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1. 发明授权

US08869925B2 Heat-exchanger protection structure 有权
标题翻译：热交换器保护结构
公开(公告)号：US08869925B2
公开(公告)日：2014-10-28
申请号：US13438284
申请日：2012-04-03
申请人： Jun Ogawa
发明人： Jun Ogawa
IPC分类号： B60K11/04 , B60R19/52
CPC分类号： B60K11/04
摘要： A heat-exchanger protection structure includes a vehicle-body-side member, a heat exchanger unit, and a plurality of attachment pins. The vehicle-body-side member includes an upper member and a lower member, which have a plurality of attachment holes, respectively. The heat exchanger unit includes a heat exchanger. The attachment pins are attachable on and detachable from the heat exchanger, having a fragile portion capable of being broken when external force larger than a predetermined value acts on the attachment pin. The heat exchanger unit is supported on the vehicle-body-side member by the attachment pins being inserted into the attachment holes. At least one of the fragile portions is broken in case of a vehicle crash to protect the heat exchanger against damage.
摘要翻译：一种热交换器保护结构，包括车身侧部件，热交换器单元和多个安装销。车体侧构件包括分别具有多个安装孔的上部构件和下部构件。热交换器单元包括热交换器。附接销可附接在热交换器上并可从该热交换器拆卸，具有在大于预定值的外力作用在附接销上时能够断裂的脆弱部分。热交换器单元通过插入到安装孔中的安装销支撑在车身侧部件上。在车辆碰撞的情况下，脆弱部分中的至少一个被破坏以保护热交换器免受损坏。

2. 发明授权

US08484322B2 Network reconfiguration method and router 失效
标题翻译：网络重配置方式和路由器
公开(公告)号：US08484322B2
公开(公告)日：2013-07-09
申请号：US12028159
申请日：2008-02-08
申请人： Jun Ogawa
发明人： Jun Ogawa
IPC分类号： G06F15/177
CPC分类号： H04L29/12207 , H04L29/12801 , H04L29/12933 , H04L45/00 , H04L45/02 , H04L45/04 , H04L45/28 , H04L45/586 , H04L61/20 , H04L61/6004 , H04L61/6068
摘要： Disclosed is a method for reconfiguring a network including a plurality of routers each having a redundant function.According to the method, when the network is separated into a plurality of partial networks each including at least one of the plurality of routers, each of the separated plurality of partial networks is reconfigured as a subnet so as to transfer packets between the each of the plurality of partial networks and a network other than the plurality of partial networks via one of the plurality of routers included in the each of the plurality of partial networks.
摘要翻译：公开了一种用于重新配置包括多个路由器的网络的方法，每个路由器具有冗余功能。根据该方法，当网络被分成多个部分网络，每个部分网络包括多个路由器中的至少一个时，将分离的多个部分网络中的每一个重新配置为子网，以便在每个路由器之间传送分组多个部分网络和经由多个部分网络中的每一个中包括的多个路由器之一的多个部分网络之外的网络。

3. 发明授权

US08426117B2 Mask pattern forming method, fine pattern forming method, and film deposition apparatus 有权
标题翻译：掩模图案形成方法，精细图案形成方法和成膜装置
公开(公告)号：US08426117B2
公开(公告)日：2013-04-23
申请号：US12567834
申请日：2009-09-28
申请人： Kazuhide Hasebe , Shigeru Nakajima , Jun Ogawa , Hiroki Murakami
发明人： Kazuhide Hasebe , Shigeru Nakajima , Jun Ogawa , Hiroki Murakami
IPC分类号： G03F7/26
CPC分类号： H01L21/027 , C23C16/02 , C23C16/402 , C23C16/403 , C23C16/45536 , G03F7/40 , H01L21/02164 , H01L21/02178 , H01L21/02219 , H01L21/02274 , H01L21/0228 , H01L21/0274 , H01L21/0337 , H01L21/0338 , H01L21/31138 , H01L21/31144 , H01L21/31608 , H01L21/31616 , H01L21/32139 , H01L21/76816
摘要： In a mask pattern forming method, a resist film is formed over a thin film, the resist film is processed into resist patterns having a predetermined pitch by photolithography, slimming of the resist patterns is performed, and an oxide film is formed on the thin film and the resist patterns after an end of the slimming step in a film deposition apparatus by supplying a source gas and an oxygen radical or an oxygen-containing gas. In the mask pattern forming method, the slimming and the oxide film forming are continuously performed in the film deposition apparatus.
摘要翻译：在掩模图案形成方法中，在薄膜上形成抗蚀剂膜，通过光刻将抗蚀剂膜加工成具有预定间距的抗蚀剂图案，进行抗蚀剂图案的减薄，并且在薄膜上形成氧化膜以及通过供给源气体和氧自由基或含氧气体在成膜装置中减肥步骤结束后的抗蚀剂图案。在掩模图案形成方法中，在成膜装置中连续进行纤维化和氧化膜形成。

