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    • 5. 发明申请
    • DEPOSITION DEVICE AND DEPOSITION METHOD USING JOULE HEATING
    • 沉积装置和沉积方法使用JOULE加热
    • US20140050847A1
    • 2014-02-20
    • US13589508
    • 2012-08-20
    • Jae-Sang ROWon-Eui HongSeog-Young LeeIngoo Jang
    • Jae-Sang ROWon-Eui HongSeog-Young LeeIngoo Jang
    • C23C16/448C23C16/52C23C16/458
    • C23C14/24C23C14/04C23C14/12
    • Provided are a deposition method of patterning a thin film on a substrate using momentary Joule heating in a vacuum environment, and a method thereof. The deposition device forms a deposition target layer on one surface of a source substrate as a pattern to be deposited. A deposition target layer forming unit forms a deposition target layer on the one surface of the source substrate to cover the conductive layer. A chamber in a vacuum state receives the source substrate on which the conductive layer and the deposition target layer are formed and the target substrate. A target substrate is disposed in the chamber to face the source substrate. A power supply applies power to the conductive layer to heat-generate the conductive layer. A configuration of the deposition device is very simple, and it is easy to uniformly form a deposition thickness.
    • 提供了一种在真空环境中使用瞬时焦耳加热在基板上图案化薄膜的沉积方法及其方法。 沉积装置在源极衬底的一个表面上形成沉积靶层作为要沉积的图案。 沉积靶层形成单元在源极基板的一个表面上形成沉积靶层以覆盖导电层。 处于真空状态的室接收其上形成有导电层和沉积靶层的源极基板和靶基板。 目标衬底设置在腔室中以面对源极衬底。 电源对导电层施加电力以热导电层。 沉积装置的结构非常简单,容易均匀地形成沉积厚度。