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1. 发明授权

US08748795B2 Method for inspecting pattern defect and device for realizing the same 失效
标题翻译：检查图案缺陷的方法及其实现方法
公开(公告)号：US08748795B2
公开(公告)日：2014-06-10
申请号：US12329274
申请日：2008-12-05
申请人： Yuta Urano , Hiroyuki Nakano , Shunji Maeda , Sachio Uto
发明人： Yuta Urano , Hiroyuki Nakano , Shunji Maeda , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/4788 , G01N21/94 , G01N21/956
摘要： When using a CCD sensor as a photo-detector in a device for inspecting foreign matters and defects, it has a problem of causing electric noise while converting the signal charge, produced inside by photoelectric conversion, into voltage and reading it. Therefore, the weak detected signal obtained by detecting reflected and scattered light from small foreign matters and defects is buried in the electric noise, which has been an obstacle in detecting small foreign matters and defects. In order to solve the above problem, according to the present invention, an electron multiplying CCD sensor is used as a photo-detector. The electron multiplying CCD sensor is capable of enlarging signals brought about by inputted light relatively to the electric noise by multiplying the electrons produced through photoelectric conversion and reading them. Accordingly, compared to a conventional CCD sensor, it can detect weaker light and, therefore, smaller foreign matters and defects.
摘要翻译：当在用于检查异物和缺陷的装置中使用CCD传感器作为光检测器时，存在在将由光电转换产生的信号电荷转换成电压并读取的同时将电噪声引起的问题。因此，通过检测来自小异物和缺陷的反射和散射光获得的弱检测信号被埋在电噪声中，这是检测小异物和缺陷的障碍。为了解决上述问题，根据本发明，使用电子倍增CCD传感器作为光检测器。电子倍增CCD传感器能够通过将通过光电转换产生的电子与其进行读取而相对于电噪声放大由输入的光产生的信号。因此，与常规CCD传感器相比，它可以检测较弱的光，因此可以检测较小的异物和缺陷。

2. 发明授权

US08482728B2 Apparatus and method for inspecting defect on object surface 有权
标题翻译：检测物体表面缺陷的装置和方法
公开(公告)号：US08482728B2
公开(公告)日：2013-07-09
申请号：US12244958
申请日：2008-10-03
申请人： Sachio Uto , Hidetoshi Nishiyama , Minori Noguchi
发明人： Sachio Uto , Hidetoshi Nishiyama , Minori Noguchi
IPC分类号： G01N21/00
CPC分类号： H01L21/02334 , B08B6/00 , G01B11/0625 , G01B11/303 , G01N3/04 , G01N21/15 , G01N21/94 , G01N21/9501 , G01N21/95623 , G01N2021/9563 , H01L21/02057 , H01L21/02082
摘要： An aspect of the invention provides a defect inspection apparatus being able to accurately inspect a micro foreign matter or defect at a high speed for an inspection target substrate in which a repetitive pattern and a non-repetitive pattern are mixed. In a foreign matter anti-adhesive means 180, a transparent plate 187 is placed on a placement table 34 through a frame 185. In the foreign matter anti-adhesive means 180, a shaft 181 which is rotatably supported by two columnar supports 184 fixed onto a base 186 is coupled to a motor 182 by a coupling 183. The shaft 181 is inserted into a part of a frame 185 between the two columnar supports 184 such that the frame 185 and the transparent plate 187 are turnable about the shaft 181. Therefore, the whole of the frame 185 is opened and closed in a Z-direction about the shaft 181, and a wafer 1 on the placement table 34 can be covered with the frame 185 and the transparent plate 187.
摘要翻译：本发明的一个方面提供了一种缺陷检查装置，其能够精确地检查混合有重复图案和非重复图案的检查对象基板的高速微细异物或缺陷。在异物防粘连装置180中，通过框架185将透明板187放置在放置台34上。在异物防粘装置180中，轴181可旋转地由两个柱状支撑件184支撑固定到基座186通过联轴器183联接到马达18.轴181插入到两个柱状支撑件184之间的框架185的一部分中，使得框架185和透明板187围绕轴181可转动。因此，整个框架185围绕轴181沿Z方向打开和关闭，并且放置台34上的晶片1可以被框架185和透明板187覆盖。

