专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110080585A1 Scatterometry Measurement of Asymmetric Structures 有权
标题翻译：不对称结构的散射测量
公开(公告)号：US20110080585A1
公开(公告)日：2011-04-07
申请号：US12696974
申请日：2010-01-29
申请人： Silvio J. Rabello , William A. McGahan , Jie Li , Yongdong Liu
发明人： Silvio J. Rabello , William A. McGahan , Jie Li , Yongdong Liu
IPC分类号： G01J4/00
CPC分类号： G01N21/211 , G01B11/24 , G01B2210/56 , G01N2021/213 , G01N2021/214 , G03F7/70633
摘要： Asymmetry metrology is performed using at least a portion of Mueller matrix elements, including, e.g., the off-diagonal elements of the Mueller matrix. The Mueller matrix may be generated using, e.g., a spectroscopic or angle resolved ellipsometer that may include a rotating compensator. The Mueller matrix is analyzed by fitting at least a portion of the elements to Mueller matrix elements calculated using a rigorous electromagnetic model of the sample or by fitting the off-diagonal elements to a calibrated linear response. The use of the Mueller matrix elements in the asymmetry measurement permits, e.g., overlay analysis using in-chip devices thereby avoiding the need for special off-chip targets.
摘要翻译：使用Mueller矩阵元素的至少一部分（包括例如Mueller矩阵的非对角线元素）来执行不对称度量。可以使用例如可以包括旋转补偿器的分光镜或角度分辨椭圆偏振器来生成Mueller矩阵。通过将至少一部分元素装配到使用样品的严格电磁模型计算的Mueller矩阵元素或通过将非对角元素拟合到校准的线性响应来分析Mueller矩阵。在不对称测量中使用Mueller矩阵元件允许例如使用片上器件的覆盖分析，从而避免需要特殊的片外目标。

2. 发明授权

US07202958B1 Modeling a sample with an underlying complicated structure 有权
标题翻译：用底层复杂结构建模样本
公开(公告)号：US07202958B1
公开(公告)日：2007-04-10
申请号：US10859330
申请日：2004-06-01
申请人： William A. McGahan
发明人： William A. McGahan
IPC分类号： G01B11/28
CPC分类号： G01B11/0625
摘要： A model of a sample with one or more films that overlie a complicated structure can be produced using a first portion that models the physical characteristics of the film(s) and a second portion that does not attempt to model the physical characteristics of the underlying structure, but instead models the affect of the underlying structure on incident light. By way of example, the second portion of the model may use a one-dimensional periodic pattern to model a complicated two-dimensional periodic pattern. A characteristic, such as thickness, of the film(s) may be measured using the model. The results may be verified by the linear relationship of ratios between a plurality of measured locations on the sample and associated locations on the sample that do not have the underlying structures.
摘要翻译：可以使用对膜的物理特性进行建模的第一部分和不试图对下层结构的物理特性进行建模的第二部分来产生具有覆盖复杂结构的一个或多个膜的样品的模型，而是模拟底层结构对入射光的影响。作为示例，模型的第二部分可以使用一维周期性模式来对复杂的二维周期性模式进行建模。可以使用该模型来测量膜的特性，例如膜的厚度。结果可以通过样品上的多个测量位置与样品上没有下面结构的相关位置之间的比率的线性关系来验证。

3. 发明授权

US06836690B1 High precision substrate prealigner 失效
标题翻译：高精度基板预边界
公开(公告)号：US06836690B1
公开(公告)日：2004-12-28
申请号：US10199278
申请日：2002-07-19
申请人： Blaine R. Spady , William A. McGahan , James V. Read , Arosha W. Goonesekera , Eric A. Rost
发明人： Blaine R. Spady , William A. McGahan , James V. Read , Arosha W. Goonesekera , Eric A. Rost
IPC分类号： H01L2166
CPC分类号： H01L21/681 , H01L21/68707 , H01L21/68728 , H01L21/68785
摘要： A prealigner includes a light source and light detector that detects the position of the periphery of a substrate as a rotary chuck rotates the substrate. The prealigner includes a processor that receives and records the peripheral position of the substrate relative to the angular position of the substrate. The prealigner determines the center of the substrate by fitting a curve to the recorded data set, after eliminating any spikes in the data, e.g., caused by the notch or parts of the chuck. The center may then be easily and accurately determined using the amplitude and phase of the fitted curve. The position of the notch is determined by fitting a curve to the data set for the notch and determining the derivative of the curve. The mid-point of the notch and the offset error of the apex of the notch from the mid-point are calculated based on the derivative.
摘要翻译：预对准器包括光源和光检测器，其当旋转卡盘旋转基板时检测基板周边的位置。预对准器包括处理器，其接收并记录基板相对于基板的角位置的周边位置。在消除数据中的任何尖峰，例如由卡盘的凹口或部分引起的尖峰之后，预对准器通过将曲线拟合到记录的数据集来确定基板的中心。然后可以使用拟合曲线的幅度和相位容易且准确地确定中心。通过将曲线拟合到凹口的数据集并确定曲线的导数来确定凹口的位置。根据导数计算切口的中点和中点处的切口顶点的偏移误差。

