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1. 发明授权

US08028253B2 Method and apparatus for determining mask layouts for a multiple patterning process 有权
标题翻译：用于确定多个图案化工艺的掩模布局的方法和装置
公开(公告)号：US08028253B2
公开(公告)日：2011-09-27
申请号：US11732268
申请日：2007-04-02
申请人： Martin Drapeau , Jeffrey P. Mayhew
发明人： Martin Drapeau , Jeffrey P. Mayhew
IPC分类号： G06F17/50
CPC分类号： G03F1/70
摘要： One embodiment provides a method for determining mask layouts. During operation, the system can receive a design intent. Next, the system can determine a set of critical edges in the design layout, and select a first edge and a second edge. The system can then determine a first trench and a second trench using the first edge and the second edge, respectively. Note that an edge of the first trench may substantially overlap with the first edge, and an edge of the second trench may substantially overlap with the second edge. Next, the system may assign the first trench and the second trench to the first mask layout and the second mask layout, respectively. The system can then increase the first trench and the second trench, thereby improving pattern fidelity. The resulting mask layouts may be used in a double patterning process.
摘要翻译：一个实施例提供了一种用于确定掩模布局的方法。在操作期间，系统可以接收设计意图。接下来，系统可以确定设计布局中的一组关键边缘，并且选择第一边缘和第二边缘。然后，系统可以分别使用第一边缘和第二边缘来确定第一沟槽和第二沟槽。注意，第一沟槽的边缘可以基本上与第一边缘重叠，并且第二沟槽的边缘可以基本上与第二边缘重叠。接下来，系统可以分别将第一沟槽和第二沟槽分配给第一掩模布局和第二掩模布局。然后，系统可以增加第一沟槽和第二沟槽，从而提高图案保真度。所得到的掩模布局可以用于双重图案化工艺中。

2. 发明申请

US20080244504A1 Method and apparatus for determining mask layouts for a multiple patterning process 有权
标题翻译：用于确定多个图案化工艺的掩模布局的方法和装置
公开(公告)号：US20080244504A1
公开(公告)日：2008-10-02
申请号：US11732268
申请日：2007-04-02
申请人： Martin Drapeau , Jeffrey P. Mayhew
发明人： Martin Drapeau , Jeffrey P. Mayhew
IPC分类号： G06F17/50
CPC分类号： G03F1/70
摘要： One embodiment provides a method for determining mask layouts. During operation, the system can receive a design intent. Next, the system can determine a set of critical edges in the design layout, and select a first edge and a second edge. The system can then determine a first trench and a second trench using the first edge and the second edge, respectively. Note that an edge of the first trench may substantially overlap with the first edge, and an edge of the second trench may substantially overlap with the second edge. Next, the system may assign the first trench and the second trench to the first mask layout and the second mask layout, respectively. The system can then increase the first trench and the second trench, thereby improving pattern fidelity. The resulting mask layouts may be used in a double patterning process.
摘要翻译：一个实施例提供了一种用于确定掩模布局的方法。在操作期间，系统可以接收设计意图。接下来，系统可以确定设计布局中的一组关键边缘，并且选择第一边缘和第二边缘。然后，系统可以分别使用第一边缘和第二边缘来确定第一沟槽和第二沟槽。注意，第一沟槽的边缘可以基本上与第一边缘重叠，并且第二沟槽的边缘可以基本上与第二边缘重叠。接下来，系统可以分别将第一沟槽和第二沟槽分配给第一掩模布局和第二掩模布局。然后，系统可以增加第一沟槽和第二沟槽，从而提高图案保真度。所得到的掩模布局可以用于双重图案化工艺中。

