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1. 发明授权

US09255793B2 Defect inspection method and device thereof 有权
标题翻译：缺陷检查方法及其装置
公开(公告)号：US09255793B2
公开(公告)日：2016-02-09
申请号：US13521086
申请日：2011-02-09
申请人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
发明人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
IPC分类号： G01N21/55 , G06F19/00 , G01B11/30 , G01N21/956 , H01L21/67
CPC分类号： G01B11/303 , G01N21/956 , H01L21/67288
摘要： A defect inspection device includes an irradiation unit for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; a detection unit for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; a defect candidate extraction unit for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; a defect extraction unit for extracting defects by integrating the defect candidates extracted under the different optical conditions; and a defect classifying unit for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.
摘要翻译：缺陷检查装置包括：照射单元，用于在不同光学条件下用照明光同时照射样品上的不同区域，所述样品被预先设计为包括在其上重复形成的图案，其中所述图案将被形成为相同的形状; 检测单元，用于针对每个所述不同区域检测从照射光照射的每个区域反射的光束; 缺陷候选提取单元，用于通过处理与检测到的反射光相对应的检测信号来提取在不同区域的不同光学条件下的缺陷候选; 缺陷提取单元，用于通过对在不同光学条件下提取的缺陷候选进行积分来提取缺陷; 以及缺陷分类单元，用于计算提取的缺陷的特征量，并根据所计算的特征量对缺陷进行分类。

2. 发明授权

US09075026B2 Defect inspection device and defect inspection method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US09075026B2
公开(公告)日：2015-07-07
申请号：US13387369
申请日：2010-08-30
申请人： Takahiro Urano , Kaoru Sakai , Toshifumi Honda
发明人： Takahiro Urano , Kaoru Sakai , Toshifumi Honda
IPC分类号： G06K9/60 , G01N21/95 , G06T7/00 , G01N21/956 , G01N21/88 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/95607 , G01N2021/8825 , G01N2021/9513 , G06T7/0004 , G06T2207/10061 , G06T2207/30121 , G06T2207/30148 , H01L22/12
摘要： Disclosed is a defect inspection device that has an illumination optical system; a detection optical system; and a processing unit which includes a defect feature quantity calculation unit that calculates the feature quantities of each defect candidate, a defect candidate grouping unit that groups the aforementioned defect candidates on the basis of the feature quantities, a defect classification evaluation value calculation unit that calculates defect classification evaluation values for the aforementioned defect candidates, a defect classification evaluation value updating unit that, on the basis of instructions, updates the evaluation values, a defect classification threshold determination unit that, on the basis of evaluation valued updated by the aforementioned defect classification evaluation value updating unit, determines a classification boundary that is a threshold for classifying defect types of the aforementioned defect candidates, and a defect detection unit that detects defects using the thresholds.
摘要翻译：公开了一种具有照明光学系统的缺陷检查装置，检测光学系统; 以及处理单元，其包括：缺陷特征量计算单元，其计算每个缺陷候选的特征量;缺陷候选分组单元，其基于所述特征量对所述缺陷候选进行分组;缺陷分类评估值计算单元，其计算上述缺陷候补的缺陷分类评价值，基于指示更新评价值的缺陷分类评价值更新部，基于上述缺陷分类更新的评价值的缺陷分类阈值判定部评估值更新单元，确定作为用于分类上述缺陷候选的缺陷类型的阈值的分类边界，以及使用阈值来检测缺陷的缺陷检测单元。

