会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • Etching Device, Plasma Processing Device
    • 蚀刻装置,等离子体处理装置
    • US20120305194A1
    • 2012-12-06
    • US13578739
    • 2010-11-25
    • Yasuyuki HayashiKenichi Tomisaka
    • Yasuyuki HayashiKenichi Tomisaka
    • B05C13/02
    • H01J37/32623H01J37/321
    • A plasma processing device capable of positioning a protective member for covering the upper surface of a peripheral edge portion of a substrate, with high accuracy. A plasma processing device has, a platen on which a substrate K is placed, a gas supply device, a plasma generating device, an RF power supply unit, an annular and plate-shaped protective member configured to be capable of being placed on a peripheral portion of the platen and which covers a peripheral edge portion of the substrate K, support members 35 supporting the protective member, and a lifting cylinder lifting up and down the platen. At least three first protrusions which are engaged with the peripheral portion of the platen are formed on a pitch circle on the lower surface of the protective member and the center of the pitch circle is co-axial with the central axis of the protective member.
    • 一种能够高精度地定位用于覆盖基板的周缘部的上表面的保护部件的等离子体处理装置。 等离子体处理装置具有放置基板K的压板,气体供给装置,等离子体产生装置,RF电源单元,被配置为能够放置在周边的环形和板状保护构件 压板的一部分,覆盖基板K的周边部分,支撑保护部件的支撑部件35以及升降压板上下升降。 在保护构件的下表面上的节圆上形成有与台板的周边部分接合的至少三个第一突起,并且节圆的中心与保护构件的中心轴线同轴。
    • 6. 发明授权
    • Device for adjusting the height of vehicles
    • 调整车辆高度的装置
    • US4413837A
    • 1983-11-08
    • US240455
    • 1981-03-04
    • Yasuyuki Hayashi
    • Yasuyuki Hayashi
    • B60G17/00B60G17/015B60G17/019B60G11/26
    • B60G17/01933
    • A system for automatically adjusting the height of a vehicle wherein a polarity-determination pattern detector and an allowable-displacement pattern detector are disposed in confronting relation to and movable relative to a pattern plate in parallel directions in response to variations in the height of a vehicle. The pattern plate has a polarity-determination pattern having one end positioned in confronting relation to the polarity-determination pattern detector and extending in a direction of movement of the pattern plate, and an allowable-displacement pattern having a center thereof positioned in confronting relation to the allowable-displacement pattern detector and extending in the direction of movement of the pattern plate. The pattern plate may be provided with a plurality of such polarity-determination and allowable-displacement patterns. An electrical circuit generates a signal indicative of an increase or decrease in the vehicle height depending on whether or not there is an output signal from the polarity-determination pattern detector when there is no output signal from the allowable-displacement pattern detector for a predetermined interval of time. With such an arrangement, the vehicle height can automatically be adjusted even while the vehicle is running.
    • 一种用于自动调整车辆高度的系统,其中响应于车辆高度的变化,极性确定模式检测器和允许位移模式检测器以平行方向相对于图案板布置成相对于模板,并且可相对于模板平行地移动 。 图案板具有极性判定图案,其一端位于与极性判定图案检测器对置的关系上,并沿着图案板的移动方向延伸,容许位移图案的中心位于与 允许位移图案检测器并且沿图案板的移动方向延伸。 图案板可以设置有多个这样的极性确定和允许位移图案。 电路根据来自极性判定模式检测器的输出信号是否在来自容许位移模式检测器的输出信号达预定间隔时,生成指示车辆高度的增减的信号 的时间。 通过这样的布置,车辆高度即使在车辆行驶时也能够自动调整。
    • 7. 发明授权
    • Plasma processing apparatus
    • 等离子体处理装置
    • US08771461B2
    • 2014-07-08
    • US12922520
    • 2008-12-03
    • Toshihiro HayamiYasuyuki Hayashi
    • Toshihiro HayamiYasuyuki Hayashi
    • H01L21/306C23C16/00
    • H01L21/67069H01J37/321H01J37/32458H01J37/32623H01L21/6719H01L21/68742
    • The present invention relates to a plasma processing apparatus in which it is possible to efficiently perform maintenance of a processing chamber. A plasma processing apparatus has a processing chamber including a lower chamber and an upper chamber, a platen on which a silicon substrate is placed, a processing gas supply device, coils, high-frequency power supply unit for coil, an elevating board with a through hole provided to be vertically movable, an elevating mechanism for supporting and moving the elevating board, and a fixing mechanism for fixing the upper chamber. The fixing member is configured from a fixing board, first fixing bolts for connecting and fixing a top plate to the elevating board using the fixing board, second fixing bolts for fixing a flange portion of a holding member to an annular plate, and third fixing bolts for fixing the annular plate to a sidewall of the lower chamber.