3. 发明授权

US07415694B2 Graph based phase shift lithography mapping method and apparatus 有权
标题翻译：基于图形的相移光刻映射方法和装置
公开(公告)号：US07415694B2
公开(公告)日：2008-08-19
申请号：US11169099
申请日：2005-06-27
申请人： Jeffrey P. Mayhew
发明人： Jeffrey P. Mayhew
IPC分类号： G06F17/50
CPC分类号： G03F1/30
摘要： For phase-shifting micro lithography, a method of assigning phase to a set of shifter polygons in a mask layer separated by a set of target features includes assigning a first phase to a first shifter polygon, identifying a set of target features that touch the first shifter polygon, and assigning a second phase to all shifter polygons in the set that touch the set of target features in contact with the first shifter polygon. The set of shifter polygons and the set of target features are separated into aggregates that are spatially isolated from each other such that the phase assignment in one aggregate does not affect the phase assignments in other aggregates. In one embodiment, the first shifter polygon in each aggregate is selected by merging the set of shifter polygons and set of target features into a large polygon, marking a vertex of the large polygon, checking the vertex to make sure it only touches one shifter polygon, and selecting the single shifter polygon touching the vertex as the first shifter polygon.
摘要翻译：对于相移微光刻技术，将相位分配给由一组目标特征分离的掩模层中的一组移动器多边形的方法包括：将第一相位分配给第一移位多边形，识别接触第一移位器多边形的一组目标特征并且将所述第二相位分配给所述组中与触摸所述第一移位器多边形接触的所述目标特征集合的所有移位多边形。移位器多边形集合和目标特征集合被分离为在彼此空间上隔离的聚合，使得一个聚合中的相位分配不影响其他聚合中的相位分配。在一个实施例中，通过将移位器多边形和一组目标特征合并为大多边形，标记大多边形的顶点，检查顶点以确保其仅接触一个移位多边形来选择每个聚合中的第一移位多边形并且选择接触顶点的单个移位器多边形作为第一移位多边形。

4. 发明授权

US06493866B1 Phase-shift lithography mapping and apparatus 有权
标题翻译：相移光刻图和仪器
公开(公告)号：US06493866B1
公开(公告)日：2002-12-10
申请号：US09608498
申请日：2000-06-30
申请人： Jeffrey P. Mayhew
发明人： Jeffrey P. Mayhew
IPC分类号： G06F1750
CPC分类号： G03F1/30
摘要： For phase-shifting microlithography, a method of assigning phase to a set of shifter polygons in a mask layer separated by a set of target features includes assigning a first phase to a first shifter polygon, identifying a set of target features that touch the first shifter polygon, and assigning a second phase to all shifter polygons in the set that touch the set of target features in contact with the first shifter polygon. The set of shifter polygons and the set of target features are separated into aggregates that are spatially isolated from each other such that the phase assignment in one aggregate does not affect the phase assignments in other aggregates. In one embodiment, the first shifter polygon in each aggregate is selected by merging the set of shifter polygons and set of target features into a large polygon, marking a vertex of the large polygon, checking the vertex to make sure it only touches one shifter polygon, and selecting the single shifter polygon touching the vertex as the first shifter polygon.
摘要翻译：对于相移微平版印刷法，将相位分配给由一组目标特征分隔的掩模层中的一组移动器多边形的方法包括：将第一相位分配给第一移位多边形，识别接触第一移位器的一组目标特征多边形，并且将第二阶段分配给所述组中与触摸与第一移位器多边形接触的目标特征集合的所有移位多边形。移位器多边形集合和目标特征集合被分离为在彼此空间上隔离的聚合，使得一个聚合中的相位分配不影响其他聚合中的相位分配。在一个实施例中，通过将移位器多边形和一组目标特征合并为大多边形，标记大多边形的顶点，检查顶点以确保其仅接触一个移位多边形来选择每个聚合中的第一移位多边形并且选择接触顶点的单个移位器多边形作为第一移位多边形。

