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1. 发明申请

US20180069020A1 PHOTORESIST POLYMERS, PHOTORESIST COMPOSITIONS, METHODS OF FORMING PATTERNS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES 审中-公开
公开(公告)号：US20180069020A1
公开(公告)日：2018-03-08
申请号：US15808116
申请日：2017-11-09
申请人： Jin PARK , Hyun-woo KIM , Jin-Kyu HAN , Cha-Won KOH
发明人： Jin PARK , Hyun-woo KIM , Jin-Kyu HAN , Cha-Won KOH
IPC分类号： H01L27/11582 , H01L21/3213 , H01L27/11575 , H01L27/1157 , H01L21/311 , G03F7/039 , G03F7/004 , G03F7/075
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0757 , G03F7/0758 , H01L21/31144 , H01L21/32139 , H01L21/76802 , H01L27/1157 , H01L27/11575 , H01L27/11582
摘要： A photoresist polymer includes a first repeating unit and a second repeating unit. The first repeating unit includes a fluorine leaving group that is configured to be removed by a photo-chemical reaction. The second repeating unit includes a silicon-containing leaving group that is configured to be removed by the fluorine leaving group when the fluorine leaving group is removed from the first repeating unit.

2. 发明授权

US09704722B2 Method of forming fine pattern and method of manufacturing integrated circuit device using the method 有权
公开(公告)号：US09704722B2
公开(公告)日：2017-07-11
申请号：US14958072
申请日：2015-12-03
申请人： Jeong-ju Park , Seung-chul Kwon , Eun-sung Kim , Jae-woo Nam , Shi-yong Yi , Hyun-woo Kim
发明人： Jeong-ju Park , Seung-chul Kwon , Eun-sung Kim , Jae-woo Nam , Shi-yong Yi , Hyun-woo Kim
IPC分类号： G03F7/40 , H01L21/311 , G03F7/00 , C08L53/00 , B82Y10/00 , G03F7/16 , G03F7/20 , B82Y40/00 , H01L21/02 , H01L21/027 , H01L21/3065 , H01L21/033 , H01L21/308 , H01L21/3213 , H01L27/108
CPC分类号： H01L21/31144 , B82Y10/00 , B82Y40/00 , C08L53/00 , G03F7/002 , G03F7/0035 , G03F7/165 , G03F7/2022 , G03F7/2059 , G03F7/40 , H01L21/02112 , H01L21/0274 , H01L21/0332 , H01L21/0337 , H01L21/3065 , H01L21/3086 , H01L21/32139 , H01L27/10855
摘要： A method of forming a fine pattern includes forming pillar-shaped guides regularly arranged on a feature layer, forming a block copolymer layer on the feature layer around the pillar-shaped guides, phase separating the block copolymer layer, forming first domains regularly arranged on the feature layer with the pillar-shaped guides, forming a second domain on the feature layer surrounding the pillar-shaped guides and the first domains, removing the first domains, and forming holes corresponding with the first domains in the feature layer by etching the feature layer using the pillar-shaped guides and the second domain as etch masks. The block copolymer layer includes a polymer blend having first and second polymer blocks having first and second repeat units, respectively, a first homopolymer and a second homopolymer. The first domains include the first polymer block and the first homopolymer, and the second domain includes the second polymer block and the second homopolymer.

3. 发明申请

US20160159974A1 PHOTORESIST POLYMERS AND METHODS OF FORMING PATTERNS 审中-公开
标题翻译：光电聚合物和形成图案的方法
公开(公告)号：US20160159974A1
公开(公告)日：2016-06-09
申请号：US14804775
申请日：2015-07-21
申请人： Jin PARK , Hyun-Woo KIM
发明人： Jin PARK , Hyun-Woo KIM
IPC分类号： C08G63/123 , C08G75/26 , G03F7/20 , G03F7/34 , G03F7/038 , G03F7/16
CPC分类号： C08F214/14 , C08F214/16 , C08F214/18 , C08G75/26 , G03F7/038 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/16 , G03F7/20 , G03F7/34 , G03F7/36
摘要： A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.
摘要翻译：由包含酯基的第一离去基团和能够与第一离去基团一起除去的第二离去基团的重复单元合成光致抗蚀剂聚合物。

