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    • 4. 发明申请
    • Methods and devices for notifying interference measurement signaling, interference measurement and feedback
    • 用于通知干扰测量信号,干扰测量和反馈的方法和装置
    • US20140355468A1
    • 2014-12-04
    • US14348766
    • 2011-12-30
    • Yu Ngok LiYijian ChenSenbao GuoHong Tang
    • Yu Ngok LiYijian ChenSenbao GuoHong Tang
    • H04W24/08H04L5/00H04W72/04
    • H04W24/08H04L5/0057H04L5/0092H04W24/10H04W72/042
    • The present disclosure provides a method for notifying an interference measurement signalling, including that: notifying, by a network side, information of M subframes included in an interference measurement subframe set or a channel quality measurement subframe set to a terminal. The present disclosure also provides a method for measuring interference, including that: receiving, by a terminal, a notification of information of an interference measurement subframe set or a quality measurement subframe set sent by a network side, performing interference measurement on each subframe of the interference measurement subframe set or the channel quality measurement subframe set, and calculating an average interference value; and determining, by the terminal, Channel Quality Indication (CQI) information according to the average interference value, and feeding the CQI information back to a base station. The present disclosure further provides a method for feeding back channel quality information, including that: performing, by a terminal, interference measurement on one or more subframes specified by a base station, determining a CQI according to the measurement result, and feeding back the CQI to the base station. The present disclosure also provides devices for implementing above methods. In the present disclosure, the base station can accurately determine a modulation and coding scheme of the terminal according to the interference measurement result, thus improving data transmission efficiency.
    • 本公开提供一种用于通知干扰测量信令的方法,包括:网络侧通知包括在干扰测量子帧集中的M个子帧或设置到终端的信道质量测量子帧的信息。 本公开还提供了一种用于测量干扰的方法,包括:由终端接收由网络侧发送的干扰测量子帧集合或质量测量子集的信息的通知,对网络侧的每个子帧执行干扰测量 干扰测量子帧集或信道质量测量子帧集,并计算平均干扰值; 以及由所述终端根据所述平均干扰值确定信道质量指示(CQI)信息,并将所述CQI信息反馈给基站。 本公开还提供了一种用于反馈信道质量信息的方法,包括:终端对由基站指定的一个或多个子帧进行干扰测量,根据测量结果确定CQI,并反馈CQI 到基站。 本公开还提供了用于实现上述方法的装置。 在本公开中,基站可以根据干扰测量结果精确地确定终端的调制和编码方案,从而提高数据传输效率。
    • 7. 发明申请
    • Method and Apparatus for Transmitting Periodic Feedback Report
    • 用于传输周期性反馈报告的方法和装置
    • US20130188623A1
    • 2013-07-25
    • US13877165
    • 2011-06-24
    • Yijian ChenJun XuYuNgok LiJunfeng Zhang
    • Yijian ChenJun XuYuNgok LiJunfeng Zhang
    • H04W24/10
    • H04W24/10H04L1/0026H04L1/0027H04L1/0028H04L1/0071H04L1/0072
    • Disclosed in the present invention are a method and an apparatus for transmitting a periodic feedback report. In this case, the method includes: coding a periodic feedback report to be transmitted and data information corresponding to a transmission block respectively, wherein the periodic feedback report includes one of the following information: a combined coding index of rank indicator (RI) information and first pre-coding matrix indicator (PMI-1) information, a combined coding index of the RI and pre-coding type indication (PTI) information, and the PMI-1; intercepting correspondingly coded information according to the target length; and when a transmission block corresponds to a single layer or multiple layers, carrying out channel interleave on the coded information on the single layer or multiple layers to be transmitted on the transmission block, and transmitting the interleaved information on a layer corresponding to a physical uplink shared channel (PUSCH).