4. 发明授权

US07115858B1 Apparatus and method for the measurement of diffracting structures 有权
$Apparatus and method for the measurement of diffracting structures$
标题翻译：用于测量衍射结构的装置和方法
公开(公告)号：US07115858B1
公开(公告)日：2006-10-03
申请号：US09670000
申请日：2000-09-25
申请人： James M. Holden , William A. McGahan , Richard A. Yarussi , Pablo I. Rovira , Roger R. Lowe-Webb
发明人： James M. Holden , William A. McGahan , Richard A. Yarussi , Pablo I. Rovira , Roger R. Lowe-Webb
IPC分类号： G02F1/01 , G01J4/00
CPC分类号： G01N21/956 , G01N21/21 , G01N21/4788 , G01N21/4795
摘要： A normal incidence reflectometer includes a rotatable analyzer/polarizer, which permits measurement of a diffracting structure. Relative rotation of the analyzer/polarizer with respect to the diffracting structure permits analysis of the diffracted radiation at multiple polarity orientations. A spectograph detects the intensity of the spectral components at different polarity orientations. Because the normal incidence reflectometer uses normally incident radiation and an analyzer/polarizer that rotates relative to the diffracting structure, or vice-versa, the orientation of the diffracting structure does not affect the accuracy of the measurement. Thus, the sample holding stage may use X, Y, and Z, as well as r-θ type movement and there is no requirement that the polarization orientation of the incident light be aligned with the grating of the diffraction structure. A non-linear multivariate regression process is used to adjust the parameters of an optical model, such as rigorous coupled-wave analysis, to provide a match with the measured data.
摘要翻译：正常入射反射计包括可旋转分析器/偏振器，其允许测量衍射结构。分析器/偏振器相对于衍射结构的相对旋转允许以多极性取向分析衍射辐射。分光镜检测不同极性取向的光谱分量的强度。因为正常入射反射计使用正常入射的辐射和相对于衍射结构旋转的分析器/偏振器，反之亦然，衍射结构的取向不影响测量的精度。因此，样品保持阶段可以使用X，Y和Z以及r-θ型运动，并且不要求入射光的偏振取向与衍射结构的光栅对准。使用非线性多元回归过程来调整光学模型的参数，例如严格的耦合波分析，以提供与测量数据的匹配。

5. 发明授权

US06381009B1 Elemental concentration measuring methods and instruments 有权
标题翻译：元素浓度测量方法和仪器
公开(公告)号：US06381009B1
公开(公告)日：2002-04-30
申请号：US09343209
申请日：1999-06-29
申请人： William A. McGahan
发明人： William A. McGahan
IPC分类号： G01N2100
CPC分类号： G01J3/453 , G01B11/0641 , G01N21/211
摘要： An instrument and methods are used to determine film layer thicknesses, optical constant spectra, and elemental concentrations of a sample substrate overlaid with a single or multiple films. The instrument measures the sample substrate's absolute reflectance and ellipsometric parameters over a first set of wavelengths to determine film layer thicknesses and optical constants of the film layers over the first set of wavelengths. The instrument also measures the sample substrate's absolute reflectance or transmittance over a second set of wavelengths. Based on these measurements and analysis, the instrument determines at least one element's concentration in at least one film layer of the sample substrate.
摘要翻译：使用仪器和方法来确定覆盖有单个或多个膜的样品衬底的膜层厚度，光学恒定光谱和元素浓度。该仪器测量第一组波长上的样品基板的绝对反射率和椭偏参数，以确定第一组波长上的薄膜层厚度和薄膜层的光学常数。该仪器还测量样品基板的第二组波长的绝对反射率或透射率。基于这些测量和分析，仪器确定至少一个元件在样品基底的至少一个膜层中的浓度。

