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    • 1. 发明申请
    • SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
    • 半导体器件的半导体器件和制造方法
    • US20110156181A1
    • 2011-06-30
    • US12971783
    • 2010-12-17
    • Yosuke TAKEUCHIMasamichi MATSUOKARyoji MATSUDAKeisuke TSUKAMOTO
    • Yosuke TAKEUCHIMasamichi MATSUOKARyoji MATSUDAKeisuke TSUKAMOTO
    • H01L29/82H01L21/02
    • H01L43/08B82Y10/00B82Y25/00H01L27/228H01L43/12
    • A semiconductor device is provided which can further suppress the leakage of a magnetic field in a magnetoresistive element, and which can further improve the performance of the semiconductor device. A semiconductor device includes a semiconductor substrate, a lower electrode, a magnetoresistive element, an upper electrode, and a protective film. The lower electrode is formed over a main surface of the semiconductor substrate. The magnetoresistive element includes a fixed layer, a tunneling insulating film, and a free layer. The upper electrode is disposed over the other main surface opposite to one main surface of the free layer opposed to the tunneling insulating film. The protective film covers the sides intersecting the main surfaces of the lower electrode, the fixed layer, the tunneling insulating film, the free layer, and the upper electrode. The fixed layer included in the magnetoresistive element is a layer which is disposed over one main surface of the lower electrode, and whose magnetization direction is fixed. The tunneling insulating film is disposed over the other main surface opposite to one main surface of the fixed layer opposed to the lower electrode. The free layer is a layer which is disposed over the other main surface opposite to one main surface of the tunneling insulating film opposed to the fixed layer, and whose magnetization direction is variable. The width of the upper electrode is smaller than that of each of the lower electrode and the fixed layer in the direction intersecting the lamination direction of the lower electrode, the fixed layer 35, the tunneling insulating film 38, the free layer, and the upper electrode.
    • 提供一种能够进一步抑制磁阻元件中的磁场的泄漏的半导体器件,能够进一步提高半导体器件的性能。 半导体器件包括半导体衬底,下电极,磁阻元件,上电极和保护膜。 下电极形成在半导体衬底的主表面上。 磁阻元件包括固定层,隧道绝缘膜和自由层。 上电极设置在与隧道绝缘膜相对的自由层的一个主表面相对的另一个主表面上。 保护膜覆盖与下电极,固定层,隧道绝缘膜,自由层和上电极的主表面相交的侧面。 包含在磁阻元件中的固定层是设置在下电极的一个主表面上并且其磁化方向固定的层。 隧道绝缘膜设置在与下电极相对的固定层的一个主表面相对的另一主表面上。 自由层是设置在与固定层相对的隧道绝缘膜的一个主表面相对的另一主表面上并且其磁化方向可变的层。 上电极的宽度小于下电极和固定层中的每一个在与下电极,固定层35,隧道绝缘膜38,自由层和上层的层叠方向相交的方向上的宽度 电极。
    • 4. 发明授权
    • Semiconductor device and manufacturing method of semiconductor device
    • 半导体器件及半导体器件的制造方法
    • US08264023B2
    • 2012-09-11
    • US12971783
    • 2010-12-17
    • Yosuke TakeuchiMasamichi MatsuokaRyoji MatsudaKeisuke Tsukamoto
    • Yosuke TakeuchiMasamichi MatsuokaRyoji MatsudaKeisuke Tsukamoto
    • H01L21/02
    • H01L43/08B82Y10/00B82Y25/00H01L27/228H01L43/12
    • A semiconductor device includes a semiconductor substrate, a lower electrode, a magnetoresistive element, an upper electrode, and a protective film. The lower electrode is formed over the semiconductor substrate. The magnetoresistive element includes a fixed layer, a tunneling insulating film, and a free layer. The upper electrode is disposed over the free layer. The protective film covers the sides intersecting the main surfaces of the lower electrode, the fixed layer, the tunneling insulating film, the free layer, and the upper electrode. The fixed layer, whose magnetization direction is fixed, is disposed over the lower electrode. The tunneling insulating film is disposed over the fixed layer. The free layer, whose magnetization direction is variable, is disposed over a main surface of the tunneling insulating film. The width of the upper electrode is smaller than that of each of the lower electrode and the fixed layer.
    • 半导体器件包括半导体衬底,下电极,磁阻元件,上电极和保护膜。 下电极形成在半导体衬底上。 磁阻元件包括固定层,隧道绝缘膜和自由层。 上电极设置在自由层上。 保护膜覆盖与下电极,固定层,隧道绝缘膜,自由层和上电极的主表面相交的侧面。 磁化方向固定的固定层设置在下电极上。 隧道绝缘膜设置在固定层上。 其磁化方向可变的自由层设置在隧道绝缘膜的主表面上。 上电极的宽度小于下电极和固定层的宽度。
    • 5. 发明申请
    • SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    • 半导体器件及其制造方法
    • US20110057275A1
    • 2011-03-10
    • US12874894
    • 2010-09-02
    • Mikio TSUJIUCHIYosuke TakeuchiKazuyuki OmoriKenichi Mori
    • Mikio TSUJIUCHIYosuke TakeuchiKazuyuki OmoriKenichi Mori
    • H01L29/66H01L21/04
    • H01L27/228G11C11/161G11C11/1659H01L29/7833
    • To provide a semiconductor device capable of write operation to a selected magnetoresistive element without causing a malfunction of a non-selected magnetoresistive element and a manufacturing method of this semiconductor device. The semiconductor device includes a magnetic storage element having a magnetization free layer whose magnetization direction is made variable and formed over a lead interconnect and a digit line located below the magnetic storage element, extending in a first direction, and capable of changing the magnetization state of the magnetization free layer by the magnetic field generated. The digit line includes an interconnect body portion and a cladding layer covering therewith the bottom surface and the side surface of the interconnect body portion and opened upward. The cladding layer includes a sidewall portion covering therewith the side surface of the interconnect body portion and a bottom wall portion covering therewith the bottom surface of the interconnect body portion. The thickness of the sidewall portion is made greater than that of the bottom wall portion.
