。 由平行于底面和侧面的平面形成的第一部分的外角比由平行于底面和侧面的平面形成的第二部分的外角大。
    • 4. 发明授权
    • Magnetic head for perpendicular magnetic recording and method of manufacturing same
    • 用于垂直磁记录的磁头及其制造方法
    • US08072706B2
    • 2011-12-06
    • US12588440
    • 2009-10-15
    • Kei HirataHideyuki UkitaShin NarushimaIsamu TobaHiromichi UmeharaHisayoshi WatanabeHideyuki Yatsu
    • Kei HirataHideyuki UkitaShin NarushimaIsamu TobaHiromichi UmeharaHisayoshi WatanabeHideyuki Yatsu
    • G11B5/127
    • G11B5/1278G11B5/3116G11B5/3163
    • A main magnetic pole includes a first part extending from a medium facing surface to a point at a predetermined distance from the medium facing surface, and a second part other than the first part. An accommodation part for accommodating the main magnetic pole includes: a first layer having a groove; a second layer lying between the first layer and the main magnetic pole in the first layer's groove; and a third layer interposed in part between the second layer and the main magnetic pole in the first layer's groove. The second layer is formed of a metal material different from a material used to form the first layer. The third layer is formed of an inorganic insulating material. The second and third layers lie between the first layer and the first part. The second layer lies between the bottom of the first layer's groove and the second part, but the third layer does not. The distance between the bottom of the first layer's groove and the second part is smaller than that between the bottom and the first part.
    • 主磁极包括从面向介质的表面延伸到与介质相对表面预定距离的点的第一部分和除第一部分之外的第二部分。 用于容纳主磁极的容纳部分包括:具有凹槽的第一层; 位于第一层槽中的第一层和主磁极之间的第二层; 以及在第一层槽中的部分地介于第二层和主磁极之间的第三层。 第二层由与用于形成第一层的材料不同的金属材料形成。 第三层由无机绝缘材料形成。 第二层和第三层位于第一层和第一层之间。 第二层位于第一层凹槽的底部和第二部分之间,但第三层不存在。 第一层槽的底部和第二部分之间的距离小于底部和第一部分之间的距离。
    • 5. 发明授权
    • Method of forming metal trench pattern in thin-film device
    • 在薄膜器件中形成金属沟槽图案的方法
    • US07682923B2
    • 2010-03-23
    • US11967905
    • 2007-12-31
    • Akifumi KamijimaHideyuki Yatsu
    • Akifumi KamijimaHideyuki Yatsu
    • H01L21/20
    • H01L27/016H01L27/0207H01L28/91
    • A method of forming a metal trench pattern in a thin-film device includes a step of depositing an electrode film on a substrate or on a base layer, a step of forming a resist pattern layer having a trench forming portion used to make a trench pattern, on the deposited electrode film, a step of forming a metal layer for filling spaces in the trench forming portion and for covering the trench forming portion, by performing plating through the formed resist pattern layer using the deposited electrode film as an electrode, a step of planarizing at least a top surface of the formed metal layer until the trench forming portion of the resist pattern layer is at least exposed, and a step of removing the exposed trench forming portion of the resist pattern layer.
    • 在薄膜器件中形成金属沟槽图形的方法包括在基底或基底层上沉积电极膜的步骤,形成具有用于形成沟槽图案的沟槽形成部分的抗蚀剂图案层的步骤 在沉积的电极膜上,通过使用沉积的电极膜作为电极进行通过形成的抗蚀剂图案层的电镀,形成用于填充沟槽形成部分中的空间并覆盖沟槽形成部分的金属层的步骤,步骤 平坦化所形成的金属层的至少顶表面,直到抗蚀剂图案层的沟槽形成部分至少暴露为止;以及去除抗蚀剂图案层的暴露的沟槽形成部分的步骤。