4. 发明授权

US08357619B2 Film formation method for forming silicon-containing insulating film 有权
标题翻译：用于形成含硅绝缘膜的成膜方法
公开(公告)号：US08357619B2
公开(公告)日：2013-01-22
申请号：US13040565
申请日：2011-03-04
申请人： Kazuhide Hasebe , Shigeru Nakajima , Jun Ogawa
发明人： Kazuhide Hasebe , Shigeru Nakajima , Jun Ogawa
IPC分类号： H01L21/00
CPC分类号： C23C16/452 , C23C16/345 , C23C16/402 , C23C16/45536 , H01L21/02164 , H01L21/02219 , H01L21/0228 , H01L21/31612
摘要： A silicon-containing insulating film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas including di-iso-propylaminosilane gas and a second process gas including an oxidizing gas or nitriding gas. The film is formed by performing a plurality of times a cycle alternately including first and second steps. The first step performs supply of the first process gas, thereby forming an adsorption layer containing silicon on a surface of the target substrate. The second performs supply of the second process gas, thereby oxidizing or nitriding the adsorption layer on the surface of the target substrate. The second step includes an excitation period of supplying the second process gas to the process field while exciting the second process gas by an exciting mechanism.
摘要翻译：在目标基板上通过CVD形成含硅绝缘膜，在选择性地供给包含二异丙基氨基硅烷气体的第一工艺气体和包含氧化性气体或氮化气体的第二工艺气体的工艺领域中。通过交替地执行包括第一和第二步骤的循环的多次来形成膜。第一步进行第一处理气体的供给，由此在目标基板的表面形成含有硅的吸附层。第二工序气体供给第二工序气体，从而氧化或氮化目标衬底表面上的吸附层。第二步骤包括通过激励机构激励第二处理气体的第二处理气体供应给处理场的激励周期。

5. 发明授权

US08273562B2 Method for producing 4-hydroxy-L-isoleucine 有权
公开(公告)号：US08273562B2
公开(公告)日：2012-09-25
申请号：US13344110
申请日：2012-01-05
申请人： Tomohiro Kodera , Sergey Vasilievich Smirnov , Natalia Nikolaevna Samsonova , Veronika Aleksandrovna Kotliarova , Natalia Yurievna Rushkevich , Yury Ivanovich Kozlov , Vitaly Grigorievich Paraskevov, legal representative , Sakayu Shimizu , Jun Ogawa , Makoto Hibi
发明人： Tomohiro Kodera , Sergey Vasilievich Smirnov , Natalia Nikolaevna Samsonova , Veronika Aleksandrovna Kotliarova , Natalia Yurievna Rushkevich , Yury Ivanovich Kozlov , Sakayu Shimizu , Jun Ogawa , Makoto Hibi
IPC分类号： C12N9/02 , C12N15/00 , C12N1/20 , C12Q1/68 , C12P21/06 , C12P21/04 , C07H21/04
CPC分类号： C12N9/0069 , C12P13/06
摘要： A highly active L-isoleucine dioxygenase from Bacillus thuringiensis is provided. A method for manufacturing (2S,3R,4S)-4-hydroxy-L-isoleucine or a salt thereof by reacting L-isoleucine in an aqueous solvent in the presence of L-isoleucine dioxygenase and isolating (2S,3R,4S)-4-hydroxy-L-isoleucine is also provided.

