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    • 7. 发明申请
    • SEMICONDUCTOR STRUCTURE WITH BURIED THROUGH SUBSTRATE VIAS
    • 通过基板VIAS穿过的半导体结构
    • US20130299950A1
    • 2013-11-14
    • US13469494
    • 2012-05-11
    • Klaus HUMMLER
    • Klaus HUMMLER
    • H01L23/34H01L21/30H01L21/20
    • H01L23/481H01L21/3081H01L21/76898H01L23/3677H01L2924/0002H01L2924/00
    • Semiconductor structures and methods of fabrication are provided. One semiconductor structure includes a substrate, a semiconductor device layer supported by the substrate, and one or more buried through substrate vias (TSVs) disposed at least partially within the substrate. The buried through substrate via(s) is buried within the semiconductor substrate, and terminates below the semiconductor device layer of the semiconductor structure, and the semiconductor device layer extends over the buried through substrate via(s), thereby providing the buried through substrate via(s) without consuming space within the semiconductor device layer. A dielectric layer may be disposed between the substrate and the semiconductor device layer, with the TSV(s) terminating at a first end within the dielectric layer. Alternatively, the semiconductor device layer may be an epitaxially-grown layer extending over the TSV(s). Where a plurality of buried TSV(s) are employed, the vias may be disposed in a repeating pattern across the semiconductor structure.
    • 提供半导体结构和制造方法。 一个半导体结构包括衬底,由衬底支撑的半导体器件层以及至少部分地设置在衬底内的一个或多个掩埋通孔衬底通孔(TSV)。 埋入基板通孔(s)被埋在半导体衬底内,并且终止在半导体结构的半导体器件层的下面,并且半导体器件层在掩埋的衬底上延伸穿过(s),从而提供掩埋的衬底通孔 而不消耗半导体器件层内的空间。 电介质层可以设置在衬底和半导体器件层之间,其中TSV终止在电介质层内的第一端。 或者,半导体器件层可以是在TSV上延伸的外延生长层。 在采用多个掩埋TSV的情况下,通孔可以跨越半导体结构以重复图案设置。