3. 发明授权

US08958062B2 Defect inspection method and device using same 有权
标题翻译：缺陷检查方法和装置使用相同
公开(公告)号：US08958062B2
公开(公告)日：2015-02-17
申请号：US13701834
申请日：2011-07-01
申请人： Yukihiro Shibata , Toshiyuki Nakao , Yuta Urano , Toshifumi Honda
发明人： Yukihiro Shibata , Toshiyuki Nakao , Yuta Urano , Toshifumi Honda
IPC分类号： G01N21/00 , G01N21/956 , G01N21/88 , G01N21/95
CPC分类号： G01N21/956 , G01N21/8806 , G01N21/9501
摘要： In order to enable inspections to be conducted at a sampling rate higher than the pulse oscillation frequency of a pulsed laser beam emitted from a laser light source, without damaging samples, a defect inspection method is disclosed, wherein: a single pulse of a pulsed laser beam emitted from the laser light source is split into a plurality of pulses; a sample is irradiated with this pulse-split pulsed laser beam; scattered light produced by the sample due to the irradiation is focused and detected; and defects on the sample are detected by using information obtained by focusing and detecting the scattered light from the sample. Said defect inspection method is configured such that the splitting a single pulse of the pulsed laser beam into a plurality of pulses is controlled in such a manner that the peak values of the split pulses are substantially uniform.
摘要翻译：为了使得能够以高于从激光光源发射的脉冲激光束的脉冲振荡频率的采样率进行检查，而不损害样品，公开了一种缺陷检查方法，其中：脉冲激光的单个脉冲从激光光源发射的光束被分成多个脉冲; 用脉冲分割脉冲激光束照射样品; 聚焦和检测由于照射产生的样品产生的散射光; 通过使用通过聚焦和检测来自样品的散射光获得的信息来检测样品上的缺陷。所述缺陷检查方法被配置为使得将脉冲激光束的单个脉冲分裂成多个脉冲以使得分离脉冲的峰值基本上均匀的方式被控制。

4. 发明授权

US08711347B2 Defect inspection method and device therefor 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US08711347B2
公开(公告)日：2014-04-29
申请号：US13701030
申请日：2011-05-25
申请人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata , Toshiyuki Nakao
发明人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata , Toshiyuki Nakao
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/9501 , G01N2021/8874
摘要： Disclosed is a defect inspection method which makes it possible to scan the entire surface of a sample and detect minute defects without causing thermal damage to the sample. A defect inspection method in which a pulse laser emitted from a light source is subjected to pulse division and irradiated on the surface of a sample which moves in one direction while the divided-pulse pulse laser is rotated, reflection light from the sample irradiated by the divided-pulse pulse laser is detected, the signal of the detected reflection light is processed to detect defects on the sample, and information regarding a detected defect is output to a display screen, wherein the barycentric position of the light intensity of the divided-pulse pulse laser is monitored and adjusted.
摘要翻译：公开了一种缺陷检查方法，其可以扫描样品的整个表面并检测微小缺陷而不会对样品造成热损伤。对从光源射出的脉冲激光进行脉冲分割并照射在分割脉冲激光器旋转时在一个方向上移动的样品的表面的缺陷检查方法中，检测出分割脉冲脉冲激光，检测出反射光的信号，以检测样本上的缺陷，将与检测到的缺陷有关的信息输出到显示画面，其中分割脉冲的光强度的重心位置脉冲激光被监测和调整。

5. 发明授权

US08670116B2 Method and device for inspecting for defects 有权
标题翻译：用于检查缺陷的方法和装置
公开(公告)号：US08670116B2
公开(公告)日：2014-03-11
申请号：US13700520
申请日：2011-05-20
申请人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/95 , G01N21/9501 , G01Q60/22 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspecting method is provided which comprises a pre-scan defect inspecting process including a pre-scan irradiating step for casting irradiation light onto the surface of a sample, a pre-scan detecting step for detecting the scattered lights, and a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights; a near-field defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted so that the sample surface is irradiated, a near-field detecting step for detecting near-field light response, and a near-field defect information collecting step for obtaining information on the preselected defects on the basis of the near-field light response; and a merging process for inspecting defects present on the sample surface by merging the pieces of information on the preselected defects.
摘要翻译：提供一种缺陷检查方法，其包括预扫描缺陷检查处理，其包括用于将照射光投射到样品表面上的预扫描照射步骤，用于检测散射光的预扫描检测步骤，以及预扫描缺陷信息收集步骤，用于基于散射光获得在样品表面上存在的预选缺陷的信息; 包括近场照射步骤的近场缺陷检查处理，其中调整样品表面和近场磁头之间的距离以照射样品表面;近场检测步骤，用于检测近场光响应和近场缺陷信息收集步骤，用于基于近场光响应获得关于预选缺陷的信息; 以及通过合并关于预选缺陷的信息来检查存在于样品表面上的缺陷的合并过程。

