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1. 发明授权

US10140911B2 Shift register unit and driving method, gate drive circuit, and display apparatus 有权
公开(公告)号：US10140911B2
公开(公告)日：2018-11-27
申请号：US15508608
申请日：2016-09-22
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Xiaoxiang Zhang , Zheng Liu , Mingxuan Liu , Huibin Guo , Xi Chen
IPC分类号： G09G3/20 , G11C19/28
摘要： The present application discloses a shift register unit for outputting a gate driving signal to control image display in an operation cycle including sequentially an input phase, an output phase, an output-suspending phase, the shift register unit including a first node-control circuit connected to a pull-up node and a first pull-down node; a second node-control circuit connected to a pull-down control node and the pull-up node; a pull-up circuit connected to the pull-up node, a first input terminal for receiving a first clock signal, and an output terminal for outputting the gate driving signal, and configured to control the first clock signal to be passed from the first input terminal to the output terminal when the pull-up node is at a first potential level; a third node-control circuit connected to the pull-up node, the first pull-down node, the pull-down control node, and a second input terminal for receiving a second clock signal; and configured to control the first pull-down node to receive the second clock signal from the second input terminal when the pull-down control node is at the first potential level; a first pull-down circuit connected to the first pull-down node and the output terminal to control a second potential level to be passed to the output terminal when the first pull-down node is at the first potential level; a fourth node-control circuit connected to a second pull-down node and the pull-down control node to control the second pull-down node at the second potential level during the input phase and the output phase and to maintain an inverted potential level between the second pull-down node and the first pull-down node during the output-suspending phase; and a second pull-down circuit connected to the second pull-down node and the output terminal to yield a second potential level at the output terminal when the second pull-down node is at the first potential level, the first node-control circuit being further connected to the second pull-down node to control the pull-up node at the second potential level when the second pull-down node is at the first potential level.

2. 发明申请

US20160223901A1 UV CURING MASK PLATE AND A FABRICATING METHOD THEREOF AND A DISPLAY DEVICE 审中-公开
标题翻译： UV固化掩模板及其制造方法和显示装置
公开(公告)号：US20160223901A1
公开(公告)日：2016-08-04
申请号：US14744392
申请日：2015-06-19
申请人： Boe Technology Group Co., Ltd. , Beijing Boe Display Technology Co., Ltd.
发明人： Xiaoxiang Zhang , Zheng Liu , Zongjie Guo , Zhichao Zhang , Mingxuan Liu , Xi Chen
IPC分类号： G03F1/42 , G03F7/00 , G03F1/76
CPC分类号： G02F1/1339 , G02F1/1341 , G02F2001/133354 , G03F1/42 , G03F1/54
摘要： An UV curing mask plate, comprising: a mask layer, wherein: the mask layer is arranged on the substrate, and has a position corresponding to alignment marks, selection marks and an area not covered by the sealing frame glue to be cured; the material of the mask layer is a material with the function of blocking UV light.
摘要翻译：一种UV固化掩模板，包括：掩模层，其中：所述掩模层布置在所述基板上，并且具有对应于对准标记，选择标记和未被待固化的密封框胶水覆盖的区域的位置; 掩模层的材料是具有阻挡UV光的功能的材料。