6. 发明授权

US08222309B2 Elastomer porous material and method of producing the same 有权
标题翻译：弹性体多孔材料及其制造方法
公开(公告)号：US08222309B2
公开(公告)日：2012-07-17
申请号：US12745576
申请日：2008-12-01
申请人： Wataru Nemoto , Kazuya Takato , Asuka Koyanagi , Jun Ogawa , Atsushi Ikeda
发明人： Wataru Nemoto , Kazuya Takato , Asuka Koyanagi , Jun Ogawa , Atsushi Ikeda
IPC分类号： C08J5/02 , C08J9/00
CPC分类号： C08L83/04 , C08J9/283 , C08J2383/04 , G03G15/0808 , G03G15/0818 , G03G15/2057 , G03G21/0058 , G03G2215/1614
摘要： In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having an aspect ratio a/b, wherein a represents the maximum diameter of each cell and b represents the length of the minor axis of that cell as measured in a direction orthogonal thereto, of 1.3 or less account for 70% or more of all cells in the second observation region.
摘要翻译：在本发明的弹性体多孔体中，当以一定的倍率观察第一截面的第一观察区域中的细胞时，具有纵横比a / b的细胞，其中a表示每个细胞的最大直径，b表示在与其正交的方向上测量的该单元的短轴的长度为1.3以下，占第一观察区域中的全部细胞的70％以上，并且当第二截面的第二观察区域中的细胞正交以一定的倍率观察到第一横截面，具有纵横比a / b的单元，其中a表示每个单元的最大直径，b表示在与其正交的方向上测量的该单元的短轴的长度，为1.3以下，占第二观察区域的全部细胞的70％以上。

7. 发明授权

US08217090B2 Elastomer porous material and method of producing the same 有权
标题翻译：弹性体多孔材料及其制造方法
公开(公告)号：US08217090B2
公开(公告)日：2012-07-10
申请号：US12745669
申请日：2008-12-01
申请人： Wataru Nemoto , Kazuya Takato , Asuka Koyanagi , Jun Ogawa , Atsushi Ikeda
发明人： Wataru Nemoto , Kazuya Takato , Asuka Koyanagi , Jun Ogawa , Atsushi Ikeda
IPC分类号： C08J5/02 , C08J9/00
CPC分类号： C08J9/28 , B29C44/3403 , B29C67/202 , C08J2201/0504 , C08J2383/04 , Y10T428/26
摘要： In the elastomer porous material of the invention, when cells in a first observation region of a first cross section are observed at a certain magnification, cells having a shape factor SF2, which indicates the remoteness from complete roundness and is represented by the following formula: SF ⁢ ⁢ 2 = P 2 4 ⁢ π ⁢ ⁢ A × 100 (wherein A represents the area of each cell, and P represents the perimeter length thereof), of 130 or less account for 80% or more of all cells in the first observation region, and, when cells in a second observation region of a second cross section orthogonal to the first cross section are observed at a certain magnification, cells having a shape factor SF2, which indicates the remoteness from complete roundness and is represented by the same formula (wherein A represents the area of each cell, and P represents the perimeter length thereof), of 130 or less account for 80% or more of all cells in the second observation region.
摘要翻译：在本发明的弹性体多孔材料中，当以一定的倍率观察第一截面的第一观察区域的细胞时，具有形状因子SF2的细胞，其表示从完全圆度偏离并由下式表示： SF ud 2 = P 2 4＆pgr; ⁢A×100（其中A表示每个单元的面积，P表示其周长）为130以下，占第一观察区域的全部单元的80％以上，并且当第二观测区域中的单元在一定的放大倍数下观察与第一截面正交的第二截面的观察区域，具有形状因子SF2的单元，其表示从完全圆度偏离并由相同的式（其中A表示每个单元的面积，P表示其周长）为130以下，占第二观察区域的全部细胞的80％以上。

