专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08293123B2 Method of manufacturing inkjet printhead and inkjet printhead manufactured using the same 有权
标题翻译：制造使用其制造喷墨打印头和喷墨打印头的方法
公开(公告)号：US08293123B2
公开(公告)日：2012-10-23
申请号：US12213767
申请日：2008-06-24
申请人： Jong-jin Park , Su-min Kim , Jin-baek Kim , Yong-ung Ha , Yong-seop Yoon , Byung-ha Park
发明人： Jong-jin Park , Su-min Kim , Jin-baek Kim , Yong-ung Ha , Yong-seop Yoon , Byung-ha Park
IPC分类号： G01D15/00
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1639 , B41J2/1642 , B41J2/1645 , B41J2/1646 , G03F7/0233 , G03F7/0385 , G03F7/0392 , Y10T29/49401
摘要： A method of manufacturing an inkjet printhead, in which a solvent included in a positive photoresist composition or in a non-photosensitive soluble polymer composition which is used to form a sacrificial layer has a different polarity from that of a solvent included in a negative photoresist composition that is used to form at least one of a channel forming layer and a nozzle layer.
摘要翻译：一种制造喷墨打印头的方法，其中包括在正性光致抗蚀剂组合物中的溶剂或用于形成牺牲层的非感光性可溶性聚合物组合物中的溶剂与负性光致抗蚀剂组合物中包含的溶剂的极性不同用于形成通道形成层和喷嘴层中的至少一个。

2. 发明授权

US08137059B2 Fan guard and outdoor unit for air conditioner having the same 有权
标题翻译：具有相同空调的风扇护罩和室外机
公开(公告)号：US08137059B2
公开(公告)日：2012-03-20
申请号：US12222452
申请日：2008-08-08
申请人： Jin Baek Kim , Hyun Seok Jung , Jun Young Lee , Jung Hyeon Kim , Hyun Ho Park
发明人： Jin Baek Kim , Hyun Seok Jung , Jun Young Lee , Jung Hyeon Kim , Hyun Ho Park
IPC分类号： F03B11/08 , F03B1/00 , F01D5/00 , F04D29/70 , B63H7/00
CPC分类号： F24F1/38 , F04D29/703 , F24F1/40 , F24F1/48 , F24F1/50
摘要： An outdoor unit for an air conditioner is disclosed. The outdoor unit according to the present invention comprises a housing which has an air inlet and an air outlet, a ventilation fan rotatably mounted in the housing, and a fan guard connected to the housing to cover the air outlet. Here, the fan guard comprises a plurality of closed ribs arranged sequentially and concentrically between a center and an outline thereof, and a plurality of radial ribs arranged in radial directions to interconnect the plurality of closed ribs, in such a manner that some of the closed ribs, which are disposed at intermediate positions near tips of the ventilation fan, are at a further distance from the ventilation fan than the other closed ribs, which are disposed near the center and the outline. Accordingly, since the fan guard is convexly raised at a position corresponding to the tips of the ventilation fan, thereby guaranteeing a predetermined space between the fan guard and the tips where the airflow is fastest, the flow resistance and the flow-induced noise can be reduced.
摘要翻译：公开了一种用于空调的室外机。根据本发明的室外机包括具有空气入口和空气出口的壳体，可旋转地安装在壳体中的通风扇和连接到壳体以覆盖空气出口的风扇防护罩。这里，风扇防护罩包括顺序并同心地布置在其中心和轮廓之间的多个封闭肋，以及沿径向布置的多个径向肋，以使多个封闭肋互相连接，使得一些闭合设置在通风扇的顶端附近的中间位置处的肋与设置在中心和轮廓附近的其它封闭肋相比距离通风扇更远。因此，由于风扇护罩在与通气风扇的前端相对应的位置处凸起地升高，所以能够确保风扇防护件与气流最快的端部之间的预定空间，所以流动阻力和流动感应噪声可以是减少

3. 发明授权

US07670748B2 Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same 有权
标题翻译：环化合物，光致抗蚀剂组合物和使用其形成光刻胶图案的方法
公开(公告)号：US07670748B2
公开(公告)日：2010-03-02
申请号：US11638590
申请日：2006-12-14
申请人： Kyoung-Mi Kim , Young-Ho Kim , Jin-Baek Kim , Tae-Hwan Oh
发明人： Kyoung-Mi Kim , Young-Ho Kim , Jin-Baek Kim , Tae-Hwan Oh
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/114 , Y10S430/128 , Y10S430/146
摘要： A photoresist composition includes a cyclic compound, a photoacid generator, and an organic solvent. The cyclic compound includes any one selected from the group consisting of moieties having chemical structures represented by the formulae (1), (2), (3) and (4) set forth herein, and at least one moiety having the chemical structure represented by the formula (9) set forth herein.
摘要翻译：光致抗蚀剂组合物包括环状化合物，光酸产生剂和有机溶剂。环状化合物包括选自本文所述的由式（1），（2），（3）和（4）表示的化学结构的部分中的任何一种，以及至少一个具有由本文所述的式（9）。