3. 发明申请

US20120176602A1 APPARATUS AND METHOD FOR INSPECTING PATTERN 有权
标题翻译：用于检查图案的装置和方法
公开(公告)号：US20120176602A1
公开(公告)日：2012-07-12
申请号：US13423862
申请日：2012-03-19
申请人： Sachio UTO , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio UTO , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/88
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
摘要翻译：用于检查缺陷的方法和装置包括从紫外光源发射紫外光，用受紫外光的偏振条件的紫外线照射样本，控制从被照射的样本反射的光的偏振状态通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

4. 发明申请

US20120133929A1 INSPECTION METHOD AND INSPECTION APPARATUS 有权
标题翻译：检验方法和检验装置
公开(公告)号：US20120133929A1
公开(公告)日：2012-05-31
申请号：US13347245
申请日：2012-01-10
申请人： Akira HAMAMATSU , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
发明人： Akira HAMAMATSU , Minori NOGUCHI , Hidetoshi NISHIYAMA , Yoshimasa OHSHIMA , Takahiro JINGU , Sachio UTO
IPC分类号： G01N21/55
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
摘要翻译：本发明提供一种检查装置和检查方法。检查装置包括用于支撑被检查物体的台架机构。在检测光学系统中设置空间滤波器来检查物体。打印机用于打印空间滤镜的结果。空间滤波器可以以傅里叶变换图像的形式提供。

5. 发明申请

US20120074319A1 METHOD AND APPARATUS FOR REVIEWING DEFECTS 有权
标题翻译：评估缺陷的方法和装置
公开(公告)号：US20120074319A1
公开(公告)日：2012-03-29
申请号：US13311734
申请日：2011-12-06
申请人： Hidetoshi NISHIYAMA , Toshifumi HONDA , Sachio UTO
发明人： Hidetoshi NISHIYAMA , Toshifumi HONDA , Sachio UTO
IPC分类号： H01J37/26
CPC分类号： G01N23/225 , G02B15/14 , G02B21/0016 , H01J37/226 , H01J37/28 , H01J2237/216 , H01J2237/2482 , H01J2237/2817 , H01K3/02
摘要： A method of inspecting defects of a sample on a movable table includes a first step for, on a basis of position information of the defects which is previously detected by an other inspection system, driving the table so that the defects come into a viewing field of an optical microscope having a focus which is adjusted, a second step for re-detecting the defects to obtain a first detection result, a third step for correcting the position information of defects on a basis of position information of the re-detected defects, and a fourth step for reviewing the defects whose position information is corrected to obtain a second detection result. At the second step, re-detecting is performed using reflection light or scattered light from the sample which passes an optical filter which includes a light shielding portion and a light transmitting portion.
摘要翻译：一种在可移动台上检查样本的缺陷的方法包括：第一步骤，用于基于先前由另一检查系统检测到的缺陷的位置信息来驱动该表，使得缺陷进入到具有调整焦点的光学显微镜，用于重新检测缺陷以获得第一检测结果的第二步骤，基于重新检测到的缺陷的位置信息来校正缺陷的位置信息的第三步骤，以及检查位置信息被校正以获得第二检测结果的缺陷的第四步骤。在第二步骤中，使用来自通过包括遮光部分和透光部分的滤光器的样品的反射光或散射光进行再检测。

6. 发明授权

US08094295B2 Inspection method and inspection apparatus 有权
公开(公告)号：US08094295B2
公开(公告)日：2012-01-10
申请号：US12555610
申请日：2009-09-08
申请人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
发明人： Akira Hamamatsu , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Takahiro Jingu , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.

