会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Method for producing reflective layer, and reflective layer
    • US11287555B2
    • 2022-03-29
    • US16709860
    • 2019-12-10
    • FUJIFILM Corporation
    • Keisuke KodamaShunya KatohHiroshi Inada
    • C09K19/56G02B5/08G02B5/02G02B5/26
    • An object of the present invention is to provide a method for producing a reflective layer having an excellent diffuse reflectivity and a wide reflection wavelength range. Another object of the present invention is to provide a reflective layer having an excellent diffuse reflectivity and a wide reflection wavelength range.
      The method for producing a reflective layer of the present invention includes: a step 1 of applying a composition selected from the group consisting of the following composition X and the following composition Y onto a substrate to form a composition layer; a step 2 of heating the composition layer to align a liquid crystal compound in the composition layer into a cholesteric liquid crystalline phase state; a step 3 of cooling or heating the composition layer in a cholesteric liquid crystalline phase state to reduce a helical pitch; and a step 4 of irradiating at least a partial region of the composition layer with light, between the step 1 and the step 2, between the step 2 and the step 3, or after the step 3, to photosensitize a chiral agent A or a chiral agent C in the composition layer. Composition X: a composition including a liquid crystal compound, a chiral agent A whose helical twisting power is changed upon light irradiation, and a chiral agent B whose helical twisting power is increased upon cooling or heating. Composition Y: a composition including a liquid crystal compound and a chiral agent C whose helical twisting power is changed upon light irradiation and whose helical twisting power is increased upon cooling or heating.