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    • 3. 发明申请
    • Method for filling through hole
    • 填充通孔的方法
    • US20070170065A1
    • 2007-07-26
    • US11645580
    • 2006-12-27
    • Naohiro Mashino
    • Naohiro Mashino
    • C25D5/02
    • C25D5/18C25D5/026C25D17/02H05K3/423H05K3/426H05K2201/09563H05K2203/1476
    • It is characterized in that in the case of filling a through hole formed in a substrate with a plated metal by electrolytic plating, the electrolytic plating is started by a high current density higher than Constant Current Density capable of fully filling the through hole when the electrolytic plating is performed with a current density held constant as a current density of the electrolytic plating, and the electrolytic plating is continued by being changed to a current density lower than the high current density by the time of reaching formation of a seam diameter in which an inside diameter does not decrease even when the electrolytic plating is continued after the electrolytic plating at the high current density is started.
    • 其特征在于,在通过电解电镀填充形成在基板上的电镀金属的通孔的情况下,电解电镀开始于高电流密度的高电流密度下,当电解质 以电流密度保持恒定的方式进行电镀,作为电解电镀的电流密度,并且通过在形成接缝直径的时刻通过改变为低于高电流密度的电流密度来继续进行电解电镀,其中 即使开始在高电流密度下的电解电镀之后继续进行电解电镀,内径也不降低。
    • 4. 发明授权
    • Multilayer wiring board and semiconductor device
    • 多层布线板和半导体器件
    • US06545353B2
    • 2003-04-08
    • US09848799
    • 2001-05-04
    • Naohiro Mashino
    • Naohiro Mashino
    • H01L2334
    • H01L23/49822H01L23/642H01L2224/16H01L2924/01019H01L2924/01078H01L2924/09701H01L2924/15311H01L2924/3011H05K1/053H05K1/056H05K1/141H05K1/162H05K3/445H05K3/4608H05K2201/0175H05K2201/0179H05K2201/09509H05K2201/09554H05K2201/09809H05K2203/0315
    • A multilayer wiring board comprises: a metal substrate as a core, a condenser dielectric layer formed to cover the metal layer, and a condenser electrode metal layer formed to cover the condenser dielectric layer, so that a condenser is defined by the metal substrate, the condenser dielectric layer and the condenser electrode metal layer. Integral with the structure of the wiring board is a discrete capacitor component with the metal substrate and the condenser electrode forming the two plates thereof with the dielectric layer there between. The condenser dielectric layer is provided with a first contact hole to communicate with the metal substrate and the condenser electrode metal layer is provided with a second contact hole to communicate with the first contact hole, the diameter of the second contact hole being larger than that of the first contact hole. An insulating layer is formed on the condenser electrode metal layer and is provided with a via hole to communicate with the metal substrate through the second and first contact holes. A metal substrate contact metal layer formed on an inner wall of the via hole, so that the metal substrate contact metal layer comes into electrical contact with the metal substrate.
    • 多层布线板包括:作为芯的金属基板,形成为覆盖金属层的电容器电介质层和形成为覆盖电容器电介质层的电容器电极金属层,从而由金属基板限定冷凝器, 电容电介质层和电容器电极金属层。 与布线板的结构一体是具有分离的电容器部件,其中金属基板和电容器电极形成其两个板之间的介电层。 电容电介质层设置有与金属基板连通的第一接触孔,并且电容器电极金属层设置有与第一接触孔连通的第二接触孔,第二接触孔的直径大于 第一接触孔。 绝缘层形成在电容器电极金属层上,并且设置有通孔,以通过第二和第一接触孔与金属基板连通。 金属基板接触金属层形成在通孔的内壁上,金属基板接触金属层与金属基板电接触。
    • 10. 发明授权
    • Process for manufacturing a wiring board having a via
    • 具有通路的布线基板的制造方法
    • US07205230B2
    • 2007-04-17
    • US10914227
    • 2004-08-10
    • Naohiro Mashino
    • Naohiro Mashino
    • H01L21/44
    • H05K3/22H01L2924/0002H05K3/102H05K3/423H05K3/4602H05K2201/09536H05K2201/09563H05K2201/096H05K2201/09745H05K2201/1025H05K2203/107H05K2203/128H01L2924/00
    • A process for manufacturing a wiring board comprising a substrate made of an insulation material and having first and second surfaces, first and second conductor patterns formed on the first and second surfaces, respectively, and a via conductor penetrating the substrate to electrically connect the first conductor pattern with the second conductor pattern; the process comprising the following steps of: forming the substrate with a through-hole penetrating thereto and defining openings at the first and second surfaces, respectively; plating the substrate with a metal so that a metal layer having a predetermined thickness is formed on the respective first and second surfaces of the substrate and the through-hole is substantially filled with the metal to be the via conductor; irradiating a laser beam, as a plurality of spots, around a metal-less portion of the plated metal, such as a dimple or seam, at positions corresponding to the openings of the through-hole, so that the a part of the plated metal melts to fill the metal-less portion with the molten metal.
    • 一种制造布线板的方法,包括由绝缘材料制成并具有第一和第二表面的基底,分别形成在第一和第二表面上的第一和第二导体图案,以及穿过基板的通孔导体,以将第一导体 图案与第二导体图案; 该方法包括以下步骤:用穿透其的通孔形成基底并分别在第一和第二表面处限定开口; 用金属电镀基板,使得在基板的相应的第一和第二表面上形成具有预定厚度的金属层,并且通孔基本上填充有作为通孔导体的金属; 在对应于通孔的开口的位置处,将激光束作为多个点照射在电镀金属的无金属部分(例如凹坑或接缝)周围,使得电镀金属的一部分 熔化以用熔融金属填充无金属部分。