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1. 发明申请

US20180301315A1 Electron Microscope 审中-公开
公开(公告)号：US20180301315A1
公开(公告)日：2018-10-18
申请号：US15952989
申请日：2018-04-13
申请人： JEOL Ltd.
发明人： Masaki Mukai
IPC分类号： H01J37/153 , H01J37/22 , H01J37/21 , H01J37/05 , H01J37/14 , H01J37/12
CPC分类号： H01J37/153 , H01J37/05 , H01J37/12 , H01J37/14 , H01J37/21 , H01J37/22 , H01J2237/057 , H01J2237/1532 , H01J2237/24578 , H01J2237/24585
摘要： An electron microscope includes a monochromator, an image acquiring portion for obtaining an electron microscope image containing interference fringes of the electron beam formed by an aperture located behind the monochromator, a line profile acquiring portion for obtaining a plurality of line profiles passing through the center of the aperture on the EM image, an energy dispersion direction identifying portion for identifying the direction of energy dispersion of the monochromator on the basis of the line profiles obtained by the line profile acquiring portion, and an optics controller for controlling an optical system on the basis of a line profile in the direction of energy dispersion to bring the focal plane for the electron beam exiting from the monochromator into coincidence with the achromatic plane.

2. 发明申请

US20170207059A1 ELECTRON ENERGY LOSS SPECTROMETER USING DIRECT DETECTION SENSOR 有权
公开(公告)号：US20170207059A1
公开(公告)日：2017-07-20
申请号：US15411194
申请日：2017-01-20
申请人： Gatan, Inc.
发明人： Colin Trevor , Matthew Lent , Alexander Jozef Gubbens , Edward James , Ray Dudley Twesten , Roice Joseph , SanJay Parekh , Thomas Sha
IPC分类号： H01J37/05 , H01J37/244 , H01J37/22 , H01J37/26
CPC分类号： H01J37/05 , H01J37/222 , H01J37/244 , H01J37/256 , H01J37/26 , H01J37/28 , H01J2237/0432 , H01J2237/05 , H01J2237/057 , H01J2237/2446 , H01J2237/24485 , H01J2237/24495 , H01J2237/24585 , H01J2237/2802
摘要： An electron energy loss spectrometer is described having a direct detection sensor, a high speed shutter and a sensor processor wherein the sensor processor combines images from individual sensor read-outs and converts a two dimensional image from said sensor into a one dimensional spectrum and wherein the one dimensional spectrum is output to a computer and operation of the high speed shutter is integrated with timing of imaging the sensor. The shutter is controlled to allow reduction in exposure of images corresponding to the individual sensor readouts. A plurality of images are exposed by imaging less than the full possible exposure and wherein the plurality of images are combined to form a composite image. The plurality of images can be comprised of images created by exposing the sensor for different exposure times.

3. 发明授权

US09666404B2 Charged particle source arrangement for a charged particle beam device, charged particle beam device for sample inspection, and method for providing a primary charged particle beam for sample inspection in a charged particle beam 有权
公开(公告)号：US09666404B2
公开(公告)日：2017-05-30
申请号：US15041008
申请日：2016-02-10
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Jürgen Frosien
IPC分类号： H01J37/077 , H01J37/08 , H01J37/09 , H01J37/065
CPC分类号： H01J37/065 , H01J2237/057 , H01J2237/164 , H01J2237/182
摘要： The present disclosure provides a charged particle source arrangement for a charged particle beam device. The charged particle source arrangement includes: a first vacuum region and a second vacuum region; a charged particle source in the first vacuum region, wherein the charged particle source is configured to generate a primary charged particle beam; and a membrane configured to provide a gas barrier between the first vacuum region and the second vacuum region, and wherein the membrane is configured to let at least a portion of the primary charged particle beam pass through the membrane, wherein a first vacuum generation device is connectable to the first vacuum region and a second vacuum generation device is connectable to the second vacuum region.