    • 在本发明中公开了一种用于发送周期性反馈报告的方法和装置。 在这种情况下,该方法包括:分别编码要发送的周期性反馈报告和对应于传输块的数据信息,其中周期性反馈报告包括以下信息之一:秩指示符(RI)信息的组合编码索引和 第一预编码矩阵指示符(PMI-1)信息,RI和预编码类型指示(PTI)信息的组合编码索引和PMI-1; 根据目标长度拦截相应的编码信息; 并且当传输块对应于单层或多层时,对传输块上要发送的单层或多层上的编码信息执行信道交织,并且在与物理上行链路相对应的层上发送交织信息 共享信道(PUSCH)。
    • 9. 发明申请
    • Method and system for transmitting position reference signal
    • 发送位置参考信号的方法和系统
    • US20120093122A1
    • 2012-04-19
    • US13257854
    • 2009-12-30
    • Bo DaiGuanghui YuWeijun LiYijian Chen
    • Bo DaiGuanghui YuWeijun LiYijian Chen
    • H04W64/00H04W72/04
    • H04L5/0048H04L5/0007H04L5/0053H04L5/0092
    • The present disclosure discloses a method and system for transmitting a position reference signal. Wherein the method includes: frequency domain positions for transmitting a position reference signal are n physical resource blocks, and the value of n is obtained according to signaling; time domain positions for transmitting the position reference signal are the remaining orthogonal frequency division multiplexing symbols in a subframe, except for orthogonal frequency division multiplexing symbols for transmitting a physical downlink control channel and orthogonal frequency division multiplexing symbols for transmitting a cell-specific reference signal; and the position reference signal is transmitted according to the frequency domain position and the time domain position. By adopting the method and the system of the present disclosure, the transmitting of the position reference signal is realized, and the positioning precision of a UE is ensured.
    • 本公开公开了一种用于发送位置参考信号的方法和系统。 其中方法包括:用于发送位置参考信号的频域位置是n个物理资源块,并且根据信令获得n的值; 用于发送位置参考信号的时域位置是除了用于发送物理下行链路控制信道的正交频分复用符号和用于发送小区特定参考信号的正交频分复用符号之外的子帧中的剩余正交频分复用符号; 并且根据频域位置和时域位置发送位置参考信号。 通过采用本公开的方法和系统,实现了位置参考信号的发送,确保了UE的定位精度。
    • 10. 发明授权
    • Post-lithography misalignment correction with shadow effect for multiple patterning
    • 后期光刻不对准校正与阴影效应的多重图案化
    • US07700444B2
    • 2010-04-20
    • US11586274
    • 2006-10-26
    • Yijian Chen
    • Yijian Chen
    • H01L21/336H01L21/302H01L21/461
    • H01L21/31144H01L21/0337H01L21/0338H01L21/76816
    • Misalignment created during a multiple-patterning process is a serious challenge for critical dimension (CD) control and layout design in continuing integrated-circuit device scaling. A number of post-lithography misalignment correction technologies based on the shadow effect are invented for multi-patterning lithographic applications. When applied to transfer patterns from a top layer to an underneath layer, the subtractive shadow effect in anisotropic plasma etching combined with a hard-mask process, will shift the position of features such that the previously produced misalignment can be corrected. Also, additive shadow effect in a sputtering/evaporation process can be used. Misalignment correction methods allow the semiconductor industry to print sub-32 nm (half-pitch) features using the double-patterning technique with currently existing lithographic tools (e.g., 193-nm DUV scanner), therefore postponing the need of expensive next-generation lithography (NGL). The misalignment correction methods can be applied to existing lithography technologies to print features smaller than their physical resolution limits.
    • 在多重图案化过程中产生的对准是连续集成电路设备缩放中的关键尺寸(CD)控制和布局设计的严重挑战。 基于阴影效应的许多后光刻未对准校正技术被发明用于多图案化光刻应用。 当应用于将图案从顶层转移到下层时,各向异性等离子体蚀刻与硬掩模处理相结合的减影效应将移动特征的位置,从而可以校正先前产生的未对准。 此外,可以使用溅射/蒸发过程中的附加阴影效应。 不对准校正方法允许半导体工业使用具有当前存在的光刻工具(例如,193nm DUV扫描器)的双重图案化技术打印32nm(半间距)的特征,因此推迟了昂贵的下一代光刻的需要 (NGL)。 不对准校正方法可以应用于现有的光刻技术,以打印小于其物理分辨率限制的特征。