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    • 6. 发明申请
    • DUAL ENERGY IMAGING SYSTEM
    • 双能量成像系统
    • US20140198899A1
    • 2014-07-17
    • US13739871
    • 2013-01-11
    • Vitaliy ZiskinBoris Oreper
    • Vitaliy ZiskinBoris Oreper
    • G01N23/04
    • G01N23/04G01T1/2985G01V5/0041G01V5/005
    • An inspection system that makes dual energy measurements with a detector array that has selective placement of filter elements adjacent a subset of detectors in the array to provide at least two subsets of detector elements sensitive to X-rays of different energies. Dual energy measurements may be made on objects of interest within an item under inspection by forming a volumetric image using measurements from detectors in a first of the subsets and synthetic readings computed from measurements made with detectors in the array, including those that are filtered. The volumetric image may be used to identify the objects of interest to and source points that, for each object of interest, provide a low interference path to one of the detectors in the second of the subsets. Measurements made with radiation emanating from those source points are used for dual energy analysis of the objects of interest.
    • 一种检测系统,其利用检测器阵列进行双能量测量,所述检测器阵列具有与阵列中的检测器子集相邻的滤波器元件的选择性放置,以提供对不同能量的X射线敏感的检测器元件的至少两个子集。 可以通过使用来自第一子集中的检测器的测量形成体积图像,并且通过阵列中的检测器(包括被过滤的检测器)进行的测量计算的合成读数来形成体积图像,来对被检查物品内的感兴趣对象进行双能量测量。 体积图像可以用于识别感兴趣的对象和源点,对于每个感兴趣对象,在第二个子集中的一个检测器提供低干扰路径。 使用从这些源点发出的辐射进行的测量用于感兴趣对象的双能量分析。
    • 7. 发明申请
    • IRRADIATION SYSTEM INCLUDING AN ELECTRON-BEAM SCANNER
    • 包括电子束扫描仪的辐射系统
    • US20120008746A1
    • 2012-01-12
    • US13236011
    • 2011-09-19
    • Boris OreperDouglas P. BoydNikolay Rolshud
    • Boris OreperDouglas P. BoydNikolay Rolshud
    • A61N5/10
    • A61N5/1049A61B6/032A61B6/4007A61B6/4028A61B6/466A61B6/508A61N5/1067A61N2005/1061
    • A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.
    • 处理光束的特性在扫描期间被控制。 在扫描期间,区域的一部分暴露于成像x射线束,成像x射线束由电子束扫描器产生。 检测到来自该区域的X射线辐射,X射线辐射代表由该区域的该部分引起的成像x射线束的衰减。 基于检测到的x射线辐射产生区域的该部分的第一图像。 从所生成的第一图像确定区域的该部分的特征。 产生从该特征得到的输入,该输入被配置为使治疗束的源改变治疗束的特性。 治疗束的源通过向治疗束的源提供输入来在扫描期间改变治疗束的特性。
    • 8. 发明申请
    • IRRADIATION SYSTEM INCLUDING AN ELECTRON-BEAM SCANNER
    • 包括电子束扫描仪的辐射系统
    • US20100329423A1
    • 2010-12-30
    • US12871981
    • 2010-08-31
    • Boris OreperDouglas P. BoydNikolay Rolshud
    • Boris OreperDouglas P. BoydNikolay Rolshud
    • A61N5/10
    • A61N5/1049A61B6/032A61B6/4007A61B6/4028A61B6/466A61B6/508A61N5/1067A61N2005/1061
    • A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.
    • 处理光束的特性在扫描期间被控制。 在扫描期间,区域的一部分暴露于成像x射线束,成像x射线束由电子束扫描器产生。 检测到来自该区域的X射线辐射,X射线辐射代表由该区域的该部分引起的成像x射线束的衰减。 基于检测到的x射线辐射产生区域的该部分的第一图像。 从所生成的第一图像确定区域的该部分的特征。 产生从该特征得到的输入,该输入被配置为使治疗束的源改变治疗束的特性。 治疗束的源通过向治疗束的源提供输入来在扫描期间改变治疗束的特性。
    • 10. 发明授权
    • Contact width sensors
    • US06225814B1
    • 2001-05-01
    • US09290288
    • 1999-04-13
    • Boris OreperMark LoweCharles McWilliamsCharles MalacariaAnthony CovielloJay Winters
    • Boris OreperMark LoweCharles McWilliamsCharles MalacariaAnthony CovielloJay Winters
    • G01R2708
    • G01L5/0085
    • This invention relates to apparatus for detecting the contact or nip width between two contacting surfaces. The apparatus includes first and second insulating substrates each of which has a pattern of conductive material formed on a facing inner surface thereof, which substrates are adapted to be fitted between the contacting surfaces. For a first embodiment, the pattern of conductive material on one substrate includes a pair of conductive terminals spaced by a distance greater than the contact width to be measured and the conductive pattern on the other substrate includes a conductor which extends over at least a distance greater than the maximum width W to be measured. A resistance path is provided between the conductive terminals having a resistance R0 which is higher than that of the conductor and material is provided in the space between the conductor and the resistance path which material substantially permits current flow therethrough between the conductor and the resistance path in areas where the contacting surfaces are not in contact and which has a resistance less than R0 permitting current flow therethrough in areas where the contact surfaces are in contact. Circuitry is also provided for applying current to one of the terminals and for utilizing the difference in current flow between the terminals to determine contact width. For a second embodiment, the conductive pattern on one substrate includes N substantially parallel and evenly spaced conductive columns and the pattern on the other substrate is a plurality of substantially parallel and evenly spaced rows. The columns are divided into M groups, where M is an integer which is at least 2, and each of the rows is at an angle &thgr; to a line perpendicular to the columns when extending across alternate ones of the groups and at an angle −&thgr; when extending across the remaining groups. The number of columns in each group is selected to achieve a desired resolution, and &thgr; is selected so that the distance in the direction of the columns between the ends of a row for each group is substantially equal to the spacing between adjacent rows.