4. 发明授权

US09653265B2 Methods and systems for plasma deposition and treatment 有权
公开(公告)号：US09653265B2
公开(公告)日：2017-05-16
申请号：US14341409
申请日：2014-07-25
申请人： Peter F. Vandermeulen
发明人： Peter F. Vandermeulen
IPC分类号： H01J37/32 , H01J37/05 , H01J37/08 , H01P3/12 , H01Q21/00 , C23C16/511 , C23C16/513 , H01P3/127
CPC分类号： H01J37/32229 , C23C16/511 , C23C16/513 , H01J37/05 , H01J37/08 , H01J37/32192 , H01J37/32201 , H01J37/3244 , H01J37/32669 , H01J2237/057 , H01J2237/0817 , H01J2237/3323 , H01P3/12 , H01P3/127 , H01Q21/0043
摘要： This application is directed to an apparatus for creating microwave radiation patterns for an object detection system. The apparatus includes a waveguide conduit having first slots at one side of the conduit and corresponding second slots at an opposite side of the conduit. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of first slots. A plunger is moveably positioned in the waveguide conduit from one end thereof. The plunger allows the waveguide conduit to be tuned to generally optimize the power of the microwaves exiting the first slots. Secondary plungers are each fitted in one of the second slots to independently tune or detune microwave emittance through a corresponding first slot.

5. 发明申请

US20160343545A1 Textured Silicon Liners In Substrate Processing Systems 审中-公开
公开(公告)号：US20160343545A1
公开(公告)日：2016-11-24
申请号：US15227298
申请日：2016-08-03
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Julian Blake
IPC分类号： H01J37/32 , C23C14/22 , C23C16/50 , H01J37/317
CPC分类号： H01J37/3244 , C23C14/22 , C23C14/564 , C23C16/4404 , C23C16/50 , H01J37/3171 , H01J37/32477 , H01J2237/0213 , H01J2237/022 , H01J2237/028 , H01J2237/0473 , H01J2237/0475 , H01J2237/057 , H01J2237/1207 , H01J2237/3321 , H01J2237/334
摘要： Substrate processing systems, such as ion implantation systems, deposition systems and etch systems, having textured silicon liners are disclosed. The silicon liners are textured using a chemical treatment that produces small features, referred to as micropyramids, which may be less than 20 micrometers in height. Despite the fact that these micropyramids are much smaller than the textured features commonly found in graphite liners, the textured silicon is able to hold deposited coatings and resist flaking. Methods for performing preventative maintenance on these substrate processing systems are also disclosed.

6. 发明授权

US09496117B2 Two-dimensional mass resolving slit mechanism for semiconductor processing systems 有权
标题翻译：用于半导体处理系统的二维质量分辨率缝隙机构
公开(公告)号：US09496117B2
公开(公告)日：2016-11-15
申请号：US14158972
申请日：2014-01-20
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Jason M. Schaller , Robert B. Vopat
IPC分类号： G21K1/04 , H01J37/05 , H01J37/317 , H01J37/09
CPC分类号： H01J37/05 , H01J37/09 , H01J37/3171 , H01J2237/0455 , H01J2237/057 , H01J2237/1501
摘要： An adjustable mass-resolving slit assembly includes an aperture portion and an actuation portion. The aperture portion includes first and second shield members that define an aperture therebetween for receiving an ion beam during semiconductor processing operations. The actuation portion is coupled to the aperture portion and selectively and independently adjusts the position of the first and second shield members along first and second non-parallel axes. Adjusting the position of the first and second shield members along the first axis adjusts a width of the aperture. Adjusting the position of the first and second shield members along the second axis adjusts a region of the first and second shield members impinged by the ion beam. Methods for using the adjustable mass-resolving slit assembly are also disclosed.
摘要翻译：可调节的质量分辨率狭缝组件包括孔部分和致动部分。开口部分包括在半导体处理操作期间限定其间用于接收离子束的孔的第一和第二屏蔽构件。致动部分联接到开口部分，并且选择性地和独立地调节第一和第二屏蔽部件沿第一和第二非平行轴线的位置。沿着第一轴线调节第一和第二屏蔽件的位置调整孔径的宽度。沿着第二轴调整第一和第二屏蔽构件的位置调节由离子束撞击的第一和第二屏蔽构件的区域。还公开了使用可调节质量分辨率缝隙组件的方法。