7. 发明申请

US20110221886A1 PATTERN DEFECT INSPECTING APPARATUS AND METHOD 审中-公开
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US20110221886A1
公开(公告)日：2011-09-15
申请号：US13059908
申请日：2009-07-08
申请人： Hidetoshi Nishiyama , Masaaki Ito , Sachio Uto , Kei Shimura
发明人： Hidetoshi Nishiyama , Masaaki Ito , Sachio Uto , Kei Shimura
IPC分类号： H04N7/18
CPC分类号： G01N21/956 , G01N21/94 , H01L22/12
摘要： In recent years, a wafer inspection time in semiconductor manufacturing processes is being required to be reduced for reduction in manufacturing time and for early detection of yield reduction factors. To meet this requirement, there is a need to reduce the time required for inspection parameter setup, as well as the time actually required for inspection. Based on the speed or position change information relating to a transport system 2, inspection is also conducted during acceleration/deceleration of the transport system 2 by controlling an accumulation time and/or operational speed of a detector or by correcting acquired images. Alternate display of review images of a detection region at fixed time intervals improves visibility of the detection region and makes it possible to confirm within a short time whether a defect is present.
摘要翻译：近年来，为了减少制造时间和减少因素的早期检测，需要减少半导体制造工序中的晶片检查时间。为了满足这一要求，需要减少检查参数设置所需的时间以及检查所需的时间。基于与运输系统2有关的速度或位置变化信息，通过控制检测器的累积时间和/或操作速度或通过校正所获取的图像，也可以在运输系统2的加速/减速期间进行检查。以固定的时间间隔交替显示检测区域的检查图像提高了检测区域的可视性，并且使得可以在短时间内确认是否存在缺陷。

8. 发明申请

US20110170092A1 APPARATUS AND METHOD FOR INSPECTING PATTERN 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US20110170092A1
公开(公告)日：2011-07-14
申请号：US13069091
申请日：2011-03-22
申请人： Sachio UTO , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio UTO , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/956
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
摘要翻译：用于检查缺陷的方法和装置包括从紫外光源发射紫外光，用受紫外光的偏振条件的紫外线照射样本，控制从被照射的样本反射的光的偏振状态通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

9. 发明申请

US20110141272A1 APPARATUS AND METHOD FOR INSPECTING AN OBJECT SURFACE DEFECT 审中-公开
标题翻译：用于检查物体表面缺陷的装置和方法
公开(公告)号：US20110141272A1
公开(公告)日：2011-06-16
申请号：US13059523
申请日：2009-07-10
申请人： Sachio Uto , Hidetoshi Nishiyama , Kei Shimura , Masaaki Ito
发明人： Sachio Uto , Hidetoshi Nishiyama , Kei Shimura , Masaaki Ito
IPC分类号： H04N7/18 , G01N21/956
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501
摘要： Disclosed is an apparatus having a light source of a deep ultraviolet ray for detecting a small foreign matter or pattern defect, which may arise during a process for manufacturing a semiconductor device or the like, in high resolution. The apparatus comprises a means for detecting a damage on an optical system due to a wavelength reduction thereby to save a damaged portion, and a means for comparing an optical system arrangement with that at the manufacturing time and detecting the abnormality thereof, to thereby make a correction, so that the apparatus can inspect the defect on an object substrate stably at a high speed and in high sensitivity. Also disclosed is a method for the stable inspection. The apparatus is provided, in the optical path of the optical system, with a means for detecting the intensity and the convergent state of an illumination light, and a means for detecting the abnormality of the optics system and for saving an abnormal portion from alignment with an optical axis. The apparatus is constituted such that the optical system is adjusted to make corrections for the optical conditions at the manufacturing time, thereby to elongate the lifetime of the optical system in the inspecting apparatus and to detect the small defect stably.
摘要翻译：公开了一种具有用于检测在高分辨率的半导体器件等的制造工艺期间可能出现的小异物或图案缺陷的深紫外线光源的装置。该装置包括用于检测由于波长减小而导致的光学系统的损坏从而节省损坏部分的装置，以及用于将光学系统布置与制造时间布置进行比较并检测其异常的装置，从而使校正，使得设备可以高速和高灵敏度稳定地检查对象基板上的缺陷。还公开了用于稳定检查的方法。该装置在光学系统的光路中设置有用于检测照明光的强度和收敛状态的装置，以及用于检测光学系统的异常并且用于保存异常部分与对准的装置光轴。该装置被构造成使得光学系统被调整以对制造时的光学条件进行校正，从而延长了检查装置中的光学系统的寿命并且稳定地检测小缺陷。

10. 发明授权

US07952700B2 Method of apparatus for detecting particles on a specimen 有权
标题翻译：用于检测样品上的颗粒的装置的方法
公开(公告)号：US07952700B2
公开(公告)日：2011-05-31
申请号：US12907895
申请日：2010-10-19
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

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