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    • 1. 发明授权
    • Method and apparatus for determining mask layouts for a multiple patterning process
    • 用于确定多个图案化工艺的掩模布局的方法和装置
    • US08028253B2
    • 2011-09-27
    • US11732268
    • 2007-04-02
    • Martin DrapeauJeffrey P. Mayhew
    • Martin DrapeauJeffrey P. Mayhew
    • G06F17/50
    • G03F1/70
    • One embodiment provides a method for determining mask layouts. During operation, the system can receive a design intent. Next, the system can determine a set of critical edges in the design layout, and select a first edge and a second edge. The system can then determine a first trench and a second trench using the first edge and the second edge, respectively. Note that an edge of the first trench may substantially overlap with the first edge, and an edge of the second trench may substantially overlap with the second edge. Next, the system may assign the first trench and the second trench to the first mask layout and the second mask layout, respectively. The system can then increase the first trench and the second trench, thereby improving pattern fidelity. The resulting mask layouts may be used in a double patterning process.
    • 一个实施例提供了一种用于确定掩模布局的方法。 在操作期间,系统可以接收设计意图。 接下来,系统可以确定设计布局中的一组关键边缘,并且选择第一边缘和第二边缘。 然后,系统可以分别使用第一边缘和第二边缘来确定第一沟槽和第二沟槽。 注意,第一沟槽的边缘可以基本上与第一边缘重叠,并且第二沟槽的边缘可以基本上与第二边缘重叠。 接下来,系统可以分别将第一沟槽和第二沟槽分配给第一掩模布局和第二掩模布局。 然后,系统可以增加第一沟槽和第二沟槽,从而提高图案保真度。 所得到的掩模布局可以用于双重图案化工艺中。
    • 2. 发明申请
    • Method and apparatus for determining mask layouts for a multiple patterning process
    • 用于确定多个图案化工艺的掩模布局的方法和装置
    • US20080244504A1
    • 2008-10-02
    • US11732268
    • 2007-04-02
    • Martin DrapeauJeffrey P. Mayhew
    • Martin DrapeauJeffrey P. Mayhew
    • G06F17/50
    • G03F1/70
    • One embodiment provides a method for determining mask layouts. During operation, the system can receive a design intent. Next, the system can determine a set of critical edges in the design layout, and select a first edge and a second edge. The system can then determine a first trench and a second trench using the first edge and the second edge, respectively. Note that an edge of the first trench may substantially overlap with the first edge, and an edge of the second trench may substantially overlap with the second edge. Next, the system may assign the first trench and the second trench to the first mask layout and the second mask layout, respectively. The system can then increase the first trench and the second trench, thereby improving pattern fidelity. The resulting mask layouts may be used in a double patterning process.
    • 一个实施例提供了一种用于确定掩模布局的方法。 在操作期间,系统可以接收设计意图。 接下来,系统可以确定设计布局中的一组关键边缘,并且选择第一边缘和第二边缘。 然后,系统可以分别使用第一边缘和第二边缘来确定第一沟槽和第二沟槽。 注意,第一沟槽的边缘可以基本上与第一边缘重叠,并且第二沟槽的边缘可以基本上与第二边缘重叠。 接下来,系统可以分别将第一沟槽和第二沟槽分配给第一掩模布局和第二掩模布局。 然后,系统可以增加第一沟槽和第二沟槽,从而提高图案保真度。 所得到的掩模布局可以用于双重图案化工艺中。
    • 3. 发明授权
    • Method and apparatus for determining whether a sub-resolution assist feature will print
    • 用于确定子分辨率辅助特征是否将被打印的方法和装置
    • US07727687B2
    • 2010-06-01
    • US11454439
    • 2006-06-15
    • Lawrence S. Melvin, IIIJensheng HuangMartin Drapeau
    • Lawrence S. Melvin, IIIJensheng HuangMartin Drapeau
    • G03F9/00
    • G03F7/70433G03F1/36G03F7/705
    • One embodiment of the present invention provides a system that determines whether a sub-resolution assist feature will print. During operation, the system receives a layout which contains a sub-resolution assist feature. Next, the system determines whether the sub-resolution assist feature will print using a process model and the layout. The process model is determined using first process data and second process data. The first process data is obtained using a first layout which is exposed using a first exposure level. The second process data is obtained using a second layout which is exposed using a second exposure level, which is different from the first exposure level. The second exposure level causes the sub-resolution assist features within the second layout to print.
    • 本发明的一个实施例提供一种确定副分辨率辅助特征是否将被打印的系统。 在操作期间,系统接收包含子分辨率辅助功能的布局。 接下来,系统确定子分辨率辅助功能是否使用过程模型和布局进行打印。 使用第一过程数据和第二过程数据确定过程模型。 使用使用第一曝光水平曝光的第一布局获得第一处理数据。 使用与第一曝光水平不同的第二曝光水平曝光的第二布局获得第二处理数据。 第二曝光水平导致第二布局中的分辨率辅助功能打印。
    • 5. 发明授权
    • Graphical user interface for a cell router usable by both novice and advanced users
    • 新手和高级用户可以使用的单元路由器的图形用户界面
    • US07263680B2
    • 2007-08-28
    • US10461674
    • 2003-06-12
    • Martin Drapeau
    • Martin Drapeau
    • G06F17/50
    • G06F17/5077
    • One embodiment of the invention provides a graphical user interface for configuring parameters that control a cell routing process used to lay out a cell, wherein the graphical user interface is useable by both novice and advanced users. The graphical user interface provides both a scenario section and a parameter section. The scenario section allows a user to select a scenario that sets values for multiple parameters applicable to the cell routing process, while the parameter section allows a user to set and adjust individual routing parameters. The graphical user interface also includes an output that displays the parameters to the user. Note that the scenario section of the graphical user interface is useful for a novice user who does not understand the interrelationships between routing parameters, while the parameter section of the graphical user interface is useful for an advanced user who desires to set individual parameters.
    • 本发明的一个实施例提供了用于配置控制用于布局小区的小区路由进程的参数的图形用户界面,其中图形用户界面可由新手和高级用户使用。 图形用户界面提供场景部分和参数部分。 场景部分允许用户选择一个场景,该方案为适用于小区路由过程的多个参数设置值,而参数部分允许用户设置和调整各个路由参数。 图形用户界面还包括向用户显示参数的输出。 请注意,图形用户界面的场景部分对于不了解路由参数之间的相互关系的新手用户很有用,而图形用户界面的参数部分对于希望设置各个参数的高级用户很有用。