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1. 发明授权

US08569693B2 Distortion free stigmation of a TEM 有权
标题翻译： TEM的失真自由度
公开(公告)号：US08569693B2
公开(公告)日：2013-10-29
申请号：US13446908
申请日：2012-04-13
申请人： Maarten Bischoff , Alexander Henstra , Uwe Luecken , Peter Christiaan Tiemeijer
发明人： Maarten Bischoff , Alexander Henstra , Uwe Luecken , Peter Christiaan Tiemeijer
IPC分类号： G21K7/00
CPC分类号： H01J37/26 , H01J37/153 , H01J2237/1532
摘要： A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion. Further, a method of using said three stigmators, comprises exciting the first stigmator to reduce astigmatism when imaging the sample, exciting the second stigmator to reduce astigmatism when imaging the diffraction plane, and exciting the third stigmator to reduce the linear distortion.
摘要翻译：带电粒子装置配备有位于物镜和检测器系统之间的第三标示器，结果为了减少线性失真产生了第三自由度。此外，使用所述三个标记器的方法包括：激光所述第一标示器以在对所述样品进行成像时减少散光，激励所述第二标示器以在对所述衍射平面进行成像时减少散光，以及激励所述第三施放器以减少所述线性失真。

2. 发明申请

US20100072366A1 METHOD FOR CORRECTING DISTORTIONS IN A PARTICLE-OPTICAL APPARATUS 有权
标题翻译：用于校正颗粒光学设备中的失真的方法
公开(公告)号：US20100072366A1
公开(公告)日：2010-03-25
申请号：US12564617
申请日：2009-09-22
申请人： Peter Christiaan Tiemeijer , Uwe Luecken , Alan Frank De Jong , Hendrik Nicolaas Slingerland
发明人： Peter Christiaan Tiemeijer , Uwe Luecken , Alan Frank De Jong , Hendrik Nicolaas Slingerland
IPC分类号： G01N23/04 , H01J37/26
CPC分类号： H01J37/153 , H01J37/263 , H01J2237/1534 , H01J2237/2823
摘要： The invention relates to a method for correcting distortions introduced by the projection system (106) of a TEM. As known to the person skilled in the art distortions may limit the resolution of a TEM, especially when making a 3D reconstruction of a feature using tomography. Also when using strain analysis in a TEM the distortions may limit the detection of strain.To this end the invention discloses a detector equipped with multipoles (152), the multipoles warping the image of the TEM in such a way that distortions introduced by the projection system are counteracted. The detector may further include a CCD or a fluorescent screen (151) for detecting the electrons.
摘要翻译：本发明涉及一种用于校正由TEM的投影系统（106）引入的失真的方法。如本领域技术人员所知，失真可能限制TEM的分辨率，特别是当使用层析成像进行特征的3D重建时。此外，当在TEM中使用应变分析时，失真可能会限制应变的检测。为此，本发明公开了一种装备有多极（152）的检测器，该多极体使得TEM的图像翘曲，使得由投影系统引入的失真被抵消。检测器还可以包括用于检测电子的CCD或荧光屏（151）。

3. 发明授权

US08692196B2 Method of use for a multipole detector for a transmission electron microscope 有权
标题翻译：用于透射电子显微镜的多极检测器的方法
公开(公告)号：US08692196B2
公开(公告)日：2014-04-08
申请号：US12564617
申请日：2009-09-22
申请人： Peter Christiaan Tiemeijer , Uwe Luecken , Alan Frank de Jong , Hendrik Nicolaas Slingerland
发明人： Peter Christiaan Tiemeijer , Uwe Luecken , Alan Frank de Jong , Hendrik Nicolaas Slingerland
IPC分类号： G01N23/00
CPC分类号： H01J37/153 , H01J37/263 , H01J2237/1534 , H01J2237/2823
摘要： The invention relates to a method for correcting distortions introduced by the projection system (106) of a TEM. As known to the person skilled in the art distortions may limit the resolution of a TEM, especially when making a 3D reconstruction of a feature using tomography. Also when using strain analysis in a TEM the distortions may limit the detection of strain.To this end the invention discloses a detector equipped with multipoles (152), the multipoles warping the image of the TEM in such a way that distortions introduced by the projection system are counteracted. The detector may further include a CCD or a fluorescent screen (151) for detecting the electrons.
摘要翻译：本发明涉及一种用于校正由TEM的投影系统（106）引入的失真的方法。如本领域技术人员所知，失真可能限制TEM的分辨率，特别是当使用层析成像进行特征的3D重建时。此外，当在TEM中使用应变分析时，失真可能会限制应变的检测。为此，本发明公开了一种装备有多极（152）的检测器，该多极体使得TEM的图像翘曲，使得由投影系统引入的失真被抵消。检测器还可以包括用于检测电子的CCD或荧光屏（151）。

