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1. 发明授权

US10741423B2 Substrate cleaning apparatus, substrate processing apparatus, and method of cleaning substrate 有权
公开(公告)号：US10741423B2
公开(公告)日：2020-08-11
申请号：US15978320
申请日：2018-05-14
申请人： Ebara Corporation
发明人： Hisajiro Nakano , Junji Kunisawa
IPC分类号： H01L21/67 , H01L21/687 , H01L21/677
摘要： A substrate cleaning apparatus and related apparatuses/methods are disclosed. In one embodiment, a substrate cleaning apparatus includes: a first spindle group including a first driving spindle having a first driving roller configured to rotate a substrate and an idler spindle having a driven roller rotated by the substrate; a second spindle group including a plurality of second driving spindles each having a second driving roller configured to rotate the substrate; a cleaning mechanism configured to clean the substrate rotated by the first driving roller and the plurality of second driving rollers; and a rotation detector configured to detect the rotational speed of the driven roller. The driven roller is positioned on the opposite side to a direction in which the substrate receives a force from the cleaning mechanism.

2. 发明授权

US09892953B2 Substrate gripping apparatus 有权
公开(公告)号：US09892953B2
公开(公告)日：2018-02-13
申请号：US14995952
申请日：2016-01-14
申请人： EBARA CORPORATION
发明人： Mitsuru Miyazaki , Naoki Matsuda , Junji Kunisawa , Manao Hoshina
IPC分类号： B25B11/00 , H01L21/687
CPC分类号： H01L21/68728 , H01L21/68742 , H01L21/68785 , Y10T279/26
摘要： The present invention relates to a substrate gripping apparatus includes a base, a plurality of support posts which are vertically movable relative to the base, a lifting mechanism configured to lift the support posts, and a substrate holder and a substrate guide member mounted to each of the support posts. Each of the support posts includes a relative movement mechanism configured to move the substrate holder in such a direction that the substrate holder releases a peripheral portion of a substrate, while raising the substrate guide member relative to the substrate holder, when the support post moves upward, and to move the substrate holder in such a direction that the substrate holder grips the peripheral portion of the substrate, while lowering the substrate guide member relative to the substrate holder, when the support post moves downward.

3. 发明申请

US20170372893A1 CLEANING APPARATUS AND SUBSTRATE PROCESSING APPARATUS 审中-公开
公开(公告)号：US20170372893A1
公开(公告)日：2017-12-28
申请号：US15631149
申请日：2017-06-23
申请人： Ebara Corporation
发明人： Koji Maeda , Hiroshi Shimomoto , Kuniaki Yamaguchi , Hiroshi Aono , Tetsuya Yashima , Hidetatsu Isokawa , Kenji Shinkai , Mitsuhiko Inaba , Koichi Hashimoto , Junji Kunisawa , Mitsuru Miyazaki , Fujihiko Toyomasu
IPC分类号： H01L21/02
摘要： The cleaning apparatus includes multiple kinds of cleaning modules each configured to perform a cleaning processing of a substrate, a first accommodating section configured to accommodate the multiple kinds of cleaning modules therein, and a fluid supply section configured to supply a fluid to the cleaning modules accommodated in the first accommodating section through a pipe. Each of the multiple kinds of cleaning modules includes a pipe connection portion having a common connection position to be connected with the pipe.

4. 发明授权

US09358662B2 Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method 有权
公开(公告)号：US09358662B2
公开(公告)日：2016-06-07
申请号：US14309152
申请日：2014-06-19
申请人： Ebara Corporation
发明人： Mitsuru Miyazaki , Seiji Katsuoka , Naoki Matsuda , Junji Kunisawa , Kenichi Kobayashi , Hiroshi Sotozaki , Hiroyuki Shinozaki , Osamu Nabeya , Shinya Morisawa , Takahiro Ogawa , Natsuki Makino
IPC分类号： H01L21/67 , H01L21/306 , B24B37/34 , H01L21/677
CPC分类号： B24B37/345 , H01L21/30625 , H01L21/67219 , H01L21/67739 , H01L21/67742 , H01L21/67754 , Y10T137/0318 , Y10T137/8593
摘要： An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.

