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1. 发明授权

US11442024B2 Defect classification device, inspection device, and inspection system 有权
公开(公告)号：US11442024B2
公开(公告)日：2022-09-13
申请号：US16642948
申请日：2017-09-11
申请人： Hitachi High-Technologies Corporation
发明人： Takanori Kondo , Toshifumi Honda , Akira Hamamatsu , Hideo Ota , Yoshio Kimoto
IPC分类号： G01N21/95 , G01N21/956
摘要： In order to prevent an erroneous determination of an on-film defect, the sensitivity of the post-inspection is reduced so that a film swelling due to a minute defect would not be detected. Classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling, by performing a coordinate correction on the result of a post-inspection by an actual-defect fine alignment using the result of a pre-inspection performed with two-stage thresholds, and by checking defects against each other. In addition, classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling by, during the post-inspection, preparing instruction data from information of the refractive index and thickness of a film formed on a wafer and comparing the instruction data with a signal intensity ratio of a detection system.

2. 发明授权

US10254235B2 Defect inspecting method and defect inspecting apparatus 有权
公开(公告)号：US10254235B2
公开(公告)日：2019-04-09
申请号：US15806937
申请日：2017-11-08
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Toshiyuki Nakao , Shigenobu Maruyama , Akira Hamamatsu , Yuta Urano
IPC分类号： G01N21/00 , G01N21/95 , G01N21/88 , H01L21/66
摘要： A defect inspecting method and apparatus for inspecting a surface state including a defect on a wafer surface, in which a polarization state of a laser beam irradiated onto the wafer surface is connected into a specified polarization state, the converted laser beam having the specified polarization state is inserted onto the wafer surface, and a scattering light occurring from an irradiated region where the laser beam having the specified polarization state is irradiated, is separated into a first scattering light occurring due to a defect on the wafer and a second scattering light occurring due to a surface roughness on the wafer. An optical element for optical path division separates the first and second scattering lights approximately at the same time.

3. 发明授权

US10107762B2 Examination device 有权
公开(公告)号：US10107762B2
公开(公告)日：2018-10-23
申请号：US15546615
申请日：2016-01-26
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Masami Makuuchi , Kazuma Ogawa , Akira Hamamatsu
IPC分类号： G01N21/88 , G01N21/94 , G01N21/95
摘要： The present invention provides an inspection device that is capable of detecting foreign matter with high accuracy, the inspection device including: a light source; an electro-optic element on which light from the light source is incident and which changes a phase of the light into at least two states; and a controller. The controller corrects a phase fluctuation of the electro-optic element itself, using intensity modulation characteristics of the eletro-optic element which are obtained by changing an applied voltage that is input to the electro-optic element.

4. 发明授权

US09568439B2 Defect inspection device and defect inspection method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US09568439B2
公开(公告)日：2017-02-14
申请号：US15088673
申请日：2016-04-01
申请人： Hitachi High-Technologies Corporation
发明人： Toshifumi Honda , Yuta Urano , Takahiro Jingu , Akira Hamamatsu
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956 , G01J1/04
CPC分类号： G01N21/8806 , G01J1/0474 , G01J1/44 , G01N21/9501 , G01N21/956 , G01N2201/06113 , G01N2201/068 , G01N2201/0683 , G01N2201/0697 , G01N2201/10 , G01N2201/12
摘要： To detect an infinitesimal defect, highly precisely measure the dimensions of the detect, a detect inspection device is configured to comprise: a irradiation unit which irradiate light in a linear region on a surface of a sample; a detection unit which detect light from the linear region; and a signal processing unit which processes a signal obtained by detecting light and detecting a defect. The detection unit includes: an optical assembly which diffuses the light from the sample in one direction and forms an image in a direction orthogonal to the one direction; and a detection assembly having an array sensor in which detection pixels are positioned two-dimensionally, which detects the light diffused in the one direction and imaged in the direction orthogonal to the one direction, adds output signals of each of the detection pixels aligned in the direction in which the light is diffused, and outputs same.
摘要翻译：为了检测无限小的缺陷，高度精确地测量检测器的尺寸，检测检查装置被配置为包括：照射单元，其照射样品表面上的线性区域中的光; 检测单元，其检测来自所述线性区域的光; 以及处理通过检测光而获得的信号并检测缺陷的信号处理单元。检测单元包括：光学组件，其在一个方向上扩散来自样品的光并在与该一个方向正交的方向上形成图像; 以及检测组件，其具有阵列传感器，其中检测像素被二维地定位，其检测沿与所述一个方向正交的方向成像的沿所述一个方向扩散的光，并将每个所述检测像素的输出信号相加光漫射的方向，并输出。