3. 发明申请

US20150359078A1 DISCHARGE APPARATUS AND DISPLAY PANEL PREPARATION SYSTEM BASED THEREON 有权
标题翻译：放电装置及其显示面板制备系统
公开(公告)号：US20150359078A1
公开(公告)日：2015-12-10
申请号：US14500379
申请日：2014-09-29
申请人： Boe Technology Group Co., Ltd. , Beijing Boe Display Technology Co., Ltd.
发明人： Zhichao Zhang , Zongjie Guo , Zheng Liu , Xiangqian Ding , Mingxuan Liu
IPC分类号： H05F3/04
CPC分类号： H05F3/04 , H05K9/0067
摘要： A discharge device and a display panel preparation system based thereon are disclosed. The discharge device includes a conductive contact terminal electrically connected with an electrostatic discharge contactor of a substrate to be processed; and a voltage controller electrically connected to the contact terminal for adjusting a voltage on the contact terminal. The discharge device is able to eliminate (e.g., neutralize) the static electricity on the substrate to be processed.
摘要翻译：公开了一种基于此的放电装置和显示面板制备系统。放电装置包括与要处理的基板的静电放电接触器电连接的导电接触端子; 电压控制器电连接到接触端子，用于调节接触端子上的电压。放电装置能够消除（例如，中和）要处理的基板上的静电。

4. 发明授权

US10241361B2 Color film substrate, manufacturing method thereof and display device 有权
公开(公告)号：US10241361B2
公开(公告)日：2019-03-26
申请号：US15503046
申请日：2016-07-05
申请人： Boe Technology Group Co., Ltd. , Beijing Boe Display Technology Co., Ltd.
发明人： Zhichao Zhang , Tsungchieh Kuo , Zheng Liu , Mingxuan Liu , Shoukun Wang , Jingjing Jiang
IPC分类号： G02F1/1335
摘要： A color film substrate comprises: a basal substrate, a plurality of color filters of at least one color formed on the basal substrate, and a black matrix formed on the basal substrate. The black matrix has a plurality of openings one-to-one corresponding to the plurality of color filters of at least one color. In a cross section perpendicular to the basal substrate, an edge of the color filter and an opening edge of the black matrix have an overlapping region. According to the color film substrate, manufacturing method thereof and display device provided by the embodiments of the present disclosure, by applying the technology of halftone mask plate and positive/negative photoresist, the patterns for the plurality of color filters of the at least one color and the pattern of the black matrix can be formed with one filter mask plate.

5. 发明授权

US10205049B2 Manufacturing method for light barrier substrate 有权
公开(公告)号：US10205049B2
公开(公告)日：2019-02-12
申请号：US14436141
申请日：2014-07-29
申请人： BOE Technology Group Co., Ltd. , Beijing BOE Display Technology Co., Ltd.
发明人： Xiaoxiang Zhang , Zheng Liu , Zongjie Guo
IPC分类号： H01L27/12 , H01L27/32 , H01L21/768 , H01L33/00 , H01L33/42 , H01L33/44 , H01L33/58 , G02B27/22 , G02B5/00
摘要： The present invention provides a manufacturing method for a light barrier substrate which comprising steps of: forming a metal electrode pattern on a substrate through a first patterning process; forming an insulating layer above the substrate and the metal electrode pattern; forming a metal electrode via hole on the insulating layer and forming a channel pattern for a connecting line between a metal electrode and an exterior integrated circuit (IC) on the insulating layer, with a half tone make process, through a second patterning process; forming a transparent electrode layer pattern on the substrate on which the metal electrode via hole and the channel pattern are formed. The masking steps for forming the insulating layer and the transparent electrode layer may be decreased due to the half tone masking process, thus, the manufacturing process is simplified and the manufacturing efficiency is increased, and the cost for manufacturing the light barrier substrate is lowered because the mask is less used in the manufacturing process.