5. 发明申请

US20160133503A1 SUBSTRATE GRIPPING APPARATUS 审中-公开
标题翻译：基板搬运装置
公开(公告)号：US20160133503A1
公开(公告)日：2016-05-12
申请号：US14995952
申请日：2016-01-14
申请人： EBARA CORPORATION
发明人： Mitsuru Miyazaki , Naoki Matsuda , Junji Kunisawa , Manao Hoshina
IPC分类号： H01L21/687
CPC分类号： H01L21/68728 , H01L21/68742 , H01L21/68785 , Y10T279/26
摘要： The present invention relates to a substrate gripping apparatus includes a base, a plurality of support posts which are vertically movable relative to the base, a lifting mechanism configured to lift the support posts, and a substrate holder and a substrate guide member mounted to each of the support posts. Each of the support posts includes a relative movement mechanism configured to move the substrate holder in such a direction that the substrate holder releases a peripheral portion of a substrate, while raising the substrate guide member relative to the substrate holder, when the support post moves upward, and to move the substrate holder in such a direction that the substrate holder grips the peripheral portion of the substrate, while lowering the substrate guide member relative to the substrate holder, when the support post moves downward.
摘要翻译：本发明涉及一种基板夹持装置，其包括基座，可相对于基座垂直移动的多个支撑柱，构造成提升支撑柱的提升机构，以及安装到每个支撑柱上的基板保持器和基板引导构件支持岗位。每个支撑柱包括相对运动机构，该相对运动机构构造成当支撑柱向上移动时，使衬底保持器沿衬底保持器释放衬底的周边部分的方向移动，同时使衬底引导构件相对于衬底保持器升高并且当支撑柱向下移动时，使衬底保持器沿衬底保持器夹持衬底的周边部分的方向移动，同时相对于衬底保持器降低衬底引导构件。

6. 发明授权

US09269605B2 Substrate gripping apparatus 有权
标题翻译：基板夹持装置
公开(公告)号：US09269605B2
公开(公告)日：2016-02-23
申请号：US14150257
申请日：2014-01-08
申请人： EBARA CORPORATION
发明人： Mitsuru Miyazaki , Naoki Matsuda , Junji Kunisawa , Manao Hoshina
IPC分类号： H01L21/687
CPC分类号： H01L21/68728 , H01L21/68742 , H01L21/68785 , Y10T279/26
摘要： The present invention relates to a substrate gripping apparatus includes a base, a plurality of support posts which are vertically movable relative to the base, a lifting mechanism configured to lift the support posts, and a substrate holder and a substrate guide member mounted to each of the support posts. Each of the support posts includes a relative movement mechanism configured to move the substrate holder in such a direction that the substrate holder releases a peripheral portion of a substrate, while raising the substrate guide member relative to the substrate holder, when the support post moves upward, and to move the substrate holder in such a direction that the substrate holder grips the peripheral portion of the substrate, while lowering the substrate guide member relative to the substrate holder, when the support post moves downward.
摘要翻译：本发明涉及一种基板夹持装置，其包括基座，可相对于基座垂直移动的多个支撑柱，构造成提升支撑柱的提升机构，以及安装到每个支撑柱上的基板保持器和基板引导构件支持岗位。每个支撑柱包括相对运动机构，该相对运动机构构造成当支撑柱向上移动时，使衬底保持器沿衬底保持器释放衬底的周边部分的方向移动，同时使衬底引导构件相对于衬底保持器升高并且当支撑柱向下移动时，使衬底保持器沿衬底保持器夹持衬底的周边部分的方向移动，同时相对于衬底保持器降低衬底引导构件。