    • 提供能够对选定的磁阻元件进行写入操作而不引起未选择的磁阻元件的故障的半导体器件和该半导体器件的制造方法。 半导体器件包括具有磁化自由层的磁存储元件,该磁化自由层的磁化方向是可变的,并且形成在引线互连和位于磁存储元件下方的位于第一方向上的数字线,并且能够改变磁化状态 磁化自由层由磁场产生。 数字线包括互连主体部分和覆盖互连体部分的底表面和侧表面并向上敞开的覆层。 包覆层包括覆盖互连主体部分的侧表面的侧壁部分和覆盖互连主体部分的底表面的底壁部分。 侧壁部分的厚度大于底壁部分的厚度。
    • 7. 发明授权
    • Semiconductor device and semiconductor device assembly
    • 半导体器件和半导体器件组件
    • US08405172B2
    • 2013-03-26
    • US13075681
    • 2011-03-30
    • Mikio TsujiuchiMasayoshi TarutaniYosuke Takeuchi
    • Mikio TsujiuchiMasayoshi TarutaniYosuke Takeuchi
    • H01L29/82
    • H01L43/08H01L27/228H01L2224/45144H01L2224/48091H01L2224/48227H01L2224/48247H01L2924/13091H01L2924/15311H01L2924/00014H01L2924/00
    • A semiconductor device excellent in the magnetic shielding effect of blocking off external magnetic fields is provided. The semiconductor device includes: an interlayer insulating film so formed as to cover a switching element formed over a main surface of a semiconductor substrate; a flat plate-like lead wiring; a coupling wiring coupling the lead wiring and the switching element with each other; and a magnetoresistive element including a magnetization free layer the orientation of magnetization of which is variable and formed over the lead wiring. The semiconductor device has a wiring and another wiring through which the magnetization state of the magnetization free layer can be varied. In a memory cell area where multiple magnetoresistive elements are arranged, a first high permeability film arranged above the magnetoresistive elements is extended from the memory cell area up to a peripheral area that is an area other than the memory cell area.
    • 提供了一种具有优异的阻挡外部磁场的磁屏蔽效果的半导体器件。 半导体器件包括:层间绝缘膜,其形成为覆盖形成在半导体衬底的主表面上的开关元件; 平板状引线; 使引线和开关元件彼此耦合的耦合布线; 以及包括磁化自由层的磁阻元件,其磁化方向可变并形成在引线布线上。 半导体器件具有布线和另一布线,通过该布线可以改变磁化自由层的磁化状态。 在布置有多个磁阻元件的存储单元区域中,布置在磁阻元件上方的第一高导磁率膜从存储单元区域延伸到作为存储单元区域以外的区域的外围区域。
    • 10. 发明授权
    • Magnetic storage device
    • 磁存储装置
    • US08518562B2
    • 2013-08-27
    • US12617469
    • 2009-11-12
    • Takashi TakenagaTakeharu KuroiwaHiroshi TakadaRyoji MatsudaYosuke Takeuchi
    • Takashi TakenagaTakeharu KuroiwaHiroshi TakadaRyoji MatsudaYosuke Takeuchi
    • H01L29/82G11C11/02
    • G11B5/66G11C11/16G11C11/161G11C11/1659Y10T428/1143
    • A magnetic storage device stable in write characteristic is provided. A first nonmagnetic film is provided over a recording layer. A first ferromagnetic film is provided over the first nonmagnetic film and has a first magnetization and a first film thickness. A second nonmagnetic film is provided over the first ferromagnetic film. A second ferromagnetic film is provided over the second nonmagnetic film, is coupled in antiparallel with the first ferromagnetic film, and has a second magnetization and a second film thickness. An antiferromagnetic film is provided over the second ferromagnetic film. The sum of the product of the first magnetization and the first film thickness and the product of the second magnetization and the second film thickness is smaller than the product of the magnetization of the recording layer and the film thickness of the recording layer.
    • 提供了一种写入特性稳定的磁存储装置。 在记录层上提供第一非磁性膜。 第一铁磁膜设置在第一非磁性膜上并具有第一磁化强度和第一膜厚度。 在第一铁磁膜上设置第二非磁性膜。 第二铁磁膜设置在第二非磁性膜上方,与第一铁磁膜反向并联,并具有第二磁化强度和第二膜厚度。 在第二铁磁膜上设置反铁磁性膜。 第一磁化强度与第一膜厚度的乘积和第二磁化强度与第二膜厚度的乘积的和小于记录层的磁化强度与记录层的膜厚度的乘积。