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1. 发明授权

US09122178B2 Object inspection systems and methods 有权
标题翻译：物体检查系统和方法
公开(公告)号：US09122178B2
公开(公告)日：2015-09-01
申请号：US13388267
申请日：2010-07-02
申请人： Vitalii Ivanov , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Luigi Scaccabarozzi , Nikolay Nikolaevich Iosad
发明人： Vitalii Ivanov , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Luigi Scaccabarozzi , Nikolay Nikolaevich Iosad
IPC分类号： G01J3/28 , G01N21/00 , G03F1/84 , G01N21/64 , G01N21/65 , G01N21/94 , G01N21/95 , G01N21/956 , G03F1/24
CPC分类号： G03F1/84 , G01N21/6408 , G01N21/6489 , G01N21/65 , G01N21/94 , G01N21/9501 , G01N21/956 , G03F1/24
摘要： Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the object to be inspected due to their different materials. Time resolved spectroscopy and/or energy resolved spectroscopy of secondary photon emission from the surface of the object can be used to obtain Raman and photoluminescence spectra. The objects to be inspected can for example be a patterning device as used in a lithographic process, for example a reticle, in which case the presence of metal, metal oxide or organic particles can be detected, for example. The methods and apparatus are highly sensitive, for example, being able to detect small particles (sub 100 nm, particularly sub 50 nm) on the patterned side of an EUV reticle.
摘要翻译：用于检查物体的方法和系统包括使用光谱技术来检测物体表面上的不需要的颗粒，这是由于不同的物质与不同的物质相比，由于不同的物质而与被检查物体的不同响应。可以使用来自物体表面的二次光子发射的时间分辨光谱和/或能量分辨光谱来获得拉曼和光致发光光谱。待检查的物体可以是例如在光刻工艺中使用的图案形成装置，例如掩模版，在这种情况下，例如可以检测到金属，金属氧化物或有机颗粒的存在。所述方法和装置是高度敏感的，例如能够检测EUV掩模版图案侧的小颗粒（小于100nm，特别是低于50nm）。

2. 发明授权

US08982318B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08982318B2
公开(公告)日：2015-03-17
申请号：US12566073
申请日：2009-09-24
申请人： Nikolay Nikolaevich Iosad , Cheng-Qun Gui
发明人： Nikolay Nikolaevich Iosad , Cheng-Qun Gui
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A lithographic method, among things is disclosed. The method includes using information at least indicative of a desired shape or size of a constituent part of a device to implement the desired shape or size of the constituent part of the device, the desired shape or size being related to a measured property of a layer of material in which the constituent part of the device is to be created, at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements that would be necessary to create in a radiation beam a pattern which is sufficient to implement the desired shape or size of the constituent part of the device when creating the constituent part of the device.
摘要翻译：披露了一种平版印刷方法。该方法包括使用至少指示装置的组成部分的期望形状或尺寸的信息来实现装置的组成部分的期望形状或尺寸，所需形状或尺寸与层的测量性质相关其中将要创建设备的组成部分的材料，至少一部分实现方式包括确定多个可独立控制的元件的配置，该组件将在辐射束中产生足以实现的模式所必需的当设备的组成部分创建时，设备的组成部分的期望形状或尺寸。

3. 发明授权

US08383325B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08383325B2
公开(公告)日：2013-02-26
申请号：US12553390
申请日：2009-09-03
申请人： Nikolay Nikolaevich Iosad , Cheng-Qun Gui
发明人： Nikolay Nikolaevich Iosad , Cheng-Qun Gui
IPC分类号： G03F7/20 , G03F7/26
CPC分类号： G03F7/164 , G03F7/002 , G03F7/0047 , G03F7/28 , G03G13/283 , G03G13/286 , H01L21/31691
摘要： A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.
摘要翻译：光刻方法包括将干燥形式的颗粒提供在基材上或者提供在基材上的材料上，用一定剂量的辐射照射一个或多个颗粒，辐射剂量足以确保至少一个颗粒的一个颗粒或更多的颗粒结合到基板上，或者与设置在基板上的材料接合，以及从基板上提供的颗粒，或者从基板上提供的材料去除未结合到基板上的材料，或者去除设置在基板上的材料。

4. 发明申请

US20120127467A1 Object Inspection Systems and Methods 有权
标题翻译：对象检查系统和方法
公开(公告)号：US20120127467A1
公开(公告)日：2012-05-24
申请号：US13388267
申请日：2010-07-02
申请人： Vitalii Ivanov , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Luigi Scaccabarozzi , Nikolay Nikolaevich Iosad
发明人： Vitalii Ivanov , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Luigi Scaccabarozzi , Nikolay Nikolaevich Iosad
IPC分类号： G01J3/28
CPC分类号： G03F1/84 , G01N21/6408 , G01N21/6489 , G01N21/65 , G01N21/94 , G01N21/9501 , G01N21/956 , G03F1/24
摘要： Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the object to be inspected due to their different materials. Time resolved spectroscopy and/or energy resolved spectroscopy of secondary photon emission from the surface of the object can be used to obtain Raman and photoluminescence spectra. The objects to be inspected can for example be a patterning device as used in a lithographic process, for example a reticle, in which case the presence of metal, metal oxide or organic particles can be detected, for example. The methods and apparatus are highly sensitive, for example, being able to detect small particles (sub 100 nm, particularly sub 50 nm) on the patterned side of an EUV reticle.
摘要翻译：用于检查物体的方法和系统包括使用光谱技术来检测物体表面上的不需要的颗粒，这是由于不同的物质与不同的物质相比，由于不同的物质而与被检查物体的不同响应。可以使用来自物体表面的二次光子发射的时间分辨光谱和/或能量分辨光谱来获得拉曼和光致发光光谱。待检查的物体可以是例如在光刻工艺中使用的图案形成装置，例如掩模版，在这种情况下，例如可以检测到金属，金属氧化物或有机颗粒的存在。所述方法和装置是高度敏感的，例如能够检测EUV掩模版图案侧的小颗粒（小于100nm，特别是低于50nm）。

