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    • 5. 发明申请
    • Schottky device and process of making the same
    • 肖特基器件和制作过程相同
    • US20080116539A1
    • 2008-05-22
    • US11601131
    • 2006-11-17
    • Chiu-Chih ChiangChih-Feng HuangYou-Kuo WuLong Shih Lin
    • Chiu-Chih ChiangChih-Feng HuangYou-Kuo WuLong Shih Lin
    • H01L29/872H01L21/329
    • H01L29/872H01L29/0692
    • A Schottky device and a semiconductor process of making the same are provided. The Schottky device comprises a substrate, a deep well, a Schottky contact, and an Ohmic contact. The substrate is doped with a first type of ions. The deep well is doped with a second type of ions, and formed in the substrate. The Schottky contact contacts a first electrode with the deep well. The Ohmic contact contacts a second electrode with a heavily doped region with the second type of ions in the deep well. Wherein the deep well has a geometry gap with a width formed under the Schottky contact, the first type of ions and the second type of ions are complementary, and the width of the gap adjusts the breakdown voltage. In addition, the semiconductor process comprises the steps of forming a deep well with a second type of ions in a substrate with a first type of ions; forming a first doped region with the first type of ions; forming an oxide layer; forming a second doped region in the deep well with the first type of ions; forming a heavily doped region in the deep well with the second type of ions; and forming a first electrode on a Schottky contact on the deep well and a second electrode on an Ohmic contact on the heavily doped region.
    • 提供了一种肖特基器件及其制造方法。 肖特基器件包括衬底,深阱,肖特基接触和欧姆接触。 衬底掺杂有第一类型的离子。 深阱掺杂有第二类离子,并形成在衬底中。 肖特基接触器与深井接触第一电极。 欧姆接触接触具有重掺杂区域的第二电极,第二种类型的离子在深阱中。 其中深阱具有在肖特基接触下形成的宽度的几何间隙,第一类型的离子和第二类型的离子是互补的,并且间隙的宽度调节击穿电压。 此外,半导体工艺包括以下步骤:在具有第一类型离子的衬底中形成具有第二类型离子的深阱; 形成具有所述第一类型离子的第一掺杂区域; 形成氧化物层; 在所述深井中用所述第一类型的离子形成第二掺杂区域; 在深井中用第二类离子形成重掺杂区; 以及在深阱上的肖特基接触上形成第一电极,在重掺杂区域上的欧姆接触上形成第二电极。