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1. 发明授权

US11442024B2 Defect classification device, inspection device, and inspection system 有权
公开(公告)号：US11442024B2
公开(公告)日：2022-09-13
申请号：US16642948
申请日：2017-09-11
申请人： Hitachi High-Technologies Corporation
发明人： Takanori Kondo , Toshifumi Honda , Akira Hamamatsu , Hideo Ota , Yoshio Kimoto
IPC分类号： G01N21/95 , G01N21/956
摘要： In order to prevent an erroneous determination of an on-film defect, the sensitivity of the post-inspection is reduced so that a film swelling due to a minute defect would not be detected. Classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling, by performing a coordinate correction on the result of a post-inspection by an actual-defect fine alignment using the result of a pre-inspection performed with two-stage thresholds, and by checking defects against each other. In addition, classification is performed to determine whether a defect is at least one of an on-film defect and a film swelling by, during the post-inspection, preparing instruction data from information of the refractive index and thickness of a film formed on a wafer and comparing the instruction data with a signal intensity ratio of a detection system.

2. 发明授权

US09366625B2 Surface measurement device 有权
标题翻译：表面测量装置
公开(公告)号：US09366625B2
公开(公告)日：2016-06-14
申请号：US14376479
申请日：2013-01-16
申请人： Hitachi High-Technologies Corporation
发明人： Masaaki Ito , Takahiro Jingu , Takanori Kondo
IPC分类号： G01B11/30 , G01N21/55 , G01N21/95 , G01N33/00 , H01L21/66
CPC分类号： G01N21/55 , G01B11/303 , G01N21/8851 , G01N21/9501 , G01N33/00 , G01N2033/0095 , H01L22/12
摘要： In conventional technologies in surface measurement and defect inspection, considerations are not made for the following points: (1) coarseness of resolution of spatial frequency; (2) variation of detection signal resulting from anisotropy of microroughness; and (3) variation of background signal resulting from anisotropy of microroughness. The present invention is characterized by acquiring a feature quantity about the anisotropy of the microroughness of the substrate surface. Further, the present invention is characterized by acquiring a surface state in consideration of the anisotropy of the microroughness of the substrate surface. Further the present invention is characterized by detecting a defect over the substrate in consideration of the anisotropy of the microroughness of the substrate surface.
摘要翻译：在表面测量和缺陷检测的常规技术中，不考虑以下几点：（1）空间频率分辨率的粗糙度; （2）由微粗糙度的各向异性产生的检测信号的变化; 和（3）由微粗糙度的各向异性产生的背景信号的变化。本发明的特征在于获取关于基底表面的微粗糙度的各向异性的特征量。此外，本发明的特征在于考虑到基板表面的微粗糙度的各向异性来获取表面状态。此外，本发明的特征在于考虑到衬底表面的微粗糙度的各向异性，检测衬底上的缺陷。

3. 发明授权

US09823065B2 Surface measurement apparatus 有权
公开(公告)号：US09823065B2
公开(公告)日：2017-11-21
申请号：US14759798
申请日：2014-01-10
申请人： Hitachi High-Technologies Corporation
发明人： Takanori Kondo , Takahiro Jingu , Masaaki Ito , Masami Ikota
IPC分类号： G01B11/30 , G01Q60/24 , G01B11/24 , H01L21/66
CPC分类号： G01B11/303 , G01B11/24 , G01B2210/56 , G01Q60/24 , H01L22/12 , H01L22/20
摘要： The invention discloses a technique that estimates micro roughness from a total sum of detection signals from plural detection systems and signal ratios, using a light scattering method. The technique rotates and translates a wafer at high speed to measure the entire surface of the wafer with high throughput. The relationship between the micro roughness and the intensity of scattered light varies according to a material of the wafer and a film thickness thereof. Moreover, calibration of an apparatus is also necessary. Thus, for instance, the invention provides a technique that has a function of correcting an optically acquired detection result using a sample which is substantially the same as a measurement target and makes the optically acquired detection result come close to a result measured by an apparatus, such as an AFM, using a different measurement principle.

4. 发明申请

US20140375988A1 SURFACE MEASUREMENT DEVICE 有权
标题翻译：表面测量装置
公开(公告)号：US20140375988A1
公开(公告)日：2014-12-25
申请号：US14376479
申请日：2013-01-16
申请人： Hitachi High-Technologies Corporation
发明人： Masaaki Ito , Takahiro Jingu , Takanori Kondo
IPC分类号： G01N21/55 , G01N33/00
CPC分类号： G01N21/55 , G01B11/303 , G01N21/8851 , G01N21/9501 , G01N33/00 , G01N2033/0095 , H01L22/12
摘要： In conventional technologies in surface measurement and defect inspection, considerations are not made for the following points: (1) coarseness of resolution of spatial frequency; (2) variation of detection signal resulting from anisotropy of microroughness; and (3) variation of background signal resulting from anisotropy of microroughness. The present invention is characterized by acquiring a feature quantity about the anisotropy of the microroughness of the substrate surface. Further, the present invention is characterized by acquiring a surface state in consideration of the anisotropy of the microroughness of the substrate surface. Further the present invention is characterized by detecting a defect over the substrate in consideration of the anisotropy of the microroughness of the substrate surface.
摘要翻译：在表面测量和缺陷检测的常规技术中，不考虑以下几点：（1）空间频率分辨率的粗糙度; （2）由微粗糙度的各向异性产生的检测信号的变化; 和（3）由微粗糙度的各向异性产生的背景信号的变化。本发明的特征在于获取关于基底表面的微粗糙度的各向异性的特征量。此外，本发明的特征在于考虑到基板表面的微粗糙度的各向异性来获取表面状态。此外，本发明的特征在于考虑到衬底表面的微粗糙度的各向异性，检测衬底上的缺陷。

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