4. 发明申请

US20110278451A1 Simultaneous Electron Detection 有权
标题翻译：同时电子检测
公开(公告)号：US20110278451A1
公开(公告)日：2011-11-17
申请号：US13106726
申请日：2011-05-12
申请人： Peter Christiaan Tiemeijer , Bert Henning Freitag , Sorin Lazar
发明人： Peter Christiaan Tiemeijer , Bert Henning Freitag , Sorin Lazar
IPC分类号： G01N23/04
CPC分类号： H01J37/05 , H01J37/28 , H01J2237/057 , H01J2237/2802 , H01J2237/2804
摘要： The invention provides multiple detectors that detect electrons that have passed through a sample. The detectors preferably detect electrons after the electrons have been passed through a prism that separates electrons according to their energies. Electrons in different energy ranges are then detected by different detectors, with preferably at least one of the detectors measuring the energy lost by the electrons as they pass through the sample. One embodiment of the invention provides EELS on core-loss electrons while simultaneously providing a bright-field STEM signal from low-loss electrons.
摘要翻译：本发明提供了多个检测器，其检测已经通过样品的电子。检测器优选在电子通过通过根据其能量分离电子的棱镜之后检测电子。不同能量范围的电子然后由不同的检测器检测，优选地，至少一个检测器测量当电子通过样品时由电子损失的能量。本发明的一个实施例为核心损耗电子提供EELS，同时从低损耗电子提供亮场STEM信号。

5. 发明申请

US20090302217A1 Hybrid Phase Plate 有权
标题翻译：混合相板
公开(公告)号：US20090302217A1
公开(公告)日：2009-12-10
申请号：US12478707
申请日：2009-06-04
申请人： Raymond Wagner , Hendrik Nicolaas Slingerland , Frank Jeroen Pieter Schuurmans , Peter Christiaan Tiemeijer
发明人： Raymond Wagner , Hendrik Nicolaas Slingerland , Frank Jeroen Pieter Schuurmans , Peter Christiaan Tiemeijer
IPC分类号： G01N23/00 , H01J3/14
CPC分类号： H01J37/26 , H01J2237/2614
摘要： The invention relates to a hybrid phase plate for use in a TEM. The phase plate according to the invention resembles a Boersch phase plate in which a Zernike phase plate is mounted. As a result the phase plate according to the invention resembles a Boersch phase plate for electrons scattered to such an extent that they pass outside the central structure (15) and resembles a Zernike phase plate for scattered electrons passing through the bore of the central structure. Comparing the phase plate of the invention with a Zernike phase plate is has the advantage that for electrons that are scattered over a large angle, no electrons are absorbed or scattered by a foil, resulting in a better high resolution performance of the TEM. Comparing the phase plate of the invention with a Boersch phase plate the demands for miniaturization of the central structure are less severe.
摘要翻译：本发明涉及一种用于TEM的混合相位板。根据本发明的相位板类似于安装有Zernike相位板的Boersch相位板。结果，根据本发明的相位板类似于用于电子散射的Boersch相位板，使得它们通过中心结构（15）的外部并且类似于Zernike相位板，用于穿过中心结构的孔的散射电子。将本发明的相位板与Zernike相位板进行比较的优点在于，对于以大角度散射的电子，不会由箔吸收或散射电子，导致TEM具有更好的高分辨率性能。将本发明的相位板与Boersch相位板相比较，中央结构的小型化的要求不那么严格。

6. 发明授权

US06693282B1 Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current 有权
标题翻译：粒子光学装置包括可在高亮度和大束流之间切换的粒子源
公开(公告)号：US06693282B1
公开(公告)日：2004-02-17
申请号：US09596217
申请日：2000-06-19
申请人： Peter Christiaan Tiemeijer
发明人： Peter Christiaan Tiemeijer
IPC分类号： H01J3773
CPC分类号： H01J37/063 , H01J2237/28
摘要： An electron source for, for example, an electron microscope cannot exhibit a high brightness and a large beam current at the same time, because the virtual emitter dimension is enlarged by Coulomb repulsion in the electron beam in the case of a large beam current, thus reducing the brightness. In a conventional electron source switching-over could take place from a high brightness to a large beam current by varying the dimension of a beam-limiting diaphragm; however, this is objectionable because the location of such a diaphragm is not readily accessible. In accordance with the invention said switching-over can take place by arranging two lenses 26, 28 in the source, which lenses parallelize In the described circumstances the beam either directly behind the emitter 4 (large current) or directly in front of the diaphragm aperture 32 (high brightness).
摘要翻译：因为例如电子显微镜的电子源不能同时呈现高亮度和大的电子束电流，因为在大束流电流的情况下，通过电子束中的库仑排斥使虚拟发射极尺寸增大，因此降低亮度。在传统的电子源中，通过改变光束限制膜的尺寸，可以从高亮度到大的光束电流进行切换; 然而，这是令人反感的，因为这种隔膜的位置不容易接近。根据本发明，可以通过在源中布置两个透镜26,28来实现切换，这些透镜是并行的。在所述的情况下，光束直接位于发射器4的后面（大电流）或者直接在光阑孔的前面 32（高亮度）。