6. 发明授权

US08525993B2 Scatterometry measurement of asymmetric structures 有权
标题翻译：不对称结构的散射测量
公开(公告)号：US08525993B2
公开(公告)日：2013-09-03
申请号：US12696974
申请日：2010-01-29
申请人： Silvio J. Rabello , William A. McGahan , Jie Li , Yongdong Liu
发明人： Silvio J. Rabello , William A. McGahan , Jie Li , Yongdong Liu
IPC分类号： G01J4/00
CPC分类号： G01N21/211 , G01B11/24 , G01B2210/56 , G01N2021/213 , G01N2021/214 , G03F7/70633
摘要： Asymmetry metrology is performed using at least a portion of Mueller matrix elements, including, e.g., the off-diagonal elements of the Mueller matrix. The Mueller matrix may be generated using, e.g., a spectroscopic or angle resolved ellipsometer that may include a rotating compensator. The Mueller matrix is analyzed by fitting at least a portion of the elements to Mueller matrix elements calculated using a rigorous electromagnetic model of the sample or by fitting the off-diagonal elements to a calibrated linear response. The use of the Mueller matrix elements in the asymmetry measurement permits, e.g., overlay analysis using in-chip devices thereby avoiding the need for special off-chip targets.
摘要翻译：使用Mueller矩阵元素的至少一部分（包括例如Mueller矩阵的非对角线元素）来执行不对称度量。可以使用例如可以包括旋转补偿器的分光镜或角度分辨椭圆偏振器来生成Mueller矩阵。通过将至少一部分元素装配到使用样品的严格电磁模型计算的Mueller矩阵元素或通过将非对角元素拟合到校准的线性响应来分析Mueller矩阵。在不对称测量中使用Mueller矩阵元件允许例如使用片上器件的覆盖分析，从而避免需要特殊的片外目标。

7. 发明授权

US06898537B1 Measurement of diffracting structures using one-half of the non-zero diffracted orders 有权
$Measurement of diffracting structures using one-half of the non-zero diffracted orders$
标题翻译：使用非零衍射阶数的一半测量衍射结构
公开(公告)号：US06898537B1
公开(公告)日：2005-05-24
申请号：US09844559
申请日：2001-04-27
申请人： William A. McGahan
发明人： William A. McGahan
IPC分类号： G01B11/02 , G01N21/47 , G03F7/20 , G06F19/00
CPC分类号： G03F7/70616 , G01B11/02 , G01N21/4788
摘要： A process of modeling a diffracting structure with normally incident radiation and the radiation diffracted from the structure includes constructing an optical model of the diffracting structure and calculating spectral information for the optical model based on a plurality of diffracted orders using either the positive or negative of each of said plurality of diffracted orders and the zero order. The process may be used to measure a diffracting structure, in which spectral information from a diffraction structure is extracted and compared to the calculated extracted information. The optical model is adjusted and the spectral information recalculated until an adequate fit is found, at which time it is known that the optical model accurately describes the actual diffraction grating. The process may be used with any normally incident metrology device, such as a reflectometer, ellipsometer and scatterometer.
摘要翻译：利用正常入射的辐射和从结构衍射的辐射对衍射结构进行建模的过程包括构建衍射结构的光学模型，并且基于多个衍射级使用每个衍射结构的正或负来计算光学模型的光谱信息的所述多个衍射级和零级。该过程可以用于测量衍射结构，其中提取衍射结构的光谱信息并将其与计算出的提取信息进行比较。调整光学模型，并重新计算光谱信息，直到找到足够的拟合，此时已知光学模型准确地描述了实际的衍射光栅。该过程可以与任何通常入射的测量装置一起使用，例如反射计，椭偏仪和散射仪。

8. 发明授权

US08170838B2 Simulating two-dimensional periodic patterns using compressed fourier space 有权
标题翻译：使用压缩傅立叶空间模拟二维周期模式
公开(公告)号：US08170838B2
公开(公告)日：2012-05-01
申请号：US12430805
申请日：2009-04-27
申请人： Silvio J. Rabello , William A. McGahan , Jie Li
发明人： Silvio J. Rabello , William A. McGahan , Jie Li
IPC分类号： H03F1/26 , G06F15/00
CPC分类号： G06F17/5018
摘要： The process of modeling a complex two-dimensional periodic structure is improved by selectively truncating the Fourier expansion used in the calculation of resulting scatter signature from the model. The Fourier expansion is selectively truncated by determining the contribution for each harmonic order in the Fourier transform of the permittivity function and retaining the harmonic orders with a contribution that is above a threshold. The Fourier space may be compressed so that only the selected harmonic orders are used, thereby reducing the required memory and calculation times. The compressed Fourier space may be used in a real-time analysis of a sample or to generate a library that is used in the analysis of a sample.
摘要翻译：通过选择性地截断从模型计算得到的散射特征中使用的傅立叶展开，改善了对复杂二维周期结构进行建模的过程。通过确定介电常数函数的傅立叶变换中的每个谐波阶数的贡献并且保持具有高于阈值的贡献的谐波阶数来选择性地截断傅里叶展开。可以压缩傅里叶空间，使得仅使用所选择的谐波阶数，从而减少所需的存储和计算时间。压缩的傅立叶空间可以用于样本的实时分析或生成用于样本分析的文库。

