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1. 发明授权

US09009861B2 Substrate measurement apparatus with electron distortion unit 有权
标题翻译：具有电子失真单元的基板测量装置
公开(公告)号：US09009861B2
公开(公告)日：2015-04-14
申请号：US14128290
申请日：2011-06-24
申请人： Byong Chon Park , Ju Youb Lee , Woon Song , Jin Ho Choi , Sang Jung Ahn , Joon Lyou , Won Young Song , Jae Wan Hong , Seung Hun Baek
发明人： Byong Chon Park , Ju Youb Lee , Woon Song , Jin Ho Choi , Sang Jung Ahn , Joon Lyou , Won Young Song , Jae Wan Hong , Seung Hun Baek
IPC分类号： G01Q30/02 , B82Y35/00 , H01J37/28
CPC分类号： G01Q30/02 , B82Y35/00 , H01J37/28
摘要： Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.
摘要翻译：提供了一种增加或最大化测量可靠性的融合测量装置。融合测量装置包括用于测量原子水平的基板的表面的原子显微镜，用于测量原子显微镜和基板的电子显微镜，以及至少一个电极，其使基板上覆盖的基板上的二次电子的路径变形原子显微镜的悬臂，使得二次电子进入电子显微镜的电子检测器。

2. 发明申请

US20140130212A1 FUSION MEASUREMENT APPARATUS 有权
标题翻译：熔断测量装置
公开(公告)号：US20140130212A1
公开(公告)日：2014-05-08
申请号：US14128290
申请日：2011-06-24
申请人： Byong Chon Park , Ju Youb Lee , Woon Song , Jin Ho Choi , Sang Jung Ahn , Joon Lyou , Won Young Song , Jae Wan Hong , Seung Hun Baek
发明人： Byong Chon Park , Ju Youb Lee , Woon Song , Jin Ho Choi , Sang Jung Ahn , Joon Lyou , Won Young Song , Jae Wan Hong , Seung Hun Baek
IPC分类号： G01Q30/02
CPC分类号： G01Q30/02 , B82Y35/00 , H01J37/28
摘要： Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.
摘要翻译：提供了一种增加或最大化测量可靠性的融合测量装置。融合测量装置包括用于测量原子水平的基板的表面的原子显微镜，用于测量原子显微镜和基板的电子显微镜，以及至少一个电极，其使基板上覆盖的基板上的二次电子的路径变形原子显微镜的悬臂，使得二次电子进入电子显微镜的电子检测器。

3. 发明授权

US08153338B2 Apparatus and method for repairing photo mask 有权
标题翻译：修复光罩的装置及方法
公开(公告)号：US08153338B2
公开(公告)日：2012-04-10
申请号：US12805416
申请日：2010-07-29
申请人： Byong Chon Park , Sang Jung Ahn , Jin Ho Choi , Joon Lyou , Jae Wan Hong , Won Young Song , Ki Young Jung
发明人： Byong Chon Park , Sang Jung Ahn , Jin Ho Choi , Joon Lyou , Jae Wan Hong , Won Young Song , Ki Young Jung
IPC分类号： G03F1/00 , G06K9/00 , G21G5/00
CPC分类号： G03F1/72
摘要： An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.
摘要翻译：一种用于修复光掩模的装置，包括修复原子力显微镜，其被配置为在光掩模修复过程中修复光掩模的缺陷部分，电子显微镜被配置为将修复原子电子显微镜导航到光掩模的缺陷部分并观察光掩模修复过程，以及成像原子显微镜，被配置为原位成像修复的光罩的形状。

4. 发明申请

US20110027698A1 Apparatus and method for repairing photo mask 有权
标题翻译：修复光罩的装置及方法
公开(公告)号：US20110027698A1
公开(公告)日：2011-02-03
申请号：US12805416
申请日：2010-07-29
申请人： Byong Chon Park , Sang Jung Ahn , Jin Ho Choi , Joon Lyou , Jae Wan Hong , Won Young Song , Ki-Young Jung
发明人： Byong Chon Park , Sang Jung Ahn , Jin Ho Choi , Joon Lyou , Jae Wan Hong , Won Young Song , Ki-Young Jung
IPC分类号： G03F1/00 , G06K9/00
CPC分类号： G03F1/72
摘要： An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.
摘要翻译：一种用于修复光掩模的装置，包括修复原子力显微镜，其被配置为在光掩模修复过程中修复光掩模的缺陷部分，电子显微镜被配置为将修复原子电子显微镜导航到光掩模的缺陷部分并观察光掩模修复过程，以及成像原子显微镜，被配置为原位成像修复的光罩的形状。

5. 发明授权

US08434159B2 AFM measuring method and system thereof 有权
标题翻译： AFM测量方法及其系统
公开(公告)号：US08434159B2
公开(公告)日：2013-04-30
申请号：US13378514
申请日：2010-04-05
申请人： Jae Wan Hong , Won Young Song
发明人： Jae Wan Hong , Won Young Song
IPC分类号： G01Q60/24
CPC分类号： G01Q30/02
摘要： Provided are an AFM measuring method and a system thereof. The tip of a cantilever is provided to a plurality of points on a substrate, to which incident light is radiated from a light source. Scattered light is generated between the tip of the cantilever and the substrate by the incident light and the intensity of the scattered light is measured. The measured intensity of the scattered light is input to a data processing unit so as to find a point where the intensity of the incident is highest. The tip of the cantilever is moved to the point where the intensity of the incident light is highest.
摘要翻译：提供了一种AFM测量方法及其系统。将悬臂的尖端设置在基板上的多个点上，入射光从光源发射到该点上。通过入射光在悬臂的尖端和基板之间产生散射光，并测量散射光的强度。将测得的散射光的强度输入到数据处理单元，以便找到事件强度最高的点。悬臂的尖端移动到入射光强度最高的点。

6. 发明申请

US20120117695A1 AFM MEASURING METHOD AND SYSTEM THEREOF 有权
标题翻译： AFM测量方法及其系统
公开(公告)号：US20120117695A1
公开(公告)日：2012-05-10
申请号：US13378514
申请日：2010-04-05
申请人： Jae Wan Hong , Won Young Song
发明人： Jae Wan Hong , Won Young Song
IPC分类号： G01Q60/24
CPC分类号： G01Q30/02
摘要： Provided are an AFM measuring method and a system thereof. The tip of a cantilever is provided to a plurality of points on a substrate, to which incident light is radiated from a light source. Scattered light is generated between the tip of the cantilever and the substrate by the incident light and the intensity of the scattered light is measured. The measured intensity of the scattered light is input to a data processing unit so as to find a point where the intensity of the incident is highest. The tip of the cantilever is moved to the point where the intensity of the incident light is highest.
摘要翻译：提供了一种AFM测量方法及其系统。将悬臂的尖端设置在基板上的多个点上，入射光从光源发射到该点上。通过入射光在悬臂的尖端和基板之间产生散射光，并测量散射光的强度。将测得的散射光的强度输入到数据处理单元，以便找到事件强度最高的点。悬臂的尖端移动到入射光强度最高的点。

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