4. 发明授权

US07312839B2 Light guiding plate, liquid crystal display device using the same, and method for displaying pictures thereof 有权
标题翻译：导光板，使用其的液晶显示装置及其图像的显示方法
公开(公告)号：US07312839B2
公开(公告)日：2007-12-25
申请号：US10763758
申请日：2004-01-22
申请人： Ik-Soo Lee , Jin-Baek Kim
发明人： Ik-Soo Lee , Jin-Baek Kim
IPC分类号： G02F1/1335
CPC分类号： G02B6/0038 , G02B6/0031 , G02B6/005 , G02B6/0051 , G02B6/0071 , G02F1/133615 , G02F2001/133616
摘要： A light guiding plate includes a light incident portion into which light is incident from a light source, a light reflecting pattern to reflect the light provided from the light incident portion, and a light transmitting surface to transmit the light reflected by the light reflecting pattern to a display panel. The light reflecting pattern includes light reflecting sections each of which has a first light reflecting plane that is inclined with respect to the light transmitting surface to face toward the light source, and a second light reflecting plane that is inclined with respect to the light transmitting surface and connected with an edge of the first light reflecting plane so that the light reflection sections each form a prism shape. The light reflecting sections respectively having the second light reflecting planes that are configured to have different areal sizes to control reflectivity of the respective light reflecting sections.
摘要翻译：导光板包括光入射部分，光从光源入射到其中，光反射图案反射从光入射部分提供的光;以及透光表面，用于将由光反射图案反射的光透射到显示面板。光反射图案包括光反射部分，每个光反射部分具有相对于透光表面倾斜以朝向光源的第一光反射面，以及相对于透光表面倾斜的第二光反射面并且与第一光反射面的边缘连接，使得光反射部分各自形成棱镜形状。分别具有被配置为具有不同面积尺寸的第二光反射面的光反射部分以控制各个光反射部分的反射率。

5. 发明授权

US06607867B1 Organometal-containing norbornene monomer, photoresist containing its polymer, manufacturing method thereof, and method of forming photoresist patterns 失效
标题翻译：含有机金属的降冰片烯单体，含有其聚合物的光致抗蚀剂，其制造方法和形成光致抗蚀剂图案的方法
公开(公告)号：US06607867B1
公开(公告)日：2003-08-19
申请号：US09790632
申请日：2001-02-23
申请人： Jin-Baek Kim , Jae-Jun Lee , Jae-Sung Kang
发明人： Jin-Baek Kim , Jae-Jun Lee , Jae-Sung Kang
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , C07F7/081 , G03F7/0045 , G03F7/0758 , Y10S430/106
摘要： The present invention relates to norbornene monomers with a novel functional group containing an organometal as shown in the following Formula (I) or (II), a photoresist containing its polymers, manufacturing method thereof, and a method of forming photoresist patterns. Unlike existing polymers for photoresist matrix, polymers made by norbornene monomers described in the present invention is a chemical amplification type induced by photosensitive acids and can result in difference in silicon content between the exposed area and unexposed area due to dissociation of side chain containing silicon. The difference in the silicon content results in different etch rate with respect to oxygen plasma which makes dry developing possible.
摘要翻译：本发明涉及具有如下式（I）或（II）所示的含有有机金属的新型官能团的降冰片烯单体，含有其聚合物的光致抗蚀剂，其制造方法和形成光致抗蚀剂图案的方法。不存在聚合物对于光致抗蚀剂基质，由本发明中描述的降冰片烯单体制成的聚合物是由光敏酸诱导的化学放大型，并且由于含有侧链的解离导致曝光区域与未曝光区域之间的硅含量差异。硅含量的差异导致相对于氧等离子体的不同蚀刻速率，这使得干式显影成为可能。

6. 发明授权

US06262222B1 Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom 失效
标题翻译：含有N-乙烯基内酰胺衍生物的共聚物，其制备方法和光致抗蚀剂
公开(公告)号：US06262222B1
公开(公告)日：2001-07-17
申请号：US09168067
申请日：1998-10-08
申请人： Jin Baek Kim , Min Ho Jung , Jong Ho Cheong
发明人： Jin Baek Kim , Min Ho Jung , Jong Ho Cheong
IPC分类号： C08G6914
CPC分类号： C08F226/06 , G03F7/0045 , G03F7/039
摘要： Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist.
摘要翻译：提供含有在3-位上保护的N-乙烯基内酰胺衍生物的共聚物，由下式表示。该共聚物用作适用于深紫外线工艺的光致抗蚀剂材料，从而可以获得高灵敏度和分辨率。此外，可以形成超细电路，并且可以通过使用光致抗蚀剂来实现PED稳定性的特别改进。