5. 发明授权

US4625288A Method and apparatus for creating a structured image data set based on acquired image data 失效
标题翻译：用于基于获取的图像数据创建结构化图像数据集的方法和装置
公开(公告)号：US4625288A
公开(公告)日：1986-11-25
申请号：US656611
申请日：1984-10-01
申请人： Herbert S. Weiner , William L. Mills , Charles E. Perkins , Chi-Leung Lau , Jeffrey P. Mayhew , Samuel Y. Gordon
发明人： Herbert S. Weiner , William L. Mills , Charles E. Perkins , Chi-Leung Lau , Jeffrey P. Mayhew , Samuel Y. Gordon
IPC分类号： G06F17/50 , G06T19/20 , G06F15/26
CPC分类号： G06T19/20 , G06F3/04845 , G06T11/60 , G06T2219/2012
摘要： A method of structuring vectorized data obtained by scanning a drawing or other document comprising the steps of displaying on a computer controlled display screen a template image comprising template lines and nodes corresponding to the acquired image data and selecting portions of the acquired image data to be designated for inclusion in a restructured image data set by using a screen cursor to select the corresponding template lines displayed on the screen. Inclusion designations are subsequently and selectively removed as desired from portions of the acquired image data from the structured data set by using the cursor to select the corresponding lines and nodes on the screen. When the desired portions of the acquired data set are selectively designated for inclusion in the restructured data set, all remaining designated data is copied into the restructured image data.
摘要翻译：一种构造通过扫描图形或其它文档获得的矢量化数据的方法，包括以下步骤：在计算机控制的显示屏幕上显示包括与所获取的图像数据相对应的模板行和节点的模板图像，并且选择要被指定的所获取的图像数据的部分通过使用屏幕光标来选择显示在屏幕上的相应模板行，以便包含在重构的图像数据集中。随后通过使用光标从所述结构化数据集的所获取的图像数据的部分中随机选择性地去除包含名称，以在屏幕上选择相应的行和节点。当选择性地指定所获取的数据集合的所需部分以包含在重构数据集中时，所有剩余的指定数据被复制到重构的图像数据中。

6. 发明授权

US06918105B2 Phase-shift lithography mapping method and apparatus 有权
标题翻译：相移光刻映射方法和装置
公开(公告)号：US06918105B2
公开(公告)日：2005-07-12
申请号：US10315906
申请日：2002-12-09
申请人： Jeffrey P. Mayhew
发明人： Jeffrey P. Mayhew
IPC分类号： G03F1/30 , G06F17/50 , G03C5/04
CPC分类号： G03F1/30
摘要： For phase-shifting microlithography, a method of assigning phase to a set of shifter polygons in a mask layer separated by a set of target features includes assigning a first phase to a first shifter polygon, identifying a set of target features that touch the first shifter polygon, and assigning a second phase to all shifter polygons in the set that touch the set of target features in contact with the first shifter polygon. The set of shifter polygons and the set of target features are separated into aggregates that are spatially isolated from each other such that the phase assignment in one aggregate does not affect the phase assignments in other aggregates. In one embodiment, the first shifter polygon in each aggregate is selected by merging the set of shifter polygons and set of target features into a large polygon, marking a vertex of the large polygon, checking the vertex to make sure it only touches one shifter polygon, and selecting the single shifter polygon touching the vertex as the first shifter polygon.
摘要翻译：对于相移微平版印刷法，将相位分配给由一组目标特征分隔的掩模层中的一组移动器多边形的方法包括：将第一相位分配给第一移位多边形，识别接触第一移位器的一组目标特征多边形，并且将第二阶段分配给所述组中与触摸与第一移位器多边形接触的目标特征集合的所有移位多边形。移位器多边形集合和目标特征集合被分离为在彼此空间上隔离的聚合，使得一个聚合中的相位分配不影响其他聚合中的相位分配。在一个实施例中，通过将移位器多边形和一组目标特征合并为大多边形，标记大多边形的顶点，检查顶点以确保其仅接触一个移位多边形来选择每个聚合中的第一移位多边形并且选择接触顶点的单个移位器多边形作为第一移位多边形。

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