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    • 9. 发明申请
    • Strained Semiconductor Device and Method of Making the Same
    • 应变半导体器件及其制造方法
    • US20110278680A1
    • 2011-11-17
    • US13193692
    • 2011-07-29
    • Helmut Horst TewsAndre Schenk
    • Helmut Horst TewsAndre Schenk
    • H01L27/088H01L21/8234
    • H01L29/7848H01L21/823807H01L21/823814H01L21/823864H01L27/088H01L27/1203H01L29/66477H01L29/6653H01L29/66636H01L29/7834
    • In a method for forming a semiconductor device, a gate electrode is formed over a semiconductor body (e.g., bulk silicon substrate or SOI layer). The gate electrode is electrically insulated from the semiconductor body. A first sidewall spacer is formed along a sidewall of the gate electrode. A sacrificial sidewall spacer is formed adjacent the first sidewall spacer. The sacrificial sidewall spacer and the first sidewall spacer overlying the semiconductor body. A planarization layer is formed over the semiconductor body such that a portion of the planarization layer is adjacent the sacrificial sidewall spacer. The sacrificial sidewall spacer can then be removed and a recess etched in the semiconductor body. The recess is substantially aligned between the first sidewall spacer and the portion of the planarization layer. A semiconductor material (e.g., SiGe or SiC) can then be formed in the recess.
    • 在形成半导体器件的方法中,在半导体本体(例如体硅衬底或SOI层)上形成栅电极。 栅电极与半导体本体电绝缘。 沿着栅电极的侧壁形成第一侧壁间隔物。 邻近第一侧壁间隔件形成牺牲侧壁间隔物。 牺牲侧壁间隔件和覆盖半导体本体的第一侧壁间隔件。 平坦化层形成在半导体本体上,使得平坦化层的一部分与牺牲侧壁间隔物相邻。 然后可以去除牺牲侧壁间隔物并在半导体本体中蚀刻凹陷。 所述凹部基本上在所述第一侧壁间隔物和所述平坦化层的所述部分之间对准。 然后可以在凹部中形成半导体材料(例如,SiGe或SiC)。
    • 10. 发明授权
    • Selective etching to increase trench surface area
    • 选择性蚀刻以增加沟槽表面积
    • US07157328B2
    • 2007-01-02
    • US11047312
    • 2005-01-31
    • Helmut Horst TewsStephan KudelkaKenneth T. Settlemyer
    • Helmut Horst TewsStephan KudelkaKenneth T. Settlemyer
    • H01L21/8242
    • H01L21/30604H01L29/66181
    • The surface area of the walls of a trench formed in a substrate is increased. A barrier layer is formed on the walls of the trench such that the barrier layer is thinner near the corners of the trench and is thicker between the corners of the trench. A dopant is introduced into the substrate through the barrier layer to form higher doped regions in the substrate near the corners of the trench and lesser doped regions between the corners of the trench. The barrier layer is removed, and the walls of the trench are etched in a manner that etches the lesser doped regions of the substrate at a higher rate than the higher doped regions of the substrate to widen and lengthen the trench and to form rounded corners at the intersections of the walls of the trench.
    • 在衬底中形成的沟槽的壁的表面积增加。 阻挡层形成在沟槽的壁上,使得阻挡层在沟槽的角部附近更薄,并且在沟槽的角部之间更厚。 通过势垒层将掺杂剂引入到衬底中,以在衬底附近的沟槽的角部附近形成更高的掺杂区域,并且在沟槽的角部之间形成较小的掺杂区域。 去除阻挡层,并且以如下方式蚀刻沟槽的壁,该方式是以比衬底的较高掺杂区域更高的速率蚀刻衬底的较小掺杂区域,以加宽和延长沟槽并且形成圆角 沟渠墙壁的交叉点。