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    • 1. 发明授权
    • Gallium nitride-based compound semiconductor light-emitting device
    • 氮化镓系化合物半导体发光元件
    • US08258541B2
    • 2012-09-04
    • US12097139
    • 2006-12-13
    • Noritaka MurakiHironao Shinohara
    • Noritaka MurakiHironao Shinohara
    • H01L33/00
    • H01L33/22H01L21/0242H01L21/0254H01L21/02573H01L21/0262H01L33/32H01L33/38
    • A gallium nitride-based compound semiconductor light-emitting device including a positive electrode having openings, which is excellent in light extraction efficiency. The gallium nitride-based compound semiconductor light-emitting device includes a substrate; an n-type semiconductor layer, a light-emitting layer, and a p-type semiconductor layer, the layers being formed of a gallium nitride-based compound semiconductor and being stacked in this order on the substrate; a positive electrode which is provided so as to contact the p-type semiconductor layer; and a negative electrode which is provided so as to contact the n-type semiconductor layer, where the positive electrode is a positive electrode having openings, and at least a portion of the surface of the p-type semiconductor layer corresponding to the openings are roughened surface derived from spherical particulates.
    • 一种氮化镓系化合物半导体发光元件,具有具有开口的正极,光提取效率优异。 氮化镓系化合物半导体发光元件包括:基板; n型半导体层,发光层和p型半导体层,所述层由氮化镓系化合物半导体形成,并依次层叠在基板上; 设置为与p型半导体层接触的正极; 以及负极,其设置成与n型半导体层接触,其中正极是具有开口的正极,并且与开口相对应的p型半导体层的表面的至少一部分被粗糙化 表面衍生自球形微粒。
    • 4. 发明授权
    • Gallium nitride-based compound semiconductor light-emitting device
    • 氮化镓系化合物半导体发光元件
    • US07847314B2
    • 2010-12-07
    • US12065970
    • 2006-09-05
    • Hironao ShinoharaHisayuki MikiNoritaka Muraki
    • Hironao ShinoharaHisayuki MikiNoritaka Muraki
    • H01L21/20H01L21/00
    • H01L33/025H01L33/0095H01L33/32H01L33/42
    • It is an object of the present invention to provide a gallium nitride-based compound semiconductor light-emitting device that is excellent in light output efficiency and needs only a low driving voltage (Vf). The inventive gallium nitride-based compound semiconductor light-emitting device includes an n-type semiconductor layer, a light-emitting layer and a p-type semiconductor layer formed of a gallium nitride-based compound semiconductor and stacked in this order on a substrate, and positive and negative electrodes so arranged as to be in contact with the p-type semiconductor layer and the n-type semiconductor layer, respectively, wherein a region in which a p-type impurity and hydrogen atoms are co-present exists in the p-type semiconductor layer in contact with the positive electrode, and at least a portion, which is in contact with the p-type semiconductor layer, of the positive electrode, is formed of an n-type electro-conductive light transmitting material.
    • 本发明的目的是提供一种氮化镓系化合物半导体发光元件,该氮化镓系化合物半导体发光元件的光输出效率优异,仅需要低驱动电压(Vf)。 本发明的氮化镓系化合物半导体发光元件包括n型半导体层,发光层和由氮化镓系化合物半导体形成的p型半导体层,并依次层叠在基板上, 以及分别与p型半导体层和n型半导体层接触的正极和负极,其中在p中存在p型杂质和氢原子共存的区域 与正极接触的至少一部分与正极的p型半导体层接触的至少一部分由n型导电透光材料形成。
    • 7. 发明申请
    • Gallium Nitride-Based Compound Semiconductor Light Emitting Device
    • 基于氮化镓的复合半导体发光器件
    • US20080315237A1
    • 2008-12-25
    • US11597413
    • 2005-05-19
    • Koji KameiMunetaka WatanabeNoritaka MurakiYasushi Ohno
    • Koji KameiMunetaka WatanabeNoritaka MurakiYasushi Ohno
    • H01L33/00
    • H01L33/42H01L33/32
    • This gallium nitride-based compound semiconductor light emitting device includes an n-type semiconductor layer, a light emitting layer, and a p-type semiconductor layer that are composed of gallium nitride-based compound semiconductors and are deposited in that order on a substrate, and further includes a negative electrode and a positive electrode that are in contact with the n-type semiconductor layer and the p-type semiconductor layer, respectively, wherein the positive electrode has a translucent electrode composed of a three-layer structure including a contact metal layer that contacts at least the p-type semiconductor layer, a current diffusion layer provided on the contact metal layer and having conductivity greater than that of the contact metal layer, and a bonding pad layer provided on the current diffusion layer, and a mixed positive electrode-metal layer including a metal that forms the contact metal layer is present in a positive electrode side surface of the p-type semiconductor layer.