9. 发明申请

US20100274521A1 Simulating Two-Dimensional Periodic Patterns Using Compressed Fourier Space 有权
标题翻译：使用压缩傅立叶空间模拟二维周期模式
公开(公告)号：US20100274521A1
公开(公告)日：2010-10-28
申请号：US12430805
申请日：2009-04-27
申请人： Silvio J. Rabello , William A. McGahan , Jie Li
发明人： Silvio J. Rabello , William A. McGahan , Jie Li
IPC分类号： G06F15/00
CPC分类号： G06F17/5018
摘要： The process of modeling a complex two-dimensional periodic structure is improved by selectively truncating the Fourier expansion used in the calculation of resulting scatter signature from the model. The Fourier expansion is selectively truncated by determining the contribution for each harmonic order in the Fourier transform of the permittivity function and retaining the harmonic orders with a contribution that is above a threshold. The Fourier space may be compressed so that only the selected harmonic orders are used, thereby reducing the required memory and calculation times. The compressed Fourier space may be used in a real-time analysis of a sample or to generate a library that is used in the analysis of a sample.
摘要翻译：通过选择性地截断从模型计算得到的散射特征中使用的傅立叶展开，改善了对复杂二维周期结构进行建模的过程。通过确定介电常数函数的傅立叶变换中的每个谐波阶数的贡献并且保持具有高于阈值的贡献的谐波阶数来选择性地截断傅里叶展开。可以压缩傅里叶空间，使得仅使用所选择的谐波阶数，从而减少所需的存储和计算时间。压缩的傅立叶空间可以用于样本的实时分析或生成用于样本分析的文库。

10. 发明授权

US07372565B1 Spectrometer measurement of diffracting structures 有权
$Spectrometer measurement of diffracting structures$
标题翻译：衍射结构的光谱仪测量
公开(公告)号：US07372565B1
公开(公告)日：2008-05-13
申请号：US11540990
申请日：2006-09-28
申请人： James M. Holden , William A. McGahan , Richard A. Yarussi , Pablo I. Rovira , Roger R. Lowe-Webb
发明人： James M. Holden , William A. McGahan , Richard A. Yarussi , Pablo I. Rovira , Roger R. Lowe-Webb
IPC分类号： G01J3/28
CPC分类号： G01N21/956 , G01N21/21 , G01N21/4788 , G01N21/4795
摘要： A normal incidence reflectometer includes a rotatable analyzer/polarizer for measurement of a diffracting structure. Relative rotation of the analyzer/polarizer with respect to the diffracting structure permits analysis of the diffracted radiation at multiple polarity orientations. A spectograph detects the intensity of the spectral components at different polarity orientations. Because the normal incidence reflectometer uses normally incident radiation and an analyzer/polarizer that rotates relative to the diffracting structure, or vice-versa, the orientation of the diffracting structure does not affect the accuracy of the measurement. Thus, the sample holding stage may use X, Y, and Z, as well as r-θ type movement and there is no requirement that the polarization orientation of the incident light be aligned with the grating of the diffraction structure. A non-linear multivariate regression process is used to adjust the parameters of an optical model, such as rigorous coupled-wave analysis, to provide a match with the measured data.
摘要翻译：正常入射反射计包括用于测量衍射结构的可旋转分析器/偏振器。分析器/偏振器相对于衍射结构的相对旋转允许以多极性取向分析衍射辐射。分光镜检测不同极性取向的光谱分量的强度。因为正常入射反射计使用正常入射的辐射和相对于衍射结构旋转的分析器/偏振器，反之亦然，衍射结构的取向不影响测量的精度。因此，样品保持阶段可以使用X，Y和Z以及r-θ型运动，并且不要求入射光的偏振取向与衍射结构的光栅对准。使用非线性多元回归过程来调整光学模型的参数，例如严格的耦合波分析，以提供与测量数据的匹配。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式