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    • 3. 发明授权
    • Optimised method for producing electroluminescent nanowires
    • 用于制备电致发光纳米线的优化方法
    • US09299882B2
    • 2016-03-29
    • US14653241
    • 2013-10-10
    • ALEDIA
    • Carlo Cagli
    • H01L21/00H01L33/00H01L33/06H01L33/08H01L33/18H01L29/06H01L21/02H01L33/24
    • H01L33/0075H01L21/02603H01L29/0669H01L33/0095H01L33/06H01L33/08H01L33/18H01L33/24H01L2933/0016
    • A process for fabricating an array of nanowires on the surface of a substrate, the nanowires comprising a portion capable of emitting radiation under action of an electrical or optical control and at least partially connected to one another electrically via a conductive upper layer, comprises steps allowing a subset of defective nanowires to be identified among active nanowires, the steps comprising: producing a layer of negative photoresist sensitive to the emission wavelength, covering the array of the nanowires; activating the array of the nanowires under electrical control or optical control so the active nanowires emit the radiation, the radiation decreasing the solubility of the negative resist; developing the resist level with the defective nanowires, leaving zones made less soluble and encircling the active nanowires; and removing the conductive layer above the defective nanowires. A process for fabricating one or more light-emitting diodes using the process is provided.
    • 一种用于在衬底表面上制造纳米线阵列的方法,所述纳米线包括能够在电或光控制的作用下发射辐射并且至少部分地通过导电上层电连接的部分的纳米线,包括允许 在活性纳米线中识别缺陷纳米线的子集,所述步骤包括:产生对发射波长敏感的负光致抗蚀剂层,覆盖纳米线的阵列; 在电气控制或光学控制下激活纳米线的阵列,使得活性纳米线发射辐射,辐射降低了负性抗蚀剂的溶解度; 用有缺陷的纳米线开发抗蚀剂水平,使得区域变得较少可溶并环绕活性纳米线; 并且去除导电层上方的有缺陷的纳米线。 提供了使用该方法制造一个或多个发光二极管的工艺。