6. 发明授权

US08581976B2 Method and apparatus for reviewing defects of semiconductor device 有权
标题翻译：检查半导体器件缺陷的方法和装置
公开(公告)号：US08581976B2
公开(公告)日：2013-11-12
申请号：US12986475
申请日：2011-01-07
申请人： Masaki Kurihara , Toshifumi Honda , Ryo Nakagaki
发明人： Masaki Kurihara , Toshifumi Honda , Ryo Nakagaki
IPC分类号： H04N7/18
CPC分类号： G06T7/001 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/2817
摘要： A method and apparatus for reviewing defects of a semiconductor device is provided which involves detecting a defect on a SEM image taken at low magnification, and reviewing the defect on a SEM image taken at high magnification, and which can review a lot of defects in a short period of time thereby to improve the efficiency of defect review. In the present invention, the method for reviewing defects of a semiconductor device includes the steps of obtaining an image including a defect on the semiconductor device detected by a detection device by use of a scanning electron microscope at a first magnification, making a reference image from the image including the defect obtained at the first magnification, detecting the defect by comparing the image including the defect obtained at the first magnification to the reference image made from the image including the defect at the first magnification, and taking an image of the detected defect at a second magnification that is larger than the first magnification.
摘要翻译：提供了一种用于检查半导体器件缺陷的方法和装置，其涉及检测在低放大倍率下拍摄的SEM图像上的缺陷，并且以高倍放大倍数检查SEM图像上的缺陷，并且可以检查在短时间内可以提高缺陷检查的效率。在本发明中，用于检查半导体器件的缺陷的方法包括以下步骤：通过使用扫描电子显微镜以第一放大率获得由检测装置检测的半导体器件上的缺陷的图像，从而所述图像包括在第一放大处获得的缺陷，通过将包括在第一放大获得的缺陷的图像与由包含第一放大率的缺陷构成的图像进行比较的图像进行比较来检测缺陷，并且获取检测到的缺陷的图像在大于第一放大率的第二放大倍率下。

7. 发明申请

US20130242294A1 DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20130242294A1
公开(公告)日：2013-09-19
申请号：US13989835
申请日：2011-11-10
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Toshifumi Honda
IPC分类号： G01N21/956
CPC分类号： G01N21/95623 , G01N21/9501 , G01N21/956 , G01N2021/8477
摘要： To prevent overlooking of a defect due to reduction in a defect signal, a defect inspection device is configured such that: light is irradiated onto an object to be inspected on which a pattern is formed; reflected, diffracted, and scattered light generated from the object by the irradiation of the light is collected, such that a first optical image resulting from the light passed through a first spatial filter having a first shading pattern is received by a first detector, whereby a first image is obtained; the reflected, diffracted, and scattered light generated from the object is collected, such that a second optical image resulting from the light passed through a second spatial filter having a second shading pattern is received by a second detector, whereby a second image is obtained; and the first and second images thus obtained are processed integrally to detect a defect candidate(s).
摘要翻译：为了防止由于缺陷信号的减少而忽视缺陷，缺陷检查装置被配置为使得光被照射到形成有图案的待检查对象上; 收集通过照射光从物体产生的反射，衍射和散射光，使得由通过具有第一阴影图案的第一空间滤光器的光产生的第一光学图像由第一检测器接收，由此获得第一幅图像; 从物体产生的反射，衍射和散射光被收集，使得由通过具有第二阴影图案的第二空间滤光器的光产生的第二光学图像由第二检测器接收，由此获得第二图像; 并且由此获得的第一和第二图像被整体地处理以检测缺陷候选。

