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    • 9. 发明授权
    • Apparatus for laminating a film on a wafer
    • 用于在薄片上层压薄膜的装置
    • US08517074B2
    • 2013-08-27
    • US13345756
    • 2012-01-09
    • Chin-Sen LaiMing-Tsung Chen
    • Chin-Sen LaiMing-Tsung Chen
    • B29C65/00B32B37/00B32B38/04B32B38/10
    • B32B38/10B32B43/00
    • An apparatus for laminating a film on a wafer includes a cutting mechanism and a laminating mechanism. The cutting mechanism has a cutting device disposed thereon for pre-cutting a dry film. The cutting mechanism has a supporter disposed adjacent to the cutting device for positioning a wafer. The cutting mechanism has a suction member disposed and corresponding to the cutting device for sucking the cut dry film to allow the cutting device pre-cutting the dry film and moving the cut dry film to the supporter. The laminating mechanism has a first lower member provided for positioning the wafer and a first upper member disposed above the first lower member for laminating the cut dry film with electrically heating to adhere the cut dry film on the wafer.
    • 用于在薄片上层压膜的设备包括切割机构和层压机构。 切割机构具有设置在其上的用于预切割干膜的切割装置。 切割机构具有邻近切割装置设置的用于定位晶片的支撑件。 切割机构具有设置成对应于切割装置的抽吸构件,用于吸入切割的干膜,以允许切割装置预切割干膜并将切割的干膜移动到支撑件。 层压机构具有设置用于定位晶片的第一下部构件和设置在第一下部构件上方的第一上部构件,用于通过电加热层压切割的干燥膜以将切割的干膜粘附在晶片上。