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    • 4. 发明授权
    • Layout of memory strap cell
    • 记忆带细胞布局
    • US08704376B2
    • 2014-04-22
    • US13443467
    • 2012-04-10
    • Jacklyn ChangEvan Yong ZhangDerek C. TaoKuoyuan (Peter) Hsu
    • Jacklyn ChangEvan Yong ZhangDerek C. TaoKuoyuan (Peter) Hsu
    • H01L23/498
    • H01L27/1104H01L27/0207
    • A layout structure includes a substrate, a well, a first dopant area, a second dopant area, a first poly region, a third dopant area, a fourth dopant area, and a second poly region. The well is in the substrate. The first poly region is in between the first dopant area and the second dopant area. The second poly region is in between the third dopant area and the fourth dopant area. The first dopant area, the second dopant area, the third dopant area, and the fourth dopant area are in the well. The first dopant area is configured to serve as a source of a transistor and to receive a first voltage value from a first power supply source. The well is configured to serve as a bulk of the transistor and to receive a second voltage value from a second power supply source.
    • 布局结构包括衬底,阱,第一掺杂区,第二掺杂区,第一多晶区,第三掺杂区,第四掺杂区和第二多晶区。 井在底层。 第一多晶硅区位于第一掺杂区和第二掺杂区之间。 第二聚合区位于第三掺杂区和第四掺杂区之间。 第一掺杂剂区域,第二掺杂剂区域,第三掺杂剂区域和第四掺杂剂区域在井中。 第一掺杂剂区域被配置为用作晶体管的源极并且从第一电源接收第一电压值。 阱被配置为用作晶体管的体积并从第二电源接收第二电压值。
    • 8. 发明申请
    • LAYOUT OF MEMORY STRAP CELL
    • 记忆层细胞的布局
    • US20130264718A1
    • 2013-10-10
    • US13443467
    • 2012-04-10
    • Jacklyn CHANGEvan Yong ZHANGDerek C. TAOKuoyuan (Peter) HSU
    • Jacklyn CHANGEvan Yong ZHANGDerek C. TAOKuoyuan (Peter) HSU
    • H01L23/498
    • H01L27/1104H01L27/0207
    • A layout structure includes a substrate, a well, a first dopant area, a second dopant area, a first poly region, a third dopant area, a fourth dopant area, and a second poly region. The well is in the substrate. The first poly region is in between the first dopant area and the second dopant area. The second poly region is in between the third dopant area and the fourth dopant area. The first dopant area, the second dopant area, the third dopant area, and the fourth dopant area are in the well. The first dopant area is configured to serve as a source of a transistor and to receive a first voltage value from a first power supply source. The well is configured to serve as a bulk of the transistor and to receive a second voltage value from a second power supply source.
    • 布局结构包括衬底,阱,第一掺杂区,第二掺杂区,第一多晶区,第三掺杂区,第四掺杂区和第二多晶区。 井在底层。 第一多晶硅区位于第一掺杂区和第二掺杂区之间。 第二聚合区位于第三掺杂区和第四掺杂区之间。 第一掺杂剂区域,第二掺杂剂区域,第三掺杂剂区域和第四掺杂剂区域在井中。 第一掺杂剂区域被配置为用作晶体管的源极并且从第一电源接收第一电压值。 阱被配置为用作晶体管的体积并从第二电源接收第二电压值。