4. 发明申请

US20150340246A1 METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME 审中-公开
标题翻译：形成图案的方法和使用该方法制造集成电路装置的方法
公开(公告)号：US20150340246A1
公开(公告)日：2015-11-26
申请号：US14712920
申请日：2015-05-15
申请人： Sang-yoon Woo , Hyun-woo Kim , Ju-hyung An , Jin-young Yoon
发明人： Sang-yoon Woo , Hyun-woo Kim , Ju-hyung An , Jin-young Yoon
IPC分类号： H01L21/3213 , G03F7/34 , G03F7/20 , G03F7/32 , H01L21/033 , G03F7/16
CPC分类号： H01L21/32139 , G03F7/0392 , G03F7/091 , G03F7/16 , G03F7/20 , G03F7/2041 , G03F7/32 , G03F7/34 , H01L21/0273 , H01L21/0276 , H01L21/0332 , H01L21/3081 , H01L21/31144 , H01L27/10894
摘要： A method of forming patterns may use an organic reflection-preventing film including a polymer having an acid-liable group. A photoresist film is formed on the organic reflection-preventing film. A first area selected from the photoresist film is exposed to generate an acid in the first area. Hydrophilicity of a first surface of the organic reflection-preventing film facing the first area of the photoresist film may be increased. The photoresist film including the exposed first area is developed to remove a non-exposed area of the photoresist film. The organic reflection-preventing film and a target layer are anisotropically etched by using the first area of the photoresist film as an etch mask.
摘要翻译：形成图案的方法可以使用包含具有酸性基团的聚合物的有机反射防止膜。在有机防反射膜上形成光致抗蚀剂膜。从光致抗蚀剂膜选择的第一区域被暴露以在第一区域中产生酸。可以增加面向光致抗蚀剂膜的第一区域的有机防反射膜的第一表面的亲水性。显影包括曝光的第一区域的光致抗蚀剂膜以除去光致抗蚀剂膜的未曝光区域。通过使用光致抗蚀剂膜的第一区域作为蚀刻掩模，各向异性蚀刻有机反射防止膜和目标层。

5. 发明授权

US09111535B2 Method and apparatus for decoding audio signal 有权
标题翻译：用于解码音频信号的方法和装置
公开(公告)号：US09111535B2
公开(公告)日：2015-08-18
申请号：US13011273
申请日：2011-01-21
申请人： Heesik Yang , Mi-Suk Lee , Hyun-Woo Kim , Jongmo Sung , Hyun-Joo Bae , Byung-Sun Lee
发明人： Heesik Yang , Mi-Suk Lee , Hyun-Woo Kim , Jongmo Sung , Hyun-Joo Bae , Byung-Sun Lee
IPC分类号： G10L21/02 , G10L19/093 , G10L19/24
CPC分类号： G10L19/093 , G10L19/24
摘要： Provided are a method and an apparatus for decoding an audio signal. A method for decoding an audio signal encoded by a layered sinusoidal pulse coding scheme using one or more sinusoidal pulses includes decoding the encoded audio signal, setting a smoothing frequency band of the decoded audio signal according to a layer structure of the layered sinusoidal pulse coding scheme, dividing the smoothing frequency band into one or more subbands, and smoothing the decoded audio signal on a subband-by-subband basis. Accordingly, a decoding operation time can be reduced and the quality of a synthesized signal can be improved by variably setting a frequency band to be smoothed, when decoding an audio signal encoded by a layered sinusoidal pulse coding scheme using one or more sinusoidal pulses.
摘要翻译：提供了一种用于对音频信号进行解码的方法和装置。一种使用一个或多个正弦脉冲对由分层正弦脉冲编码方案编码的音频信号进行解码的方法包括解码编码音频信号，根据分层正弦脉冲编码方案的层结构设置解码音频信号的平滑频带将平滑频带划分成一个或多个子带，并且以逐个子带为基础平滑解码的音频信号。因此，当使用一个或多个正弦脉冲对由分层正弦脉冲编码方案编码的音频信号进行解码时，可以通过可变地设置要平滑的频带来改善解码操作时间并且可以提高合成信号的质量。

6. 发明授权

US08951319B2 Air cleaner and controlling method thereof 有权
标题翻译：空气净化器及其控制方法
公开(公告)号：US08951319B2
公开(公告)日：2015-02-10
申请号：US12677206
申请日：2008-05-29
申请人： Hyun-Woo Kim , Jung-Min Moon , Jeong-Sang Seo , Kyeong-Bo Kim
发明人： Hyun-Woo Kim , Jung-Min Moon , Jeong-Sang Seo , Kyeong-Bo Kim
IPC分类号： B01D50/00 , B01D45/14 , B01D46/00 , B01D46/10 , B01D46/48
CPC分类号： B01D45/14 , B01D46/0065 , B01D46/10 , B01D46/48
摘要： An air cleaner adapted to filter out various types of substances through a filter assembly, as well as automatically remove the filtered substances, and a method for controlling the operation of such an air cleaner, are provided. The air cleaner may include a rotation brush unit installed on an inner wall surface of a front panel, facing a front surface of a mesh-type filter body and adapted to rotate while maintaining contact with the front surface of the filter body. When a suction operation is terminated, the rotation brush unit may to remove dust accumulated on the surface of the mesh-type filter body.
摘要翻译：一种适于通过过滤器组件过滤掉各种物质的空气净化器，以及自动除去过滤物质，以及一种控制这种空气净化器的操作的方法。空气滤清器可以包括安装在前面板的内壁表面上的旋转刷单元，面向网状过滤器本体的前表面并适于旋转，同时保持与过滤体的前表面的接触。当抽吸操作终止时，旋转刷单元可以去除积聚在网状过滤器主体的表面上的灰尘。

