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1. 发明申请

US20200159131A1 WEIGHT-FORCE COMPENSATION DEVICE 审中-公开
公开(公告)号：US20200159131A1
公开(公告)日：2020-05-21
申请号：US16748119
申请日：2020-01-21
申请人： Carl Zeiss SMT GmbH
发明人： Michael Erath
IPC分类号： G03F7/20 , F16C32/04 , G02B7/182
摘要： A weight compensating device includes a stator and a translator. The translator is movable relative to the stator along a movement axis. The translator includes a first permanent magnet arrangement with an axial magnetization. The stator includes a second permanent magnet arrangement that radially surrounds the first permanent magnet arrangement. The stator includes a third permanent magnet arrangement that is arranged coaxially below the first permanent magnet arrangement and that has an axial magnetization that is aligned in inverse fashion with respect to the axial magnetization of the first permanent magnet arrangement. The stator includes a magnetic body arrangement that is arranged coaxially above the first permanent magnet arrangement. The first permanent magnet arrangement, the second permanent magnet arrangement, the third permanent magnet arrangement and the magnetic body arrangement form a magnetic unit and, in interaction with one another, form a compensating force that counteracts the weight acting on the translator.

2. 发明授权

US11537052B2 Weight-force compensation device 有权
公开(公告)号：US11537052B2
公开(公告)日：2022-12-27
申请号：US16748119
申请日：2020-01-21
申请人： Carl Zeiss SMT GmbH
发明人： Michael Erath
IPC分类号： G03F7/20 , F16C32/04 , G02B7/182
摘要： A weight compensating device includes a stator and a translator. The translator is movable relative to the stator along a movement axis. The translator includes a first permanent magnet arrangement with an axial magnetization. The stator includes a second permanent magnet arrangement radially surrounding the first permanent magnet arrangement. The stator includes a third permanent magnet arrangement that is coaxially below the first permanent magnet arrangement and that has an axial magnetization aligned in inverse fashion with respect to the axial magnetization of the first permanent magnet arrangement. The stator includes a magnetic body arrangement that is coaxially above the first permanent magnet arrangement. The first permanent magnet arrangement, the second permanent magnet arrangement, the third permanent magnet arrangement and the magnetic body arrangement form a magnetic unit and, in interaction with one another, form a compensating force that counteracts the weight acting on the translator.

3. 发明授权

US10761436B2 Optical arrangement, in particular lithography system, with a transport lock 有权
公开(公告)号：US10761436B2
公开(公告)日：2020-09-01
申请号：US16511154
申请日：2019-07-15
申请人： Carl Zeiss SMT GmbH
发明人： Ralf Zweering , Steffen Fritzsche , Hendrik Wagner , Florian Ahles , Jens Prochnau , Michael Erath , Viktor Kulitzki , Marwène Nefzi
IPC分类号： G03F7/20 , G02B7/02
摘要： An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.

4. 发明授权

US10571816B2 Assembly in a microlithographic projection exposure apparatus 有权
公开(公告)号：US10571816B2
公开(公告)日：2020-02-25
申请号：US16417435
申请日：2019-05-20
申请人： Carl Zeiss SMT GmbH
发明人： Jasper Wesselingh , Michael Erath , Ansgar Holle , Stefan Troeger , Alexander Vogler
IPC分类号： G03F7/20
摘要： The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

5. 发明申请

US20190339626A1 OPTICAL ARRANGEMENT, IN PARTICULAR LITHOGRAPHY SYSTEM 审中-公开
公开(公告)号：US20190339626A1
公开(公告)日：2019-11-07
申请号：US16513201
申请日：2019-07-16
申请人： Carl Zeiss SMT GmbH
发明人： Bernhard Gellrich , Ralf Zweering , Charles Seviour , Michael Erath , Jens Prochnau , Marwène Nefzi , Viktor Kulitzki , Axel Lorenz , Stefan Schaff
IPC分类号： G03F7/20
摘要： An optical arrangement, in particular a lithography system, includes: a movable component, in particular a mirror; at least one actuator for moving the component; and at least one stop having a stop face for delimiting the movement of the component. The optical arrangement further includes, on a stop or on a plurality of stops, at least two stop faces for delimiting the movement of the movable component in one and the same movement direction.

6. 发明授权

US10254664B2 Device for aligning a component 有权
公开(公告)号：US10254664B2
公开(公告)日：2019-04-09
申请号：US16002096
申请日：2018-06-07
申请人： Carl Zeiss SMT GmbH
发明人： Michael Erath
IPC分类号： G03F7/20 , H02N15/00
摘要： The disclosure provides a device for aligning a component via a guide member. A head region of the guide member is secured at a fixing point of the component, and a foot region of the guide member is secured at a fixing point of an actuating element of an actuating facility. The actuating facility is configured to hold the guide member moveably in a movement axis for the purpose of transmitting a force to the component. An adjusting facility is provided to adjust the fixing point of the actuating element so that an angle between the movement axis and the course of the guide member between the fixing points is variable.

7. 发明申请

US20180284626A1 DEVICE FOR ALIGNING A COMPONENT 审中-公开
公开(公告)号：US20180284626A1
公开(公告)日：2018-10-04
申请号：US16002096
申请日：2018-06-07
申请人： Carl Zeiss SMT GmbH
发明人： Michael Erath
IPC分类号： G03F7/20
CPC分类号： G03F7/70825 , G03F7/70141
摘要： The disclosure provides a device for aligning a component via a guide member. A head region of the guide member is secured at a fixing point of the component, and a foot region of the guide member is secured at a fixing point of an actuating element of an actuating facility. The actuating facility is configured to hold the guide member moveably in a movement axis for the purpose of transmitting a force to the component. An adjusting facility is provided to adjust the fixing point of the actuating element so that an angle between the movement axis and the course of the guide member between the fixing points is variable.

8. 发明申请

US20230081234A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY WITH A VIBRATION DAMPER AND METHOD FOR DESIGNING A VIBRATION DAMPER 有权
公开(公告)号：US20230081234A1
公开(公告)日：2023-03-16
申请号：US17989813
申请日：2022-11-18
申请人： Carl Zeiss SMT GmbH
发明人： Philipp Gaida , Michael Erath , Florian Herold
IPC分类号： G03F7/20
摘要： A projection exposure apparatus has a vibration damper with a holder and a mass that is connected to the holder via a damping element. The vibration damper comprises a temperature control device for the temperature control of the damping element. The disclosure also relates to a method for designing a vibration damper.

9. 发明申请

US20190361362A1 ASSEMBLY IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
公开(公告)号：US20190361362A1
公开(公告)日：2019-11-28
申请号：US16417435
申请日：2019-05-20
申请人： Carl Zeiss SMT GmbH
发明人： Jasper Wesselingh , Michael Erath , Ansgar Holle , Stefan Troeger , Alexander Vogler
IPC分类号： G03F7/20
摘要： The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

10. 发明申请

US20190339625A1 OPTICAL ARRANGEMENT, IN PARTICULAR LITHOGRAPHY SYSTEM, WITH A TRANSPORT LOCK 审中-公开
公开(公告)号：US20190339625A1
公开(公告)日：2019-11-07
申请号：US16511154
申请日：2019-07-15
申请人： Carl Zeiss SMT GmbH
发明人： Ralf Zweering , Steffen Fritzsche , Hendrik Wagner , Florian Ahles , Jens Prochnau , Michael Erath , Viktor Kulitzki , Marwène Nefzi
IPC分类号： G03F7/20 , G02B7/02
摘要： An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.

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