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    • 6. 发明授权
    • Midsole cushioning system
    • 中底缓冲系统
    • US5718063A
    • 1998-02-17
    • US664351
    • 1996-06-17
    • Yoshio YamashitaKiyomitsu Kurosaki
    • Yoshio YamashitaKiyomitsu Kurosaki
    • A43B13/14A43B13/18A43B13/42A43B21/28A43B13/20
    • A43B1/0072A43B13/189A43B21/28
    • A shoe is provided with a cushioning element, preferably a heel strike cushioning element for a sole portion of the shoe. The cushioning element includes a first chamber having substantially transparent flexible walls filled for example, with a liquid or gel cushioning material. A second chamber is provided having gas impervious, preferably substantially transparent walls which receive therebetween and enclose a portion of the first chamber. The first chamber is seated over the second chamber to form a gas filled cell between the walls of the enclosed portion of the first chamber and the walls of the second chamber. Preferably, a plurality of ribs project from the walls of the second chamber into the gas filled cell to form a plurality of gas filled pockets between the ribs, and the walls of the enclosed portion of the first chamber and the second chamber. The second chamber of the cushioning element is disposed over the sole portion. Preferably, the sole portion is constructed with openings which permit the gel composition to be viewed from the exterior of the shoe.
    • 靴子设置有缓冲元件,优选地用于鞋的鞋底部分的跟部击打缓冲元件。 缓冲元件包括具有基本上透明的柔性壁的第一腔室,例如用液体或凝胶缓冲材料填充。 设置有第二腔室,其具有不透气的,优选地基本上透明的壁,其接纳在它们之间并且包围第一腔室的一部分。 第一室被安置在第二室上方,以在第一室的封闭部分的壁和第二室的壁之间形成填充气体的室。 优选地,多个肋从第二室的壁突出到填充气体的单元中,以在肋之间形成多个气体填充的凹穴,以及第一室和第二室的封闭部分的壁。 缓冲元件的第二腔室设置在鞋底部分之上。 优选地,鞋底部分构造有允许从鞋的外部观察凝胶组合物的开口。
    • 8. 发明授权
    • Method of forming resist pattern and photomask therefor
    • 形成抗蚀剂图案和光掩模的方法
    • US5324600A
    • 1994-06-28
    • US909994
    • 1992-07-07
    • Hideyuki JinboYoshiyuki KawazuYoshio Yamashita
    • Hideyuki JinboYoshiyuki KawazuYoshio Yamashita
    • G03F1/26G03F1/30G03F7/20G03F9/00
    • G03F1/30G03F1/26G03F7/2002G03F7/70283G03F7/70466
    • In a photomask for use in forming a resist pattern by projection exposure of a resist through the photomask, a phase shifter has a first edge part whose image is to be transferred and a second edge part whose image is not to be transferred. A light attenuator is provided to cover the first edge part. The light attenuator may include an array of opaque stripes arranged at a pitch of not more than the limit of resolution, i.e., 0.5.times..lambda./NA, where .lambda. represents the wavelength of light used for the projection exposure, and NA represents the numerical aperture of an optical system used for the projection exposure. In another embodiment, the light attenuator is formed to cover a shifter edge part in alignment with a line of a transmission mask. In a further embodiment, one or more light attenuators having different transparency are used to obtain lines of a resist pattern having different widths.
    • 在通过光掩模的抗蚀剂的投影曝光用于形成抗蚀剂图案的光掩模中,移相器具有其图像要被传送的第一边缘部分和图像不被传送的第二边缘部分。 提供光衰减器以覆盖第一边缘部分。 光衰减器可以包括以不超过分辨率极限(即0.5×λ/ NA)的间距排列的不透明条纹阵列,其中λ表示用于投影曝光的光的波长,NA表示数值孔径 用于投影曝光的光学系统。 在另一个实施例中,光衰减器形成为覆盖与透射掩模的线对准的移位器边缘部分。 在另一个实施例中,使用具有不同透明度的一个或多个光衰减器来获得具有不同宽度的抗蚀剂图案的线。