5. 发明申请

US20100068416A1 LITHOGRAPHIC APPARATUS AND METHOD 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：US20100068416A1
公开(公告)日：2010-03-18
申请号：US12553390
申请日：2009-09-03
申请人： Nikolay Nikolaevich Iosad , Cheng-Qun Gui
发明人： Nikolay Nikolaevich Iosad , Cheng-Qun Gui
IPC分类号： B05D7/24 , B05C9/08
CPC分类号： G03F7/164 , G03F7/002 , G03F7/0047 , G03F7/28 , G03G13/283 , G03G13/286 , H01L21/31691
摘要： A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.
摘要翻译：光刻方法包括将干燥形式的颗粒提供在基材上或者提供在基材上的材料上，用一定剂量的辐射照射一个或多个颗粒，辐射剂量足以确保至少一个颗粒的一个颗粒或更多的颗粒结合到基板上，或者与设置在基板上的材料接合，以及从基板上提供的颗粒，或者从基板上提供的材料去除未结合到基板上的材料，或者去除设置在基板上的材料。

6. 发明申请

US20120305892A1 ELECTRONIC DEVICE, METHOD OF MANUFACTURING A DEVICE AND APPARATUS FOR MANUFACTURING A DEVICE 审中-公开
标题翻译：电子设备，制造设备的方法和用于制造设备的设备
公开(公告)号：US20120305892A1
公开(公告)日：2012-12-06
申请号：US13314613
申请日：2011-12-08
申请人： Martin Thornton , Nikolay Nikolaevich Iosad
发明人： Martin Thornton , Nikolay Nikolaevich Iosad
IPC分类号： H01L51/30 , H01L21/306 , H01L51/40 , B82Y30/00
CPC分类号： H01L51/0019 , B82Y10/00 , B82Y30/00 , H01L2251/105
摘要： An electronic device comprises an in-plane component formed in an organic semiconductor layer, desirably graphene, on a flexible substrate. The component is formed using imprint lithography to create a trench through the organic semiconductor layer in a roll-to-roll process. The number of process steps required is limited to allow manufacture of the device in a single integrated apparatus.
摘要翻译：电子器件包括在柔性衬底上形成在有机半导体层中，期望为石墨烯的面内元件。使用压印光刻形成部件，以在卷对卷过程中产生通过有机半导体层的沟槽。所需的处理步骤的数量被限制为允许在单个集成设备中制造该设备。

7. 发明授权

US09645502B2 Lithographic apparatus, programmable patterning device and lithographic method 有权
公开(公告)号：US09645502B2
公开(公告)日：2017-05-09
申请号：US14006292
申请日：2012-03-07
申请人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Johannes Onvlee , Lucas Henricus Johannes Stevens , Sander Frederik Wuister , Nikolay Nikolaevich Iosad
发明人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Johannes Onvlee , Lucas Henricus Johannes Stevens , Sander Frederik Wuister , Nikolay Nikolaevich Iosad
IPC分类号： G03B27/42 , G03F7/20 , G02F1/29 , G02F1/13
CPC分类号： G03F7/70191 , G02F1/1303 , G02F1/29 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.

8. 发明申请

US20140071421A1 LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD 有权
标题翻译：光栅设备，可编程格式设备和光刻方法
公开(公告)号：US20140071421A1
公开(公告)日：2014-03-13
申请号：US14006292
申请日：2012-03-07
申请人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Johannes Onvlee , Lucas Henricus Johannes Stevens , Sander Frederik Wuister , Nikolay Nikolaevich Iosad
发明人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Johannes Onvlee , Lucas Henricus Johannes Stevens , Sander Frederik Wuister , Nikolay Nikolaevich Iosad
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02F1/1303 , G02F1/29 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.
摘要翻译：在一个实施例中，公开了一种光刻设备，其包括调制器，该调制器被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统被配置为将经调制的光束投影到基板上。调制器包括偏转器，用于相对于曝光区域移位多个光束。

9. 发明申请

US20100081072A1 LITHOGRAPHIC APPARATUS AND METHOD 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：US20100081072A1
公开(公告)日：2010-04-01
申请号：US12566073
申请日：2009-09-24
申请人： Nikolay Nikolaevich IOSAD , Cheng-Qun GUI
发明人： Nikolay Nikolaevich IOSAD , Cheng-Qun GUI
IPC分类号： G03F7/20 , G03B27/54
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A lithographic method, among things is disclosed. The method includes using information at least indicative of a desired shape or size of a constituent part of a device to implement the desired shape or size of the constituent part of the device, the desired shape or size being related to a measured property of a layer of material in which the constituent part of the device is to be created, at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements that would be necessary to create in a radiation beam a pattern which is sufficient to implement the desired shape or size of the constituent part of the device when creating the constituent part of the device.
摘要翻译：披露了一种平版印刷方法。该方法包括使用至少指示装置的组成部分的期望形状或尺寸的信息来实现装置的组成部分的期望形状或尺寸，所需形状或尺寸与层的测量性质相关其中将要创建设备的组成部分的材料，至少一部分实现方式包括确定多个可独立控制的元件的配置，该组件将在辐射束中产生足以实现的模式所必需的当设备的组成部分创建时，设备的组成部分的期望形状或尺寸。

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