7. 发明授权

US09478388B2 Switchable gas cluster and atomic ion gun, and method of surface processing using the gun 有权
标题翻译：可切换气体簇和原子离子枪，以及使用枪的表面处理方法
公开(公告)号：US09478388B2
公开(公告)日：2016-10-25
申请号：US13823499
申请日：2011-10-10
申请人： Bryan Barnard
发明人： Bryan Barnard
IPC分类号： H01J37/08 , H01J27/02 , H01J49/14 , H01J37/05 , H01J37/317
CPC分类号： H01J37/08 , H01J27/026 , H01J37/05 , H01J37/3171 , H01J49/142 , H01J2237/057 , H01J2237/0812 , H01J2237/0827
摘要： A method of processing one or more surfaces is provided, comprising: providing a switchable ion gun which is switchable between a cluster mode setting for producing an ion beam substantially comprising ionized gas clusters for irradiating a surface and an atomic mode setting for producing an ion beam substantially comprising ionized gas atoms for irradiating a surface; and selectively operating the ion gun in the cluster mode by mass selecting ionized gas clusters using a variable mass selector thereby irradiating a surface substantially with ionized gas clusters or the atomic mode by mass selecting ionized gas atoms using a variable mass selector thereby irradiating a surface substantially with ionized gas atoms. Also provided is a switchable ion gun comprising: a gas expansion nozzle for producing gas clusters; an ionization chamber for ionizing the gas clusters and gas atoms; and a variable (preferably a magnetic sector) mass selector for mass selecting the ionized gas clusters and ionized gas atoms to produce an ion beam variable between substantially comprising ionized gas clusters and substantially comprising ionized gas atoms. Preferably, the gun comprises an electrically floating flight tube for adjusting the energy of the ions while within the mass selector.
摘要翻译：提供一种处理一个或多个表面的方法，包括：提供可切换离子枪，其可在用于产生基本上包括用于照射表面的电离气体簇的离子束的簇模式设置和用于产生离子束的原子模式设置之间切换基本上包括用于照射表面的电离气体原子; 并且通过使用可变质量选择器大量选择离子化气体簇来选择性地操作离子枪，由此通过使用可变质量选择器大量选择电离气体原子，基本上用离子化气体簇或原子模式照射表面，从而基本上照射表面与电离气体原子。还提供了一种可切换离子枪，包括：用于产生气体团的气体膨胀喷嘴; 用于电离气团和气原子的电离室; 以及用于质量选择电离气体团簇和离子化气体原子以产生基本上包括电离气体簇并且基本上包含电离气体原子的离子束可变的变量（优选磁性扇形体）选择器。优选地，枪包括电浮动飞行管，用于在质量选择器内调节离子的能量。

8. 发明授权

US09362082B2 Electron microscope and method of adjusting monochromator 有权
标题翻译：电子显微镜和调光单色仪的方法
公开(公告)号：US09362082B2
公开(公告)日：2016-06-07
申请号：US14823141
申请日：2015-08-11
申请人： JEOL Ltd.
发明人： Masaki Mukai
IPC分类号： H01J47/00 , H01J37/05 , H01J37/21
CPC分类号： H01J37/05 , H01J37/21 , H01J37/26 , H01J2237/057 , H01J2237/24535
摘要： An electron microscope is offered which can facilitate adjusting a monochromator. The electron microscope (100) includes the monochromator (20) having an energy filter (22) for dispersing the beam (EB) according to energy and a slit plate (24) disposed on an energy dispersive plane. The slit plate (24) is provided with plural energy-selecting slits (25) which are different in width taken in a direction where the beam (EB) is dispersed. The microscope (100) further includes a lens system (30) on which the beam impinges after being monochromatized by the monochromator (20), a first measuring section (50) for measuring the intensity of the beam (EB) emitted from an electron beam source (10), a second measuring section (60) for measuring the intensity of the beam (EB) that has passed through an active one (25-L) of the energy-selecting slits (25), and a slit identifying portion (72) for identifying the active energy-selecting slit (25-L) from the plural energy-selecting slits (25) on the basis of the results of measurements made by the first and second measuring sections (50, 60).
摘要翻译：提供了一种可以方便调整单色仪的电子显微镜。电子显微镜（100）包括具有用于根据能量分散光束（EB）的能量过滤器（22）和设置在能量分散平面上的狭缝板（24）的单色仪（20）。狭缝板（24）设置有多个能量选择狭缝（25），其沿着分散光束（EB）的方向而具有不同的宽度。所述显微镜（100）还包括透镜系统（30），所述透镜系统（30）在由所述单色仪（20）单色化之后入射到所述透镜系统（30）上;第一测量部分（50），用于测量从电子束源极（10），用于测量已经穿过能量选择狭缝（25）的有源（25-L）的光束（EB）的强度的第二测量部分（60）和狭缝识别部分 72），用于基于由第一和第二测量部（50,60）进行的测量结果，从多个能量选择缝（25）识别活动能量选择缝（25-L）。

