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1. 发明申请

US20230113646A1 PRECURSOR DELIVERY SYSTEMS FOR DETERMINING MATERIAL LEVELS 有权
公开(公告)号：US20230113646A1
公开(公告)日：2023-04-13
申请号：US17959792
申请日：2022-10-04
申请人： ENTEGRIS, INC.
发明人： Scott L. Battle , Benjamin Cardozo , Chase Parker
IPC分类号： C23C16/455 , G01G17/04
摘要： A precursor delivery system for determining material levels and related methods can include an ampoule and at least one tray disposed in the ampoule. The at least one tray may be configured to hold an amount of a precursor material. A load cell assembly is also included. The load cell assembly may include a load cell. The load cell assembly may be coupled to the at least one tray in a configuration sufficient for the at least one tray to exert a mechanical force upon the load cell. This mechanical force may be correlative to the amount of precursor material present on the at least one tray and thus may be used to determine material levels within the ampoule.

2. 发明授权

US10895347B2 Heat transfer to ampoule trays 有权
公开(公告)号：US10895347B2
公开(公告)日：2021-01-19
申请号：US16162560
申请日：2018-10-17
申请人： Entegris, Inc.
发明人： Bryan C. Hendrix , Scott L. Battle , John N. Gregg
IPC分类号： C23C16/448 , F17C7/04 , F28D21/00
摘要： The invention is directed to a vaporizer or ampoule assembly with improved heat transfer between a vaporizer vessel body and at least one support tray located therein. In particular, there is provided a heat transfer enhancing member that is disposed between a vessel body and support tray. In one example of a heat transfer enhancing member or assembly there is included a heat conductive mesh or liner around totally or partially around the support tray that is wedged in between the support tray and the interior diameter or wall of the vessel body. In a related embodiment, the heat transfer enhancing member includes an expandable support tray sidewall to increase physical contact between the support tray and the vessel body interior wall.

3. 发明申请

US20170029946A1 METHOD AND APPARATUS TO HELP PROMOTE CONTACT OF GAS WITH VAPORIZED MATERIAL 审中-公开
标题翻译：方法和装置帮助促进与气体材料接触的气体
公开(公告)号：US20170029946A1
公开(公告)日：2017-02-02
申请号：US15295662
申请日：2016-10-17
申请人： Entegris, Inc.
发明人： John N. Gregg , Scott L. Battle , Jeffrey I. Banton , Donn K. Naito , Ravi K. Laxman
IPC分类号： C23C16/448 , C23C16/455 , C23C16/50 , C23C16/44
CPC分类号： C23C16/4483 , C23C16/4408 , C23C16/4481 , C23C16/45544 , C23C16/50 , F17C3/00 , F17C3/02 , F17C11/00 , F17C2203/03 , Y02E60/321 , Y10S261/65
摘要： Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.
摘要翻译：可汽化材料支撑在容器内以促进引入的气体与可蒸发材料的接触，并产生包括蒸发材料的产物气体。加热元件向容器的壁提供热量以加热设置在其中的可蒸发材料。容器可以包括具有可移除顶部的安瓿。限定多个材料支撑表面的多个容器可以堆放在与容器热连通的容器内。管可以设置在容器内并且联接到气体入口。可以进一步提供过滤器，流量计和液位传感器。由引入的气体与汽化材料的接触产生的产物气体可以被输送到原子层沉积（ALD）或类似的工艺设备。包含固体的源材料的至少一部分可以溶解在溶剂中，然后除去溶剂以产生设置在蒸发器内的源材料（例如，金属络合物）。

4. 发明申请

US20230130079A1 HIGH VAPOR PRESSURE DELIVERY SYSTEM 有权
公开(公告)号：US20230130079A1
公开(公告)日：2023-04-27
申请号：US17972242
申请日：2022-10-24
申请人： ENTEGRIS, INC.
发明人： Scott L. Battle , John N. Gregg , Donn K. Naito , Bryan Hendrix
IPC分类号： C23C16/448 , C23C16/52
摘要： A system includes a vaporizer vessel. The vaporizer vessel includes an outlet fluidly connected to the vaporizer vessel. A heater is configured to heat the vaporizer vessel. A valve is configured to regulate a pressure of a vaporized material at the outlet. In response to the pressure at the outlet being outside a set pressure range, the heater is configured to increase or decrease heat to the vaporizer vessel.