5. 发明授权

US09329136B2 Defect inspection device and defect inspection method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US09329136B2
公开(公告)日：2016-05-03
申请号：US14396908
申请日：2013-04-24
申请人： Hitachi High-Technologies Corporation
发明人： Toshifumi Honda , Yuta Urano , Takahiro Jingu , Akira Hamamatsu
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956 , G01J1/04
CPC分类号： G01N21/8806 , G01J1/0474 , G01J1/44 , G01N21/9501 , G01N21/956 , G01N2201/06113 , G01N2201/068 , G01N2201/0683 , G01N2201/0697 , G01N2201/10 , G01N2201/12
摘要： To detect an infinitesimal defect, highly precisely measure the dimensions of the detect, a detect inspection device is configured to comprise: a irradiation unit which irradiate light in a linear region on a surface of a sample; a detection unit which detect light from the linear region; and a signal processing unit which processes a signal obtained by detecting light and detecting a defect. The detection unit includes: an optical assembly which diffuses the light from the sample in one direction and forms an image in a direction orthogonal to the one direction; and a detection assembly having an array sensor in which detection pixels are positioned two-dimensionally, which detects the light diffused in the one direction and imaged in the direction orthogonal to the one direction, adds output signals of each of the detection pixels aligned in the direction in which the light is diffused, and outputs same.
摘要翻译：为了检测无限小的缺陷，高度精确地测量检测器的尺寸，检测检查装置被配置为包括：照射单元，其照射样品表面上的线性区域中的光; 检测单元，其检测来自所述线性区域的光; 以及处理通过检测光而获得的信号并检测缺陷的信号处理单元。检测单元包括：光学组件，其在一个方向上扩散来自样品的光并在与该一个方向正交的方向上形成图像; 以及检测组件，其具有阵列传感器，其中检测像素被二维地定位，其检测沿与所述一个方向正交的方向成像的沿所述一个方向漫射的光，并将每个所述检测像素的输出信号相加，光漫射的方向，并输出。

6. 发明授权

US09228960B2 Defect inspecting method and defect inspecting apparatus 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US09228960B2
公开(公告)日：2016-01-05
申请号：US14154612
申请日：2014-01-14
申请人： Hitachi High-Technologies Corporation
发明人： Toshiyuki Nakao , Shigenobu Maruyama , Akira Hamamatsu , Yuta Urano
IPC分类号： G01N21/00 , G01N21/95 , G01N21/88 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8809 , G01N2021/8848 , H01L22/12
摘要： A defect inspecting method and apparatus for inspecting a surface state including a defect on a wafer surface, in which a polarization state of a laser beam irradiated onto the wafer surface is connected into a specified polarization state, the converted laser beam having the specified polarization state is inserted onto the wafer surface, and a scattering light occurring from an irradiated region where the laser beam having the specified polarization state is irradiated, is separated into a first scattering light occurring due to a defect on the wafer and a second scattering light occurring due to a surface roughness on the wafer. An optical element for optical path division separates the first and second scattering lights approximately at the same time.
摘要翻译：一种用于检查包括晶片表面上的缺陷的表面状态的缺陷检查方法和装置，其中照射到晶片表面的激光束的偏振状态连接到指定的偏振状态，具有指定偏振态的转换的激光束被插入到晶片表面上，并且从照射具有指定的偏振状态的激光束的照射区域发射的散射光被分离为由于晶片上的缺陷而发生的第一散射光和由于正在发生的第二散射光达到晶片上的表面粗糙度。用于光路分割的光学元件大致同时分开第一和第二散射光。

7. 发明授权

US08755041B2 Defect inspection method and apparatus 有权
标题翻译：缺陷检查方法和装置
公开(公告)号：US08755041B2
公开(公告)日：2014-06-17
申请号：US13846441
申请日：2013-03-18
申请人： Hitachi High-Technologies Corporation
发明人： Yuta Urano , Akira Hamamatsu , Shunji Maeda , Kaoru Sakai
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus is provided to compare images of regions, corresponding to each other, of patterns that are formed so as to be identical and judge that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.
摘要翻译：提供了一种图案检查装置，用于将形成为相同的图案的彼此对应的区域的图像进行比较，并判断图像中的非重合部分是缺陷。图案检查装置配备有图像比较部，其在特征空间中绘制检查对象图像的各个像素，并且将特征空间中的过度偏离的点作为缺陷进行检测。即使图像中的相同图案由于晶片上形成的膜的厚度差而具有亮度差，因此也可以正确地检测缺陷。

