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    • 9. 发明申请
    • TECHNIQUE FOR VERIFYING THE MICROSTRUCTURE OF LEAD-FREE INTERCONNECTS IN SEMICONDUCTOR ASSEMBLIES
    • 用于验证半导体组件中无铅互连的微结构的技术
    • US20120300220A1
    • 2012-11-29
    • US13115823
    • 2011-05-25
    • Christian BergeronPascal BlaisClement FortinLuc Guerin
    • Christian BergeronPascal BlaisClement FortinLuc Guerin
    • G01B11/24
    • G01B11/24G01B2210/56
    • A method for verifying the internal microstructure of interconnects in flip-chip applications includes providing a microelectronic assembly comprising the following: a substrate hosting an array of flip-chip attach pads and one or more process control pads; a flip chip having an array of solder bumps in contact with the array of flip-chip attach pads; and one or more representative solder bumps contacting the one or more process control pads. The representative solder bumps have a substantially similar or identical chemical composition as the array of solder bumps. A reflow cycle is then applied to the microelectronic assembly to melt and solidify the array of solder bumps on the flip-chip attach pads and melt and solidify the representative solder bumps on the process control pads. The surface texture of the representative solder bumps is then optically inspected to determine an internal microstructure of the array of solder bumps.
    • 用于验证倒装芯片应用中的互连的内部微结构的方法包括提供包括以下的微电子组件:承载倒装芯片附接焊盘和一个或多个工艺控制焊盘阵列的衬底; 具有与倒装芯片附接焊盘阵列接触的焊料凸块阵列的倒装芯片; 以及一个或多个代表性的焊料凸块与一个或多个工艺控制焊盘接触。 代表性的焊料凸块具有与焊料凸块阵列基本相似或相同的化学组成。 然后将回流循环施加到微电子组件以熔化并固化倒装芯片附接焊盘上的焊料凸块阵列,并熔化并固化过程控制焊盘上的代表性焊料凸块。 然后对代表性焊料凸块的表面纹理进行光学检查,以确定焊料凸块阵列的内部微结构。