5. 发明申请

US20230112884A1 MODULAR TRAY FOR SOLID CHEMICAL VAPORIZING CHAMBER 有权
公开(公告)号：US20230112884A1
公开(公告)日：2023-04-13
申请号：US17961470
申请日：2022-10-06
申请人： ENTEGRIS, INC.
发明人： Scott L. Battle , Jacob Thomas , Benjamin H. Olson , John N. Gregg
IPC分类号： C23C16/448 , C23C16/455
摘要： A modular tray for an ampoule of a delivery system of solid precursor materials used in Atomic Layer Deposition (ALD) processes, Chemical Vapor Deposition (CVD) processes or both. The modular tray is configured with separate components which can enhance the ease of which the modular tray can be inserted into the ampoule, and the tray is configured to make improved contact with inner wall surfaces of the ampoule to provide improved heat transfer from the inner wall to the modular tray and ultimately to the solid precursor materials disposed on the modular tray.

6. 发明申请

US20160369402A1 COBALT PRECURSORS 审中-公开
标题翻译： COBALT前辈
公开(公告)号：US20160369402A1
公开(公告)日：2016-12-22
申请号：US15120844
申请日：2015-02-19
申请人： ENTEGRIS, INC.
发明人： Thomas H. Baum , Scott L. Battle , John M. Cleary , David W. Peters , Philip S.H. Chen
IPC分类号： C23C16/50 , C07F15/06 , C23C16/48 , C23C16/06 , C23C16/455
CPC分类号： C23C16/50 , C07F15/06 , C23C16/06 , C23C16/16 , C23C16/18 , C23C16/45525 , C23C16/483
摘要： Cobalt precursors are described, having application for vapor deposition of cobalt on substrates, such as in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes for forming interconnects, capping structures, and bulk cobalt conductors, in the manufacture of integrated circuitry and thin film products.
摘要翻译：描述了钴前体，其用于在基底上气相沉积钴，例如在用于形成互连，封盖结构和体钴电极导体的原子层沉积（ALD）和化学气相沉积（CVD）工艺中，在集成电路的制造中和薄膜产品。

7. 发明申请

US20230062455A1 VAPORIZER ASSEMBLY 有权
公开(公告)号：US20230062455A1
公开(公告)日：2023-03-02
申请号：US17900713
申请日：2022-08-31
申请人： ENTEGRIS, INC.
发明人： Benjamin Cardozo , Scott L. Battle
IPC分类号： C23C16/48
摘要： An assembly includes a vaporizer vessel. In some embodiments, the vaporizer vessel defines an interior volume. In some embodiments, the vaporizer vessel is configured to hold at least one source reagent within the interior volume. In some embodiments, the assembly includes a heater. In some embodiments, the heater is configured to vaporize the at least one source reagent. In some embodiments, the heater is a radiant heat source configured to vaporize the at least one source reagent without heating the vaporizer vessel.

