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    • 3. 发明授权
    • Method for correcting pattern data and method for manufacturing semiconductor device using same
    • 用于校正图案数据的方法和使用其制造半导体器件的方法
    • US07279259B2
    • 2007-10-09
    • US11102689
    • 2005-04-11
    • Takahisa ItoMitsuo SakuraiNaoyuki IshiwataYasuyuki Kushida
    • Takahisa ItoMitsuo SakuraiNaoyuki IshiwataYasuyuki Kushida
    • G03F9/00
    • G03F1/36
    • A method for correcting pattern data is provided which is capable of making a proper correction to data of a pattern having a complicated layout. A correction is made to pattern data affected by a proximity effect when a pattern is formed on a photomask or wafer according to design data for a semiconductor device, by detecting, according to the design data, a space portion being placed on a photomask or wafer and having a specified size occurring between patterns facing each other in a first direction, by producing pattern data corresponding to an assist pattern that fills the space portion, by detecting an edge to be corrected in a position being opposite to an edge of the assist pattern extending in a second direction between the patterns facing each other, out of framing portions of the pattern being placed in parallel and near to the assist pattern, by making a correction being independent of a correction to be made to other edge of the framing portion to the detected edge to be corrected, and by removing the assist pattern.
    • 提供一种用于校正图案数据的方法,其能够对具有复杂布局的图案的数据进行适当的校正。 根据设计数据,通过根据设计数据检测放置在光掩模或晶片上的空间部分,根据半导体器件的设计数据,在通过光掩模或晶片形成图案的情况下对邻近效应影响的图案数据进行校正 并且通过产生与填充空间部分的辅助图案相对应的图案数据,通过在与辅助图案的边缘相反的位置中检测要校正的边缘,发生在第一方向上彼此面对的图案之间的特定尺寸 在彼此面对的图案之间的第二方向上延伸出图案的框架部分平行并靠近辅助图案,通过进行校正而不是要对框架部分的其他边缘进行校正, 检测到的要校正的边缘,以及通过去除辅助图案。
    • 9. 发明授权
    • Power supply method to memory card and printing apparatus
    • 存储卡和打印设备的电源方式
    • US07607936B2
    • 2009-10-27
    • US11639920
    • 2006-12-14
    • Masahiko MizoguchiMitsuo SakuraiEiji Minami
    • Masahiko MizoguchiMitsuo SakuraiEiji Minami
    • H01R3/00
    • B41J29/393H01R27/00
    • A power supply method to a memory card that has been inserted into an apparatus that can be inserted with a plurality of types of memory cards, includes: detecting that one type of the memory card out of a plurality of the types of memory cards has been inserted into a card slot; judging whether or not there has been detected an insertion of a different type of memory card from the type of the memory card that has already been detected, within passing of a predetermined time from when the insertion of the one type of the memory card has been detected; specifying the type of the memory card that has been inserted, based on a result of the judgment; and supplying electric power to the specified type of memory card.
    • 已经插入到可插入多种类型的存储卡的装置中的存储卡的电源方法包括:检测多种类型的存储卡中的一种类型的存储卡已被 插入卡槽; 在从一种类型的存储卡插入已经被检测到的时间之后的预定时间内,判断是否已经从已经检测到的存储卡的类型检测到不同类型的存储卡的插入 检测到 基于判断结果指定插入的存储卡的类型; 并向指定类型的存储卡提供电力。
    • 10. 发明申请
    • METHOD OF MAKING PATTERN DATA, AND MEDIUM FOR STORING THE PROGRAM FOR MAKING THE PATTERN DATA
    • 制作图案数据的方法和存储图形数据的程序的介质
    • US20090241086A1
    • 2009-09-24
    • US12405265
    • 2009-03-17
    • Muneto SAITOKoichi SuzukiMitsuo SakuraiNorimasa Nagase
    • Muneto SAITOKoichi SuzukiMitsuo SakuraiNorimasa Nagase
    • G06F17/50
    • G06F17/5068G03F1/36G03F1/68
    • A method of making pattern data of a photomask pattern includes: the processes of adding, to each of first cells, information of the first cell higher than the first cell on the basis of a hierarchical structure; selecting, from the first cells included in one level of the hierarchical structure, the first cell identical to one of the first cells included in a level higher than the one level and the first cell placed inside two or more of the first cells included in a level immediately higher than the one level, and forming a cell group with the selected first cells; making pattern data of the first cells not included in the cell group in consideration of the optical proximity effect and forming a fourth cell group with second cells including the pattern data; and replacing the first cells with the corresponding second cells in input data.
    • 制作光掩模图案的图案数据的方法包括:基于层次结构向第一单元中的每一个添加高于第一单元的第一单元的信息的处理; 从包括在所述分级结构的一个级别中的所述第一个单元中选择与包括在高于所述一个级别的级别中的所述第一单元格中的一个单元相同的第一单元格,以及放置在包括在所述第一单元格中的所述第一单元格中的所述第一单元格内的所述第一单元格 水平立即高于一个水平,并形成具有所选择的第一个细胞的细胞组; 考虑到光学邻近效应,使未包含在单元组中的第一单元的图形数据形成,并且使第二单元组具有包括图形数据的第二单元; 并在输入数据中用相应的第二个单元替换第一个单元。