6. 发明授权

US09899225B2 Method for manufacturing array substrate, array substrate and mask 有权
公开(公告)号：US09899225B2
公开(公告)日：2018-02-20
申请号：US15105175
申请日：2015-09-10
申请人： BOE Technology Group Co., Ltd. , Beijing BOE Display Technology Co., Ltd.
发明人： Zhichao Zhang , Tsung-Chieh Kuo , Zheng Liu , Xiaoxiang Zhang , Xi Chen , Mingxuan Liu
IPC分类号： H01L21/84 , H01L21/28 , H01L27/12 , H01L29/66 , G02F1/1368 , G02F1/1362
CPC分类号： H01L21/28008 , G02F1/1362 , G02F1/1368 , G02F2001/136236 , G02F2001/13685 , H01L27/124 , H01L27/1288 , H01L29/41733 , H01L29/66742
摘要： An embodiment of present disclosure provides a method for manufacturing an array substrate, an array substrate manufactured by the method, and a mask. The method for manufacturing the array substrate includes: providing a mask including a transparent substrate, a light semi-transmission region, a light non-transmission region, and a light transmission region excluding the light semi-transmission region and the light non-transmission region being formed on the transparent substrate; forming a first mask pattern on a base substrate by means of the light non-transmission region of the mask; and forming a second mask pattern on the base substrate having the first mask pattern by means of the light semi-transmission region and the light non-transmission region of the mask.

7. 发明申请

US20170125250A1 METHOD FOR MANUFACTURING ARRAY SUBSTRATE, ARRAY SUBSTRATE AND MASK 有权
公开(公告)号：US20170125250A1
公开(公告)日：2017-05-04
申请号：US15105175
申请日：2015-09-10
申请人： BOE Technology Group Co., Ltd. , Beijing BOE Display Technology Co., Ltd.
发明人： Zhichao Zhang , Tsung-Chieh Kuo , Zheng Liu , Xiaoxiang Zhang , Xi Chen , Mingxuan Liu
IPC分类号： H01L21/28 , H01L29/66 , H01L27/12
CPC分类号： H01L21/28008 , G02F1/1362 , G02F1/1368 , G02F2001/136236 , G02F2001/13685 , H01L27/124 , H01L27/1288 , H01L29/41733 , H01L29/66742
摘要： An embodiment of present disclosure provides a method for manufacturing an array substrate, an array substrate manufactured by the method, and a mask. The method for manufacturing the array substrate includes: providing a mask including a transparent substrate, a light semi-transmission region, a light non-transmission region, and a light transmission region excluding the light semi-transmission region and the light non-transmission region being formed on the transparent substrate; forming a first mask pattern on an base substrate by means of the light non-transmission region of the mask; and forming a second mask pattern on the base substrate having the first mask pattern by means of the light semi-transmission region and the light non-transmission region of the mask.

8. 发明申请

US20160322401A1 GOA Unit and Method for Producing the Same, Gate Driver Circuit 有权
标题翻译： GOA单元及其制造方法，门驱动电路
公开(公告)号：US20160322401A1
公开(公告)日：2016-11-03
申请号：US15089815
申请日：2016-04-04
申请人： BOE Technology Group Co., Ltd. , Beijing BOE Display Technology Co., Ltd.
发明人： Xiaoxiang Zhang , Tsung Chieh Kuo , Zheng Liu , Zhichao Zhang , Mingxuan Liu , Xi Chen
IPC分类号： H01L27/12
CPC分类号： H01L27/1255 , H01L27/124 , H01L27/1288 , H01L28/82 , H01L28/88 , H01L29/41733
摘要： Embodiments of the present disclosure provide a GOA unit and a method for producing the same and a gate driver circuit, which are directed to a field of display technique. The GOA unit includes: a TFT module and a capacitor structure formed on a substrate. The TFT module includes a gate electrode, a source electrode and a drain electrode, and the capacitor structure includes a first electrode and a second electrode configured to form a first capacitor. The gate of the TFT module is located in a same layer as the first electrode of the capacitor structure, the source electrode and the drain electrode of the TFT module are located in a same layer as the second electrode of the capacitor structure, and the second electrode has a groove. Embodiments of the present application are used for a display apparatus.
摘要翻译：本公开的实施例提供了一种针对显示技术领域的GOA单元及其制造方法和栅极驱动器电路。 GOA单元包括：TFT模块和形成在基板上的电容器结构。 TFT模块包括栅电极，源电极和漏电极，电容器结构包括第一电极和第二电极，其被配置为形成第一电容器。 TFT模块的栅极位于与电容器结构的第一电极相同的层中，TFT模块的源电极和漏电极位于与电容器结构的第二电极相同的层中，第二电极具有凹槽。本申请的实施例用于显示装置。

