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    • 2. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US08610162B2
    • 2013-12-17
    • US13286807
    • 2011-11-01
    • Seok Min HwangJae Yoon KimJin Bock Lee
    • Seok Min HwangJae Yoon KimJin Bock Lee
    • H01L33/00
    • H01L33/38H01L33/42H01L2933/0016
    • A semiconductor light emitting device includes: first and second conductive type semiconductor layers; an active layer disposed between the first and second conductive type semiconductor layers; and first and second electrodes disposed on one surface of each of the first and second conductive type semiconductor layers, respectively, wherein at least one of the first and second electrodes includes a pad part and a finger part formed to extend from the pad part, and the end of the finger part has an annular shape. Because a phenomenon in which current is concentrated in a partial area of the finger part is minimized, tolerance to electrostatic discharge (ESD) can be strengthened and light extraction efficiency can be improved.
    • 半导体发光器件包括:第一和第二导电类型半导体层; 设置在所述第一和第二导电类型半导体层之间的有源层; 以及分别设置在每个第一和第二导电类型半导体层的一个表面上的第一和第二电极,其中第一和第二电极中的至少一个包括衬垫部分和形成为从衬垫部分延伸的指状部分,以及 手指部分的端部具有环形形状。 由于电流集中在手指部分的部分区域的现象最小化,因此可以增强对静电放电(ESD)的耐受性,并且可以提高光提取效率。
    • 4. 发明申请
    • Method of manufacturing gallium nitride based light emitting diode
    • 制造氮化镓基发光二极管的方法
    • US20070184568A1
    • 2007-08-09
    • US11646406
    • 2006-12-28
    • Dae Yeon KimSung Min HwangJin Bock LeeSang Ho Yoon
    • Dae Yeon KimSung Min HwangJin Bock LeeSang Ho Yoon
    • H01L21/00
    • H01L33/22H01L33/44
    • Provided a method of manufacturing a GaN-based LED comprising forming an n-type GaN layer on a substrate; forming an active layer on the n-type GaN layer; forming a p-type GaN layer on the active layer; mesa-etching portions of the p-type GaN layer and the active layer so as to expose a portion of the n-type GaN layer; forming an irregularities forming layer on the p-type GaN layer; forming a photosensitive film pattern for forming a surface irregularities pattern on the irregularities forming layer; selectively wet-etching the irregularities forming layer by using the photosensitive film pattern as an etching mask, thereby forming surface irregularities; forming a p-electrode on the p-type GaN layer having the surface irregularities formed thereon; and forming an n-electrode on the exposed n-type GaN layer.
    • 提供一种制造GaN基LED的方法,包括在衬底上形成n型GaN层; 在n型GaN层上形成有源层; 在有源层上形成p型GaN层; 蚀刻p型GaN层和有源层的部分,以暴露n型GaN层的一部分; 在p型GaN层上形成凹凸形成层; 形成用于在所述凹凸形成层上形成表面凹凸图案的感光膜图案; 通过使用感光膜图案作为蚀刻掩模来选择性地湿法蚀刻不规则形成层,从而形成表面不规则; 在其上形成有表面凹凸的p型GaN层上形成p电极; 以及在暴露的n型GaN层上形成n电极。