7. 发明授权

US5955606A N-vinyllactam derivatives and polymer thereof 失效
标题翻译： N-乙烯基内酰胺衍生物及其聚合物
公开(公告)号：US5955606A
公开(公告)日：1999-09-21
申请号：US26169
申请日：1998-02-19
申请人： Jin Baek Kim , Min Ho Jung , Kyeong Ho Chang
发明人： Jin Baek Kim , Min Ho Jung , Kyeong Ho Chang
IPC分类号： G03F7/039 , C07D205/08 , C07D207/26 , C07D207/273 , C07D207/277 , C07D211/74 , C07D223/10 , C07D405/12 , C07F7/10 , C07F9/553 , C08F26/00 , C08F26/06 , C08F26/10 , G03F7/004 , G03F7/038 , C07D207/00 , C07D211/36 , C08F22/38
CPC分类号： C07D207/273 , C07D207/277 , C07D223/10 , C07D405/12 , C08F26/06 , C08F26/10 , G03F7/0045 , G03F7/0387 , G03F7/039
摘要： N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention.
摘要翻译：提供保护在3-位的N-乙烯基内酰胺衍生物并由下式（I）表示。它们被聚合成用于半导体制造的微光刻的均聚物和共聚物。聚合物被用作适用于深UV工艺的光致抗蚀剂材料，从而可获得高灵敏度和高分辨率的照片。此外，可以形成超细电路，并且可以通过使用本发明的光致抗蚀剂来实现图案形成的特别改进。

8. 发明授权

US5792823A Vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer, vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer and preparation methods thereof 失效
公开(公告)号：US5792823A
公开(公告)日：1998-08-11
申请号：US814823
申请日：1997-03-11
申请人： Jin Baek Kim , Hyun Woo Kim , Jin Seuk Kim
发明人： Jin Baek Kim , Hyun Woo Kim , Jin Seuk Kim
IPC分类号： C08F261/02 , C08F8/00 , C08F8/02 , C08F8/28 , C08F16/38 , C08F216/14 , C08F216/38 , G03F7/004 , G03F7/039 , H01L21/027 , C08F224/00 , C08F216/12 , C08F218/08
CPC分类号： G03F7/039 , C08F216/1416 , C08F216/38 , C08F8/00 , C08F8/48 , G03F7/0045 , C08F216/06
摘要： A vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer, a vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer and a preparation method thereof are provided. The copolymers have excellent transparency because they are very low in optical absorbance in the deep uv range. In addition, the acetal structure in the backbone and in the substituted groups endows the photoresist of the copolymer with superior dry etch resistance.

9. 发明授权

US08668458B2 Fan and vibration-absorbing boss thereof 有权
标题翻译：风扇和减振器
公开(公告)号：US08668458B2
公开(公告)日：2014-03-11
申请号：US13067662
申请日：2011-06-17
申请人： Min Gi Cho , Jin Baek Kim , Seong Ho Kil , Young Jae Kim , Byung Ghun Kim
发明人： Min Gi Cho , Jin Baek Kim , Seong Ho Kil , Young Jae Kim , Byung Ghun Kim
IPC分类号： F04D29/34
CPC分类号： F04D29/023 , F04D29/329 , F04D29/668 , F05D2300/43
摘要： A fan including a hub part, a blade part and a vibration-absorbing boss, all constituent elements of which are injection molded, thereby reducing production costs. The fan has a minimized contact area between the vibration-absorbing boss and the hub part to prevent the vibration-absorbing boss from being deformed by high-temperature heat during insert injection molding of the hub part and the blade part while assuring sufficient strength of the hub part.
摘要翻译：一种风扇，其包括轮毂部分，叶片部分和减振凸台，其所有构成元件均注塑成型，从而降低生产成本。风扇在吸振凸台和轮毂部分之间具有最小化的接触面积，以防止在轮毂部分和叶片部分的插入注射成型期间通过高温热而使减振凸起变形，同时确保振动吸收凸台的足够的强度枢纽部分。

10. 发明申请

US20090075197A1 PHOTORESIST COMPOSITION, METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION AND INKJET PRINT HEAD 有权
标题翻译：光电组合物，使用光电组合物形成图案的方法和喷墨打印头
公开(公告)号：US20090075197A1
公开(公告)日：2009-03-19
申请号：US12040009
申请日：2008-02-29
申请人： Jin-baek KIM , Byung-ha Park , Kyu-sik Kim , Young-ung Ha , Su-min Kim
发明人： Jin-baek KIM , Byung-ha Park , Kyu-sik Kim , Young-ung Ha , Su-min Kim
IPC分类号： G03F7/004 , G03F7/20 , B41J2/05
CPC分类号： G03F7/038 , B41J2/1603 , B41J2/1631 , B41J2/1645 , G03F7/0385 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.
摘要翻译：包含由式1或2表示的含氧杂环丁烷的化合物，由式3或4表示的含环氧乙烷的化合物，光引发剂和溶剂的光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法和喷墨印刷头包括光致抗蚀剂组合物的聚合产物。光致抗蚀剂组合物提供抗内壁应力形成裂纹的聚合物，耐热性优异，耐化学性优异，粘合性优异，耐久性优异。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式