9. 发明申请

US20150144589A1 MANUFACTURING METHOD OF LIGHT BARRIER GLASS SHEET 有权
标题翻译：光栅玻璃板的制造方法
公开(公告)号：US20150144589A1
公开(公告)日：2015-05-28
申请号：US14352805
申请日：2013-06-17
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Zheng Liu , Seung Min Lee , Seung Moo Rim , Huibin Guo
IPC分类号： G02F1/1335 , H01L27/12
CPC分类号： G02F1/133512 , H01L27/1262 , H01L27/1288
摘要： A manufacturing method of a light barrier glass sheet, comprising: farming a metal layer (2) on a glass substrate (1); coating a first photoresist layer (3) on the metal layer (2), performing first exposure on the first photoresist layer (3) through a half tone mask, then performing first development on the first photoresist layer (3); removing partial region of the metal layer (2) through a first etching process; removing a partial thickness and a partial region of the first photoresist layer (3) through an ashing process; forming an insulating layer (4) on the exposed glass substrate (1), the exposed metal layer (2), the first photoresist layer (3) after the ashing process, and sidewalls of the photoresist layer (3) after the ashing process; removing the first photoresist layer (3), the insulating layer (4) on the first photoresist layer (3), and the insulating layer (4) on the sidewalls of the first photoresist layer (3) by a photoresist lifting-off process so as to form a via hole (7); forming a transparent pixel electrode pattern (5) in the via hole (7), on sidewalls of the via hole (7) and on the insulating layer (4). With the method, one mask process can be omitted, thus the manufacturing process can be simplified, the production efficiency can be improved and the production cost can be reduced.
摘要翻译： 1.一种遮光玻璃板的制造方法，其特征在于，在玻璃基板（1）上耕作金属层（2）。在金属层（2）上涂覆第一光致抗蚀剂层（3），通过半色调掩模在第一光致抗蚀剂层（3）上进行第一曝光，然后在第一光致抗蚀剂层（3）上进行第一显影; 通过第一蚀刻工艺去除金属层（2）的部分区域; 通过灰化处理去除第一光致抗蚀剂层（3）的部分厚度和部分区域; 在曝光的玻璃基板（1）上形成绝缘层（4），在灰化处理之后暴露的金属层（2），第一光致抗蚀剂层（3）和灰化处理之后的光致抗蚀剂层（3）的侧壁; 通过光致抗蚀剂剥离工艺去除第一光致抗蚀剂层（3），第一光致抗蚀剂层（3）上的绝缘层（4）和第一光致抗蚀剂层（3）的侧壁上的绝缘层（4）以形成通孔（7）; 在通孔（7）中，在通孔（7）的侧壁和绝缘层（4）上形成透明像素电极图案（5）。通过该方法，可以省略一个掩模处理，因此能够简化制造工序，能够提高生产效率，降低生产成本。

10. 发明授权

US10209573B2 UV curing mask plate and a fabricating method thereof and a display device 有权
公开(公告)号：US10209573B2
公开(公告)日：2019-02-19
申请号：US14744392
申请日：2015-06-19
申请人： Boe Technology Group Co., Ltd. , Beijing Boe Display Technology Co., Ltd.
发明人： Xiaoxiang Zhang , Zheng Liu , Zongjie Guo , Zhichao Zhang , Mingxuan Liu , Xi Chen
IPC分类号： G03F1/42 , G02F1/1339 , G03F1/54 , G02F1/1341 , G02F1/1333
摘要： An UV curing mask plate, comprising: a mask layer, wherein: the mask layer is arranged on the substrate, and has a position corresponding to alignment marks, selection marks and an area not covered by the sealing frame glue to be cured; the material of the mask layer is a material with the function of blocking UV light.

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