    • 等离子体处理装置技术领域本发明涉及能够有效地进行处理室的维护的等离子体处理装置。 一种等离子体处理装置具有包括下室和上室的处理室,放置有硅基板的压板,处理气体供给装置,线圈,线圈用高频电源单元,具有通孔的升降板 提供为可垂直移动的孔,用于支撑和移动升降板的升降机构,以及用于固定上室的固定机构。 固定构件由固定板构成,第一固定螺栓用于使用固定板将顶板连接并固定到升降板,用于将保持构件的凸缘部固定到环形板的第二固定螺栓和第三固定螺栓 用于将环形板固定到下室的侧壁。
    • 8. 发明申请
    • PLASMA PROCESSING APPARATUS
    • 等离子体加工设备
    • US20110005684A1
    • 2011-01-13
    • US12922520
    • 2008-12-03
    • Toshihiro HayamiYasuyuki Hayashi
    • Toshihiro HayamiYasuyuki Hayashi
    • C23F1/08
    • H01L21/67069H01J37/321H01J37/32458H01J37/32623H01L21/6719H01L21/68742
    • The present invention relates to a plasma processing apparatus in which it is possible to efficiently perform maintenance of a processing chamber. A plasma processing apparatus 1 has a processing chamber 11 including a lower chamber 12 and an upper chamber 13, a platen 20 on which a silicon substrate K is placed, a processing gas supply device 27, coils 32, high-frequency power supply unit for coil 33, an elevating board 41 with a through hole 41a provided to be vertically movable, an elevating mechanism 42 for supporting and moving up and down the elevating board 41, and a fixing mechanism 46 for fixing the upper chamber 13. The fixing member 46 is configured from a fixing board 47, first fixing bolts 48, 49 for connecting and fixing an top plate 16 to the elevating board 41 using the fixing board 47, second fixing bolts 50 for fixing a flange portion 32b of a holding member 32 to an annular plate 14, and third fixing bolts 51 for fixing the annular plate 14 to a sidewall 12a of the lower chamber 12.
    • 等离子体处理装置技术领域本发明涉及能够有效地进行处理室的维护的等离子体处理装置。 等离子体处理装置1具有包括下室12和上室13的处理室11,放置硅基板K的压板20,处理气体供给装置27,线圈32,高频电源单元 线圈33,具有设置成可垂直移动的通孔41a的升降板41,用于支撑并升降升降板41的升降机构42,以及用于固定上部室13的固定机构46.固定构件46 由固定板47构成,第一固定螺栓48,49用于使用固定板47将顶板16连接并固定到升降板41;第二固定螺栓50,用于将保持构件32的凸缘部分32b固定到 环形板14和用于将环形板14固定到下室12的侧壁12a的第三固定螺栓51。
    • 10. 发明授权
    • Gramineous hybrid plants and process for preparing them
    • 禾本科杂交植物及其制备方法
    • US5250433A
    • 1993-10-05
    • US770766
    • 1991-10-05
    • Ko ShimamotoJunko WatanabeRie TeradaYasuyuki Hayashi
    • Ko ShimamotoJunko WatanabeRie TeradaYasuyuki Hayashi
    • A01H1/02A01H4/00C12N5/14C12N5/26
    • A01H1/02A01H4/00C12N5/14
    • According to the present invention, there is provided a gramineous hybrid plant produced from a rice-derived protoplast and another gramineous plant-derived protoplast. Also provided by the invention is an efficient process for preparing such a gramineous hybrid plant wherein a protoplast is prepared from a callus or suspension cell of a rice plant (Oryza sativa), another protoplast is separately prepared from a callus or suspension cell of another gramineous plant, these protoplasts are subjected to cell fusion by electric treatment, the thus fused cells are cultivated in a culture medium containing cultured rice cells as nurse cells, and the thus formed colonies are then cultivated in a culture medium containing a plant hormone such as 2,4-dichlorophenoxyacetic acid.
    • 根据本发明,提供了由米源原生质体和另一种禾本科植物来源的原生质体生产的禾本科杂交植物。 本发明还提供了一种制备这种禾本科杂交植物的有效方法,其中原生质体由水稻植物(水稻)的愈伤组织或悬浮细胞制备,另一种原生质体由另一种禾本科植物的愈伤组织或悬浮细胞分别制备 植物,通过电处理使这些原生质体进行细胞融合,将这样融合的细胞在含有培养的水稻细胞作为护士细胞的培养基中培养,然后将如此形成的菌落在含有植物激素如2的培养基中培养 ,4-二氯苯氧基乙酸。