7. 发明申请

US20140336905A1 GOOD-EFFICIENCY RPM ZONE DISPLAY DEVICE FOR CONSTRUCTION MACHINERY 有权
标题翻译：用于建筑机械的高效率RPM区域显示设备
公开(公告)号：US20140336905A1
公开(公告)日：2014-11-13
申请号：US14364883
申请日：2011-12-15
申请人： Hyun-Woo Kim
发明人： Hyun-Woo Kim
IPC分类号： E02F9/26 , F02D28/00
CPC分类号： E02F9/26 , B60K35/00 , B60K2350/1092 , B60Y2200/14 , B60Y2200/15 , B60Y2200/22 , F02D28/00 , Y02T10/84
摘要： An apparatus for displaying an RPM section having a good efficiency for a construction machine is disclosed, which includes a control unit outputting different control signals depending on whether a current engine RPM belongs to a predetermined RPM section having the good efficiency, and a good-efficiency display unit selectively turning on or off an LED lamp according to the control signal output from the control unit. Since the RPM section having the good efficiency of the construction machine equipment is defined and the LED lamp for indicating the good-efficiency state is turned on if the current engine RPM belongs to the RPM section, a client can finally achieve good fuel efficiency in using the construction machine equipment.
摘要翻译：公开了一种用于显示具有良好效率的建筑机械的RPM部分的装置，其包括根据当前发动机RPM是否属于具有良好效率的预定RPM部分而输出不同控制信号的控制单元，并且具有良好的效率显示单元根据从控制单元输出的控制信号选择性地打开或关闭LED灯。由于定义了具有良好的施工机械设备效率的RPM部分，并且如果当前的发动机RPM属于RPM部分，则表示良好效率状态的LED灯被打开，因此客户端可以在使用中最终实现良好的燃料效率施工机械设备。

8. 发明申请

US20140327894A1 LITHOGRAPHY APPARATUS HAVING EFFECTIVE THERMAL ELECTRON ENHANCEMENT UNIT AND METHOD OF FORMING PATTERN USING THE SAME 有权
标题翻译：具有有效的热电子增强单元的成像装置及其形成图案的方法
公开(公告)号：US20140327894A1
公开(公告)日：2014-11-06
申请号：US14177278
申请日：2014-02-11
申请人： Cha-Won KOH , Jeon-Il LEE , Su-Min KIM , Hyun-Woo KIM , Jin PARK
发明人： Cha-Won KOH , Jeon-Il LEE , Su-Min KIM , Hyun-Woo KIM , Jin PARK
IPC分类号： G03F7/20
CPC分类号： G03F7/2022 , G03F7/0002
摘要： A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam.
摘要翻译：一种光刻设备及其使用方法，该设备包括：用于容纳其上具有光致抗蚀剂膜的基板的台; 主体单元，被配置为向光致抗蚀剂膜照射投影光束; 以及与所述载物台相邻的电场单元，所述电场单元被配置为向所述光致抗蚀剂膜施加电场，其中所述电场单元被配置为在所述投影束的照射之前或之前被接通，并且被配置为在投影光束的终止之后的同时或者在其终止之后被关闭。

9. 发明授权

US08867557B2 Method for providing selective service by selective service module and home gateway using the same 有权
标题翻译：通过选择性服务模块和家庭网关提供选择性服务的方法
公开(公告)号：US08867557B2
公开(公告)日：2014-10-21
申请号：US13339896
申请日：2011-12-29
申请人： Ki Man Jeon , Hyun Woo Kim , Jae Gi Son , Chang Won Park
发明人： Ki Man Jeon , Hyun Woo Kim , Jae Gi Son , Chang Won Park
IPC分类号： H04L12/28 , G06F3/14
CPC分类号： G06F3/1431 , G09G2370/10
摘要： A selective service providing method using a selective service module, and a home gateway using the same are provided. A home gateway includes a module port for mounting a service module which provides a particular service; a communication interface for receiving a function result of the service module mounted to the module port; a display interface connected with a display; and a processor for sending the function result received from the service module through the communication interface, to the display through the display interface. Thus, the user's intended service can be selectively provided using the selective service module.
摘要翻译：提供一种使用选择性服务模块的选择性服务提供方法，以及使用该选择性服务模块的家庭网关。家庭网关包括用于安装提供特定服务的服务模块的模块端口; 用于接收安装到模块端口的服务模块的功能结果的通信接口; 与显示器连接的显示界面; 以及处理器，用于通过通信接口将从服务模块接收到的功能结果通过显示接口发送到显示器。因此，可以使用选择性服务模块选择性地提供用户的预期服务。

10. 发明授权

US08715911B2 Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method 有权
公开(公告)号：US08715911B2
公开(公告)日：2014-05-06
申请号：US13188670
申请日：2011-07-22
申请人： Hyun-woo Kim , Hai-sub Na , Chil-hee Chung , Han-ku Cho
发明人： Hyun-woo Kim , Hai-sub Na , Chil-hee Chung , Han-ku Cho
IPC分类号： G06F7/26
CPC分类号： G03F7/0388 , G02B5/208 , G02B5/22 , G03F7/095 , G03F7/11
摘要： Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light.

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