8. 发明授权

US08514388B2 Flaw inspecting method and device therefor 有权
标题翻译：缺陷检查方法及其装置
公开(公告)号：US08514388B2
公开(公告)日：2013-08-20
申请号：US13387120
申请日：2010-07-28
申请人： Shigenobu Maruyama , Toshifumi Honda , Toshiyuki Nakao , Yuta Urano
发明人： Shigenobu Maruyama , Toshifumi Honda , Toshiyuki Nakao , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/47
摘要： In order to maximize the effect of signal addition during inspection of foreign substances in wafers, a device structure including line sensors arranged in plural directions is effective. Low-angle detection optical systems that detect light beams in plural azimuth directions, the light beams being scattered in low angle directions among those scattered from a linear area on a sample illuminated by illuminating means, each include a combination of a first imaging lens group (330) and a diffraction grating (340) and a combination of a second imaging lens group (333) and an image detector (350) having a plurality of light receiving surfaces. A signal processing unit processes signals from the image detectors of the low-angle detection optical systems by adding the signals from the light receiving surfaces corresponding between the image detectors.
摘要翻译：为了最大限度地发挥在晶片中异物检查期间信号增加的效果，包括沿多个方向布置的线传感器的装置结构是有效的。检测在多个方位方向上的光束的低角度检测光学系统，所述光束在从由照明装置照射的样品上的线性区域散射的那些中以低角度方向散射，各自包括第一成像透镜组（ 330）和衍射光栅（340）以及具有多个光接收表面的第二成像透镜组（333）和图像检测器（350）的组合。信号处理单元通过将来自相应于图像检测器之间的光接收表面的信号相加来处理来自低角度检测光学系统的图像检测器的信号。

9. 发明申请

US20120126117A1 SCANNING ELECTRON MICROSCOPE AND METHOD FOR PROCESSING AN IMAGE OBTAINED BY THE SCANNING ELECTRON MICROSCOPE 有权
标题翻译：扫描电子显微镜和扫描电子显微镜获得的图像的处理方法
公开(公告)号：US20120126117A1
公开(公告)日：2012-05-24
申请号：US13362536
申请日：2012-01-31
申请人： Kenji NAKAHIRA , Toshifumi HONDA , Atsushi MIYAMOTO
发明人： Kenji NAKAHIRA , Toshifumi HONDA , Atsushi MIYAMOTO
IPC分类号： H01J37/28
CPC分类号： G01N23/225 , G01N2223/401
摘要： In the case where a specimen is imaged by a scanning electron microscope, it is intended to acquire an image of a high quality having a noise component reduced, thereby to improve the precision of an image processing. The intensity distribution of a beam is calculated on the basis of an imaging condition or specimen information, and an image restoration is performed by using a resolving power deterioration factor other than the beam intensity distribution as a target of a deterioration mode, so that a high resolving power image can be acquired under various conditions. In the scanning electron microscope for semiconductor inspections and semiconductor measurements, the restored image is used for pattern size measurement, defect detections, defect classifications and so on, so that the measurements can be improved in precision and so that the defect detections and classifications can be made high precise.
摘要翻译：在通过扫描电子显微镜对样本进行成像的情况下，旨在获取具有降低噪声分量的高质量图像，从而提高图像处理的精度。基于成像条件或样本信息计算光束的强度分布，并且通过使用除了光束强度分布之外的分辨能力劣化因子作为劣化模式的目标来执行图像恢复，使得高可以在各种条件下获得分辨率的图像。在用于半导体检查和半导体测量的扫描电子显微镜中，恢复的图像用于图案尺寸测量，缺陷检测，缺陷分类等，从而可以提高测量精度，从而可以使缺陷检测和分类高精度。

10. 发明申请

US20120092657A1 METHOD OF DEFECT INSPECTION AND DEVICE OF DEFECT INSPECTION 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20120092657A1
公开(公告)日：2012-04-19
申请号：US13265935
申请日：2010-04-22
申请人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
发明人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译：一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。

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