8. 发明授权

US10261027B2 Inspection device 有权
公开(公告)号：US10261027B2
公开(公告)日：2019-04-16
申请号：US15569503
申请日：2015-05-26
申请人： Hitachi High-Technologies Corporation
发明人： Yoshio Kimoto , Akira Hamamatsu
IPC分类号： G01N21/47 , G01N21/88 , G01N21/95
摘要： Proposed is an inspection device that is provided with: an illuminating optical unit that irradiates a discretionary region of a sample with light; a control unit that gives instructions to the illuminating optical unit; and at least one detection unit that detects light transmitted from the sample. The illuminating optical unit includes a light source unit that generates light, and an electrooptic element unit to which the light generated by the light source unit is inputted, and on the basis of the instructions given from the control unit, the electrooptic element unit adjusts the light to be in a desired polarization state, said light having been generated by the light source unit, and irradiates the sample with the light.

9. 发明申请

US20160216217A1 DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD 审中-公开
公开(公告)号：US20160216217A1
公开(公告)日：2016-07-28
申请号：US15088673
申请日：2016-04-01
申请人： Hitachi High-Technologies Corporation
发明人： Toshifumi Honda , Yuta Urano , Takahiro Jingu , Akira Hamamatsu
IPC分类号： G01N21/95 , G01N21/956
CPC分类号： G01N21/8806 , G01J1/0474 , G01J1/44 , G01N21/9501 , G01N21/956 , G01N2201/06113 , G01N2201/068 , G01N2201/0683 , G01N2201/0697 , G01N2201/10 , G01N2201/12
摘要： To detect an infinitesimal defect, highly precisely measure the dimensions of the detect, a detect inspection device is configured to comprise: a irradiation unit which irradiate light in a linear region on a surface of a sample; a detection unit which detect light from the linear region; and a signal processing unit which processes a signal obtained by detecting light and detecting a defect. The detection unit includes: an optical assembly which diffuses the light from the sample in one direction and forms an image in a direction orthogonal to the one direction; and a detection assembly having an array sensor in which detection pixels are positioned two-dimensionally, which detects the light diffused in the one direction and imaged in the direction orthogonal to the one direction, adds output signals of each of the detection pixels aligned in the direction in which the light is diffused, and outputs same.

10. 发明申请

US20150062581A1 DEFECT INSPECTION APPARATUS AND DEFECT INSPECTION METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20150062581A1
公开(公告)日：2015-03-05
申请号：US14331681
申请日：2014-07-15
申请人： Hitachi High-Technologies Corporation
发明人： Yuta Urano , Taketo Ueno , Akira Hamamatsu , Toshifumi Honda
IPC分类号： G01N21/88 , G01N21/27 , G01N21/21
CPC分类号： G01N21/8806 , G01N21/21 , G01N21/9501 , G01N21/956 , G01N2021/8845 , G01N2021/8848
摘要： A defect inspection apparatus includes: a seed light generator including a pulse signal generator that generates a pulse signal and a polarization modulator that outputs pulse light of any one of two polarization states orthogonal to each other in synchronization with the pulse signal output from the pulse signal generator; a wavelength converting unit including a branching mechanism that branches the pulse light output by the polarization modulator of the seed light generator using polarization and a converting unit that wavelength-converts the pulse light branched by the branching mechanism into beams of two different wavelengths, respectively; an illumination optical system that illuminates a surface of an inspected target material with the beams of the two different wavelengths converted by the wavelength converting unit; a detection optical system including a detecting unit that detects light generated by the beams of the two different wavelengths illuminated by the illumination optical system; and a signal processing system including a distributor that distributes a signal based on the light detected by the detecting unit of the detection optical system for each wavelength, on the basis of the pulse signal output from the pulse signal generator, and a defect determining unit that processes a signal based on the light distributed by the distributor and determines a defect.
摘要翻译：缺陷检查装置包括：种子光发生器，包括产生脉冲信号的脉冲信号发生器和输出与从脉冲信号输出的脉冲信号同步的彼此正交的两个极化状态中的任一个的脉冲光的偏振调制器发电机; 波长转换单元，其包括分支机构，其使用偏振的种子发光器的偏振调制器输出的脉冲光分支;以及转换单元，其将分支机构分支的脉冲光分别波长转换为两个不同波长的波束; 照明光学系统，其利用由波长转换单元转换的两个不同波长的光束照射被检查目标材料的表面; 检测光学系统，包括检测单元，其检测由照明光学系统照射的两个不同波长的光束产生的光; 以及信号处理系统，其包括分配器，其基于从所述脉冲信号发生器输出的脉冲信号，基于由所述检测光学系统的检测单元为每个波长检测到的光分布信号;以及缺陷确定单元，基于分配器分布的光处理信号并确定缺陷。

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