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    • 1. 发明授权
    • Method for growing a nitride compound semiconductor
    • 生长氮化物半导体的方法
    • US06413312B1
    • 2002-07-02
    • US09476544
    • 2000-01-03
    • Hiroji KawaiTsunenori AsatsumaFumihiko Nakamura
    • Hiroji KawaiTsunenori AsatsumaFumihiko Nakamura
    • C30B2502
    • H01L33/325C30B25/02C30B29/403C30B29/406H01L21/0242H01L21/02458H01L21/0254H01L21/02579H01L21/0262
    • A new and improved method for growing a p-type nitride III-V compound semiconductor is provided which can produce a p-type nitride compound semiconductors having a high carrier concentration, without the need for annealing to activate impurities after growth. In a preferred embodiment, a p-type nitride compound semiconductor, such as p-type GaN, is grown by metal organic chemical vapor deposition methods using a nitrogen source material which does not release hydrogen during release of nitrogen and the semiconductor is grown in an inactive gas. The nitrogen source materials may be selected from nitrogen compounds that contain hydrogen radicals and alkyl radicals and/or phenyl radicals provided that the total amount of hydrogen radicals is less than or equal to the sum total of alkyl radicals and phenyl radicals present in the nitrogen compound used as the nitrogen source material.
    • 提供了一种用于生长p型氮化物III-V族化合物半导体的新型改进方法,其可以生产具有高载流子浓度的p型氮化物化合物半导体,而不需要退火以在生长后激活杂质。 在优选实施例中,p型氮化物半导体,例如p型GaN,通过金属有机化学气相沉积方法生长,使用在氮气释放期间不释放氢的氮源材料,并且半导体生长在 惰性气体 氮源材料可以选自含氢基团和烷基和/或苯基的氮化合物,条件是氢原子的总量小于或等于存在于氮化合物中的烷基和苯基的总和 用作氮源材料。
    • 5. 发明授权
    • Junction field effect transistor with vertical gate region
    • 具有垂直栅极区域的结型场效应晶体管
    • US4916499A
    • 1990-04-10
    • US405082
    • 1989-09-06
    • Hiroji Kawai
    • Hiroji Kawai
    • H01L29/808
    • H01L29/8083
    • A junction field effect transistor having a source region, a gate region and a drain region, which are laminated to form a laminated layer, and a channel region formed on one side surface across the laminated layer, and also having a cavity which separates high impurity concentration regions of the source, gate and drain regions is disclosed. A method for manufacturing the above junction field effect transistor is also disclosed which has the steps of laminating semiconductor layers which become a source region, a gate region and a drain region, respectively, removing portions of the semiconductor layers other than portions which become an active region portion, and forming a channel region on one side surface across the laminated layers of the source region, gate region and drain region by the epitaxial growth method, and also forming cavities.
    • 具有层叠以形成层叠层的源极区域,栅极区域和漏极区域的结型场效应晶体管和形成在层叠层的一个侧面上的沟道区域,并且还具有分离高杂质的空穴 公开了源极,栅极和漏极区域的集中区域。 还公开了用于制造上述结型场效应晶体管的方法,其具有以下步骤:分别成为源极区,栅极区和漏极区的半导体层,去除部分成为活性的部分之外的半导体层的部分 并且通过外延生长方法在源极区域,栅极区域和漏极区域的层叠层的一个侧表面上形成沟道区域,并且还形成空腔。