7. 发明授权

US11532491B2 Substrate cleaning apparatus, substrate processing apparatus, and method of cleaning substrate 有权
公开(公告)号：US11532491B2
公开(公告)日：2022-12-20
申请号：US16919788
申请日：2020-07-02
申请人： Ebara Corporation
发明人： Hisajiro Nakano , Junji Kunisawa
IPC分类号： H01L21/67 , H01L21/687 , H01L21/677
摘要： A substrate cleaning apparatus and related apparatuses/methods are disclosed. In one embodiment, a substrate cleaning apparatus includes: a first spindle group including a first driving spindle having a first driving roller configured to rotate a substrate and an idler spindle having a driven roller rotated by the substrate; a second spindle group including a plurality of second driving spindles each having a second driving roller configured to rotate the substrate; a cleaning mechanism configured to clean the substrate rotated by the first driving roller and the plurality of second driving rollers; and a rotation detector configured to detect the rotational speed of the driven roller. The driven roller is positioned on the opposite side to a direction in which the substrate receives a force from the cleaning mechanism.

8. 发明申请

US20200335363A1 SUBSTRATE CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF CLEANING SUBSTRATE 审中-公开
公开(公告)号：US20200335363A1
公开(公告)日：2020-10-22
申请号：US16919788
申请日：2020-07-02
申请人： Ebara Corporation
发明人： Hisajiro Nakano , Junji Kunisawa
IPC分类号： H01L21/67 , H01L21/687 , H01L21/677
摘要： A substrate cleaning apparatus and related apparatuses/methods are disclosed. In one embodiment, a substrate cleaning apparatus includes: a first spindle group including a first driving spindle having a first driving roller configured to rotate a substrate and an idler spindle having a driven roller rotated by the substrate; a second spindle group including a plurality of second driving spindles each having a second driving roller configured to rotate the substrate; a cleaning mechanism configured to clean the substrate rotated by the first driving roller and the plurality of second driving rollers; and a rotation detector configured to detect the rotational speed of the driven roller. The driven roller is positioned on the opposite side to a direction in which the substrate receives a force from the cleaning mechanism.

9. 发明授权

US10546764B2 Substrate cleaning apparatus and substrate processing apparatus 有权
公开(公告)号：US10546764B2
公开(公告)日：2020-01-28
申请号：US15432471
申请日：2017-02-14
申请人： EBARA CORPORATION
发明人： Akira Imamura , Mitsuru Miyazaki , Junji Kunisawa , Shunsuke Matsuzawa
IPC分类号： B08B1/04 , H01L21/67
摘要： A substrate cleaning apparatus comprises: a cleaning member 11,21 that comes into contact with a substrate W and cleans the substrate W; a member rotating unit 15, 25 that rotates the cleaning member 11, 21; a pressing drive unit 19, 29 that presses the cleaning member 11, 21 against the substrate W; a torque detecting unit 16, 26 for detecting torque applied to the member rotating unit 15, 25; and a control unit 50 that controls pressing force on the basis of a result of detection by the torque detecting unit 16, 26.

10. 发明授权

US10340159B2 Cleaning chemical supplying device, cleaning chemical supplying method, and cleaning unit 有权
公开(公告)号：US10340159B2
公开(公告)日：2019-07-02
申请号：US14730584
申请日：2015-06-04
申请人： EBARA CORPORATION
发明人： Fujihiko Toyomasu , Toru Maruyama , Junji Kunisawa
IPC分类号： B01F15/00 , H01L21/67 , B01F3/08
摘要： A cleaning chemical supplying device, a cleaning chemical supplying method, and a cleaning unit capable of flexibly handling a change of a dilution ratio and suppression of an increase of a device size are provided. A cleaning chemical supplying device has a first in-line mixer, a second in-line mixer, a first chemical CLC box, a second chemical CLC box, and a DIWCLC box.

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