8. 发明授权

US08168270B2 Film formation method and apparatus for semiconductor process 有权
标题翻译：用于半导体工艺的成膜方法和装置
公开(公告)号：US08168270B2
公开(公告)日：2012-05-01
申请号：US11896752
申请日：2007-09-05
申请人： Kazuhide Hasebe , Yoshihiro Ishida , Takehiko Fujita , Jun Ogawa , Shigeru Nakajima
发明人： Kazuhide Hasebe , Yoshihiro Ishida , Takehiko Fujita , Jun Ogawa , Shigeru Nakajima
IPC分类号： C23C16/513
CPC分类号： C23C16/45525 , C23C16/45527 , C23C16/45542 , C23C16/45544
摘要： An oxide film is formed on a target substrate by CVD, in a process field to be selectively supplied with a first process gas including a source gas containing a film source element and no amino group, a second process gas including an oxidizing gas, and a third process gas including a preliminary treatment gas. A first step includes an excitation period of supplying the third process gas excited by an exciting mechanism, thereby performing a preliminary treatment on the target substrate by preliminary treatment gas radicals. A second step performs supply of the first process gas, thereby adsorbing the film source element on the target substrate. A third step includes an excitation period of supplying the second process gas excited by an exciting mechanism, thereby oxidizing the film source element adsorbed on the target substrate by oxidizing gas radicals.
摘要翻译：在目标基板上通过CVD形成氧化膜，在选择性地供给包括含有膜源元素而不含氨基的源气体的第一工艺气体的工艺领域中，包含氧化气体的第二工艺气体和包括初步处理气体的第三工艺气体。第一步骤包括供给由激励机构激励的第三处理气体的激发期，由此通过预处理气体基团对目标基板进行预处理。第二步进行第一处理气体的供给，从而将膜源元件吸附在目标基板上。第三步骤包括供给由激励机构激励的第二处理气体的激励周期，从而通过氧化气体基团氧化吸附在目标基板上的膜源元件。

9. 发明申请

US20110243276A1 WIRELESS DEMODULATION CIRCUIT 审中-公开
标题翻译：无线解调电路
公开(公告)号：US20110243276A1
公开(公告)日：2011-10-06
申请号：US13159180
申请日：2011-06-13
申请人： Jun OGAWA , Takahiro Ichikura
发明人： Jun OGAWA , Takahiro Ichikura
IPC分类号： H04L27/22
CPC分类号： H04L27/14 , H04L25/03343
摘要： Positions of a group of points of code shift including a plurality of points of code shift and present in each code-shift site of a multi-valued FSK code are identified, a point of code shift correction amount including an amount of displacement between a center point of code shift centered among the group of points of code shift in a direction of time axis and each of the points of code shift is calculated based on the identified positions of the points of code shift, and the point of code shift is corrected on a time axis based on the calculated point of code shift correction amount.
摘要翻译：识别包括在多值FSK码的每个代码位置中存在的多个代码点的代码位置组的位置，该代码偏移校正量包括中心位置之间的位移量在时间轴的方向上的码组移位的中心点的码移动点，并且基于所识别的码移位置的位置来计算每个码移位点，并且对码移位点进行修正基于所计算的代码偏移量校正量的时间轴。

10. 发明授权

US07959139B2 Noncontact rotating processor 失效
标题翻译：非接触旋转处理器
公开(公告)号：US07959139B2
公开(公告)日：2011-06-14
申请号：US12086481
申请日：2006-11-21
申请人： Satoshi Fukui , Jun Ogawa , Mitsugi Yamaguchi , Tetsuo Oka , Tomoe Sasahara , Shinsuke Miyazaki
发明人： Satoshi Fukui , Jun Ogawa , Mitsugi Yamaguchi , Tetsuo Oka , Tomoe Sasahara , Shinsuke Miyazaki
IPC分类号： B25B11/00
CPC分类号： H02K55/02 , F16C32/0438 , H02K49/108 , Y10T29/53961
摘要： Provided is a noncontact apparatus for performing rotating process to a subject to be processed, without contaminating environment in an airtight container. A spin head (1) is held on a holder (7) in an airtight container, a pinning force is generated between the spin head (1) and a Type-II superconductor (11), and the spin head 1 is floated by lifting the Type-II superconductor (11) by a lifting means (22). Then, rotating force generated by a noncontact rotating power transmitting body (18) arranged in the internal center of the Type-II superconductor (11) is subsequently generated on the side of the spin head (1) and the spin head (1) is rotated in conjunction with a driving motor (19).
摘要翻译：本发明提供一种用于对待处理对象进行旋转处理而不污染气密容器中的环境的非接触式装置。旋转头（1）被保持在密封容器中的保持器（7）上，在旋转头（1）和II型超导体（11）之间产生锁定力，并且旋转头1通过提升 II型超导体（11）通过提升装置（22）。然后，随后在旋转头（1）的一侧产生由配置在II型超导体（11）的内部中心的非接触旋转动力传递体（18）产生的旋转力，旋转头（1）为与驱动马达（19）一起旋转。

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