7. 发明授权

US06593584B2 Multi-beam lithography apparatus with mutually different beam limiting apertures 有权
标题翻译：具有相互不同的光束限制孔径的多光束光刻设备
公开(公告)号：US06593584B2
公开(公告)日：2003-07-15
申请号：US09745940
申请日：2000-12-22
申请人： Jan Martijn Krans , Peter Christiaan Tiemeijer
发明人： Jan Martijn Krans , Peter Christiaan Tiemeijer
IPC分类号： H01J37073
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3177 , H01J2237/06316 , H01J2237/0635
摘要： Multi-beam lithography apparatus is used for writing patterns on a substrate 14 such as a wafer for ICs. The patterns may have details of various dimensions. In order to enhance the production rate, it is attractive to write fine details with a small spot 16 and large details with a large spot. It is known to vary the spot size by varying the emissive surface of the electron source. In accordance with the invention the spot size is varied by varying the size 22 of the beam limiting aperture 20, thus enabling optimization of the beam current in dependence on the spot size. A preferred embodiment is provided with an additional (condenser) lens 24 such that the object distance remains constant when the magnification of the lens system 18, 24 is varied.
摘要翻译：多光束光刻设备用于在诸如用于IC的晶片的衬底14上书写图案。图案可以具有各种尺寸的细节。为了提高生产率，有吸引力的是用一个小点16和大的细节写大细节的细节。已知通过改变电子源的发射表面来改变光斑尺寸。根据本发明，通过改变光束限制孔径20的尺寸22来改变光点尺寸，从而能够根据光斑尺寸优化光束电流。优选实施例设置有附加（聚光镜）透镜24，使得当透镜系统18,24的倍率变化时物体距离保持恒定。

8. 发明授权

US08633456B2 Method for centering an optical element in a TEM comprising a contrast enhancing element 有权
标题翻译：在包括对比度增强元件的TEM中对准光学元件的方法
公开(公告)号：US08633456B2
公开(公告)日：2014-01-21
申请号：US13367251
申请日：2012-02-06
申请人： Bart Buijsse , Peter Christiaan Tiemeijer , Martinus Petrus Maria Bierhoff
发明人： Bart Buijsse , Peter Christiaan Tiemeijer , Martinus Petrus Maria Bierhoff
IPC分类号： G01J1/00 , G01N21/00 , G01N23/00
CPC分类号： H01J37/26 , H01J37/265 , H01J2237/1501 , H01J2237/2614
摘要： A method for adjusting or aligning one or more optical elements in a Transmission Electron Microscope (TEM) is disclosed. The TEM is equipped with an objective lens for guiding a beam of electrons to a sample, a diffraction plane in which at least a beam of unscattered electrons is focused and a structure to enhance the Contrast Transfer Function (CTF) which is situated in the diffraction plane or an image thereof.
摘要翻译：公开了一种用于在透射电子显微镜（TEM）中调整或对准一个或多个光学元件的方法。 TEM配备有用于将电子束引导到样品的物镜，其中至少一束不散射电子被聚焦的衍射平面和用于增强位于衍射中的对比度传递函数（CTF）的结构平面或其图像。

9. 发明申请

US20120012747A1 Contrast for Scanning Confocal Electron Microscope 有权
标题翻译：扫描共焦电子显微镜对比
公开(公告)号：US20120012747A1
公开(公告)日：2012-01-19
申请号：US13182992
申请日：2011-07-14
申请人： Sorin Lazar , Bert Henning Freitag , Peter Christiaan Tiemeijer
发明人： Sorin Lazar , Bert Henning Freitag , Peter Christiaan Tiemeijer
IPC分类号： G01N23/04
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/1534 , H01J2237/24465 , H01J2237/24485 , H01J2237/2802
摘要： A scanning confocal transmission electron microscope includes a descan deflector and a corrector below the sample. The microscope uses a detector that is preferably significantly larger than the resolution of the microscope and is positioned in the real image plane, which provides improved contrast, particularly for light elements.
摘要翻译：扫描共聚焦透射电子显微镜包括在样品下方的引导偏转器和校正器。显微镜使用优选地显着大于显微镜的分辨率的检测器，并且位于实像平面中，其提供改善的对比度，特别是对于光元件。

10. 发明申请

US20090200464A1 TEM WITH ABERRATION CORRECTOR AND PHASE PLATE 有权
标题翻译：透射电镜与相位校正器和相位板
公开(公告)号：US20090200464A1
公开(公告)日：2009-08-13
申请号：US12370542
申请日：2009-02-12
申请人： Peter Christiaan Tiemeijer , Alan Frank de Jong
发明人： Peter Christiaan Tiemeijer , Alan Frank de Jong
IPC分类号： G01N23/04
CPC分类号： H01J37/153 , H01J37/263 , H01J2237/2614
摘要： The invention relates to a TEM with a corrector (330) to improve the image quality and a phase plate (340) to improve contrast. The improved TEM comprises a correction system completely placed between the objective lens and the phase plate, and uses the lenses of the corrector to form a magnified image of the diffraction plane on the phase plate.
摘要翻译：本发明涉及具有改善图像质量的校正器（330）和改善对比度的相位板（340）的TEM。改进的TEM包括完全放置在物镜和相位板之间的校正系统，并且使用校正器的透镜在相位板上形成衍射平面的放大图像。

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