8. 发明申请

US20170032973A1 COBALT CVD 有权
公开(公告)号：US20170032973A1
公开(公告)日：2017-02-02
申请号：US15302741
申请日：2015-03-26
申请人： ENTEGRIS, INC.
发明人： Thomas H. Baum , Scott L. Battle , David W. Peters , Philip S.H. Chen
IPC分类号： H01L21/285 , H01L21/768 , C23C16/56 , H01L21/321 , C23C16/455 , C23C16/06
CPC分类号： H01L21/28562 , C07F15/06 , C23C16/06 , C23C16/18 , C23C16/455 , C23C16/56 , H01L21/28556 , H01L21/28568 , H01L21/321 , H01L21/76843 , H01L21/76849 , H01L21/76864 , H01L21/76873 , H01L23/53257 , H01L2924/0002 , H01L2924/00
摘要： A cobalt deposition process, including: volatilizing a cobalt precursor selected from among CCTBA, CCTMSA, and CCBTMSA, to form a precursor vapor; and contacting the precursor vapor with a substrate under vapor deposition conditions effective for depositing on the substrate (i) high purity, low resistivity cobalt or (ii) cobalt that is annealable by thermal annealing to form high purity, low resistivity cobalt. Such cobalt deposition process can be used to manufacture product articles in which the deposited cobalt forms an electrode, capping layer, encapsulating layer, diffusion layer, or seed for electroplating of metal thereon, e.g., a semiconductor device, flat-panel display, or solar panel.
摘要翻译：钴沉积工艺，包括：挥发选自CCTBA，CCTMSA和CCBTMSA的钴前体，以形成前体蒸气; 以及在有效沉积在基底上的气相沉积条件（i）高温，低电阻率的钴或（ⅱ）可通过热退火退火以形成高纯度的低电阻率钴的钴的（ⅱ）钴的气相沉积条件下将前体蒸汽与基底接触。这种钴沉积工艺可用于制造其中沉积的钴形成其上的金属的电极，封盖层，封装层，扩散层或晶种的产品，例如半导体器件，平板显示器或太阳能面板。

9. 发明申请

US20150337436A1 METHOD AND APPARATUS TO HELP PROMOTE CONTACT OF GAS WITH VAPORIZED MATERIAL 有权
标题翻译：方法和装置帮助促进与气体材料接触的气体
公开(公告)号：US20150337436A1
公开(公告)日：2015-11-26
申请号：US14815805
申请日：2015-07-31
申请人： Entegris, Inc.
发明人： John N. Gregg , Scott L. Battle , Jeffrey I. Banton , Donn K. Naito , Ravi K. Laxman
IPC分类号： C23C16/448
CPC分类号： C23C16/4483 , C23C16/4408 , C23C16/4481 , C23C16/45544 , C23C16/50 , F17C3/00 , F17C3/02 , F17C11/00 , F17C2203/03 , Y02E60/321 , Y10S261/65
摘要： Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.
摘要翻译：可汽化材料支撑在容器内以促进引入的气体与可蒸发材料的接触，并产生包括蒸发材料的产物气体。加热元件向容器的壁提供热量以加热设置在其中的可蒸发材料。容器可以包括具有可移除顶部的安瓿。限定多个材料支撑表面的多个容器可以堆放在与容器热连通的容器内。管可以设置在容器内并且联接到气体入口。可以进一步提供过滤器，流量计和液位传感器。由引入的气体与汽化材料的接触产生的产物气体可以被输送到原子层沉积（ALD）或类似的工艺设备。包含固体的源材料的至少一部分可以溶解在溶剂中，然后除去溶剂以产生设置在蒸发器内的源材料（例如，金属络合物）。

10. 发明申请

US20230115177A1 COMPRESSIBLE TRAY FOR SOLID CHEMICAL VAPORIZING CHAMBER 有权
公开(公告)号：US20230115177A1
公开(公告)日：2023-04-13
申请号：US17961457
申请日：2022-10-06
申请人： ENTEGRIS, INC.
发明人： Scott L. Battle , Donn K. Naito , John N. Gregg , Jacob Thomas , Chase Parker , James Schindler , Bryan C. Hendrix , Benjamin H. Olson
IPC分类号： C23C16/448 , C23C16/455
摘要： A tray for an ampoule of a delivery system of solid precursor materials used in Atomic Layer Deposition (ALD) processes, Chemical Vapor Deposition (CVD) processes or both. The tray is configured to be able to have a reduced profile size when compressed to enhance the ease of which the tray can be inserted into the ampoule, and the tray is configured to expand in size to make improved contact with inner wall surfaces of the ampoule to provide improved heat transfer from the inner wall to the tray and ultimately to the solid precursor materials disposed on the tray.

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