9. 发明申请

US20160071689A1 Method of performing spectroscopy in a Transmission Charged-Particle Microscope 有权
标题翻译：在透射带电粒子显微镜中进行光谱的方法
公开(公告)号：US20160071689A1
公开(公告)日：2016-03-10
申请号：US14844778
申请日：2015-09-03
申请人： FEI Company
发明人： Erwin Fernand de Jong , Sorin Lazar , Peter Christiaan Tiemeijer , Rudolf Geurink
IPC分类号： H01J37/22 , H01J37/147 , H01J37/20 , H01J37/26 , H01J37/28
CPC分类号： H01J37/226 , H01J37/05 , H01J37/09 , H01J37/147 , H01J37/20 , H01J37/244 , H01J37/26 , H01J37/261 , H01J37/28 , H01J2237/0455 , H01J2237/057 , H01J2237/15 , H01J2237/2007 , H01J2237/24485 , H01J2237/24585 , H01J2237/2802
摘要： A method of performing spectroscopy in a Transmission Charged-Particle Microscope comprising: a specimen holder; a source, for producing a beam of charged particles; an illuminator, for directing said beam so as to irradiate the specimen; an imaging system, for directing a flux of charged particles transmitted through the specimen onto a spectroscopic apparatus comprising a dispersing device for dispersing said flux into an energy-resolved array of spectral sub-beams, the method comprising: using an adjustable aperture device to admit a first portion of said array to a detector, while blocking a second portion of said array; providing; using a radiation sensor in said flux upstream of said aperture device to perform localized radiation sensing in a selected region of said second portion of the array, simultaneous with detection of said first portion by said detector; using a sensing result from said sensor to adjust a detection result from said detector.
摘要翻译：一种在透射带电粒子显微镜中进行光谱的方法，包括：样品架; 用于产生带电粒子束的源; 照明器，用于引导所述光束以照射所述样本; 一种成像系统，用于将通过样本传输的带电粒子的通量引导到分光装置上，该分光装置包括用于将所述通量分散到光谱子束的能量分辨阵列中的分散装置，所述方法包括：使用可调节孔径装置来允许所述阵列的第一部分到达检测器，同时阻挡所述阵列的第二部分; 提供; 在所述孔设备上游的所述通量中使用辐射传感器，以在阵列的所述第二部分的选定区域中进行局部辐射感测，同时由所述检测器检测所述第一部分; 使用来自所述传感器的感测结果来调整来自所述检测器的检测结果。

10. 发明申请

US20150340200A1 ELECTRON BEAM IMAGING WITH DUAL WIEN-FILTER MONOCHROMATOR 有权
标题翻译：电子束成像与双扫描单色显影
公开(公告)号：US20150340200A1
公开(公告)日：2015-11-26
申请号：US14711607
申请日：2015-05-13
申请人： KLA-Tencor Corporation
发明人： Xinrong JIANG , Liqun HAN
IPC分类号： H01J37/26 , H01J37/10 , H01J37/06
CPC分类号： H01J37/26 , H01J37/05 , H01J37/06 , H01J37/10 , H01J37/28 , H01J2237/057
摘要： One embodiment relates to a dual Wien-filter monochromator. A first Wien filter focuses an electron beam in a first plane while leaving the electron beam to be parallel in a second plane. A slit opening allows electrons of the electron beam having an energy within an energy range to pass through while blocking electrons of the electron beam having an energy outside the energy range. A second Wien filter focuses the electron beam to become parallel in the first plane while leaving the electron beam to be parallel in the second plane. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及双维尼滤波器单色仪。第一维恩滤波器将电子束聚焦在第一平面中，同时使电子束在第二平面中平行。狭缝开口允许具有能量范围内的能量的电子束的电子通过，同时阻挡具有能量范围外的能量的电子束的电子。第二维恩滤波器将电子束聚焦成在第一平面中平行，同时使电子束在第二平面中平行。还公开了其它实施例，方面和特征。

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