    • 该氮化镓系化合物半导体发光元件包括由氮化镓系化合物半导体构成的n型半导体层,发光层和p型半导体层,并依次沉积在基板上, 并且还包括分别与n型半导体层和p型半导体层接触的负极和正极,其中所述正极具有由包括接触金属的三层结构构成的透光性电极 至少与p型半导体层接触的层,设置在接触金属层上并具有大于接触金属层的导电性的电流扩散层,以及设置在电流扩散层上的接合焊盘层,以及混合正极 包含形成接触金属层的金属的电极 - 金属层存在于p型半导体的正极侧表面上 导体层。
    • 8. 发明授权
    • Gallium nitride-based compound semiconductor light-emitting device
    • 氮化镓系化合物半导体发光元件
    • US07402830B2
    • 2008-07-22
    • US10592759
    • 2005-03-15
    • Munetaka WatanabeNoritaka MurakiYasushi Ohno
    • Munetaka WatanabeNoritaka MurakiYasushi Ohno
    • H01L29/06
    • H01L33/007H01L33/0095
    • The inventive gallium nitride compound semiconductor light-emitting device comprises a substrate; an n-type semiconductor layer, a light-emitting layer, a p-type semiconductor layer, the layers being successively provided atop the substrate and being formed of a gallium nitride compound semiconductor; a negative electrode provided on the n-type semiconductor layer at a certain portion thereof, the portion being exposed by partial, depthwise removal of the light-emitting layer and the p-type semiconductor layer altogether through reactive ion etching; and a positive electrode provided on the remaining p-type semiconductor layer, wherein the gallium nitride compound semiconductor light-emitting device is produced through reactive ion etching by use of silicon tetrachloride as the sole etching gas.
    • 本发明的氮化镓化合物半导体发光器件包括衬底; n型半导体层,发光层,p型半导体层,这些层被连续地设置在衬底上并由氮化镓化合物半导体形成; 设置在n型半导体层的某一部分的负极,该部分通过反应离子蚀刻部分地深度地去除发光层和p型半导体层而被曝光; 以及设置在剩余p型半导体层上的正极,其中通过使用四氯化硅作为唯一蚀刻气体通过反应离子蚀刻制造氮化镓系化合物半导体发光器件。
    • 9. 发明申请
    • Gallium nitride-based compound semiconductor light-emitting device
    • 氮化镓系化合物半导体发光元件
    • US20070187666A1
    • 2007-08-16
    • US10592759
    • 2005-03-15
    • Munetaka WatanabeNoritaka MurakiYasushi Ohno
    • Munetaka WatanabeNoritaka MurakiYasushi Ohno
    • H01L29/06
    • H01L33/007H01L33/0095
    • An object of the present invention is to provide a gallium nitride compound semiconductor light-emitting device having excellent heat resistance, which device is resistive to an increase in the forward operation voltage (VF) caused by mild heating performed after formation of the light-emitting device (e.g., heating to about 300° C. during mounting of the light-emitting device). The inventive gallium nitride compound semiconductor light-emitting device comprises a substrate; an n-type semiconductor layer, a light-emitting layer, a p-type semiconductor layer, the layers being successively provided atop the substrate and being formed of a gallium nitride compound semiconductor; a negative electrode provided on the n-type semiconductor layer at a certain portion thereof, the portion being exposed by partial, depthwise removal of the light-emitting layer and the p-type semiconductor layer altogether through reactive ion etching; and a positive electrode provided on the remaining p-type semiconductor layer, wherein the gallium nitride compound semiconductor light-emitting device is produced through reactive ion etching by use of silicon tetrachloride as the sole etching gas.
    • 本发明的目的是提供一种耐热性优异的氮化镓系化合物半导体发光元件,其特征在于,能够抑制由形成发光后的温和加热引起的正向工作电压(VF)的上升 装置(例如,在安装发光装置期间加热至约300℃)。 本发明的氮化镓化合物半导体发光器件包括衬底; n型半导体层,发光层,p型半导体层,这些层被连续地设置在衬底上并由氮化镓化合物半导体形成; 设置在n型半导体层的某一部分的负极,该部分通过反应离子蚀刻部分地深度地去除发光层和p型半导体层而被曝光; 以及设置在剩余p型半导体层上的正极,其中通过使用四氯化硅作为唯一蚀刻气体通过反应离子蚀刻制造氮化镓系化合物半导体发光器件。