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1. 发明授权

US10522320B2 Charged particle beam device and method for adjusting charged particle beam device 有权
公开(公告)号：US10522320B2
公开(公告)日：2019-12-31
申请号：US16088880
申请日：2016-03-28
申请人： Hitachi High-Technologies Corporation
发明人： Tomohiko Ogata , Masaki Hasegawa , Hisaya Murakoshi , Katsunori Onuki , Noriyuki Kaneoka
IPC分类号： H01J37/147 , H01J37/29 , H01J37/05 , H01J37/04 , H01J37/22
摘要： The objective of the present invention is to propose a charged particle beam device with which an imaging optical system and an irradiation optical system can be adjusted with high precision. In order to achieve this objective, provided is a charged particle beam device comprising: a first charged particle column which serves as an irradiation optical signal; a deflector that deflects charged particles which have passed through the inside of the first charged particle column toward an object; and a second charged particle column which serves as an imaging optical system. The charged particle beam device is provided with: a light source that emits light toward the object; and a control device that obtains, on the basis of detection charged particles generated according to irradiation of light emitted from the light source, a plurality of deflection signals which maintain a certain deflection state, and that selects or calculates, from the plurality of deflection signals or from relationship information produced from the plurality of deflection signals, a deflection signal that satisfies a predetermined condition.

2. 发明授权

US10290522B2 Conductive interface system between vacuum chambers in a charged particle beam device 有权
公开(公告)号：US10290522B2
公开(公告)日：2019-05-14
申请号：US14893669
申请日：2014-03-19
申请人： Hitachi High-Technologies Corporation
发明人： Masashi Fujita , Masahiro Tsunoda , Katsunori Onuki , Katsuya Aibara , Seiichi Shindo , Takaaki Nishimori
IPC分类号： H01L21/67 , H01J37/16 , H01J37/09 , H01J37/18
摘要： An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber (111) having an opening (104) that surrounds a sample delivery path is proposed. The charged particle beam device includes a conductive material (118) surrounding the opening (104) for conduction between the vacuum chamber (111) and a conductive member (106) disposed on the atmosphere side. According to an embodiment of the present invention, it is possible to restrict an electromagnetic wave (117) from reaching the sample chamber via the delivery path.

3. 发明授权

US11515121B2 Electron beam device 有权
公开(公告)号：US11515121B2
公开(公告)日：2022-11-29
申请号：US16660152
申请日：2019-10-22
申请人： Hitachi High-Technologies Corporation
发明人： Tomohiko Ogata , Hisaya Murakoshi , Masaki Hasegawa , Noriyuki Kaneoka , Katsunori Onuki
IPC分类号： H01J37/29 , H01J37/22 , H01J37/20 , H01J37/10 , H01J37/05 , H01J37/26
摘要： In an electron beam device provided with two columns including an irradiation optical system and an imaging optical system, a photoelectron image for use in adjusting the irradiation optical system is made sharper. The electron beam device includes: an irradiation optical system which irradiates a sample placed on a stage with an electron beam; a light irradiation unit 50 which irradiates the sample with light containing ultraviolet rays; a sample voltage control unit 44 which applies a negative voltage to the sample so that, before the electron beam reaches the sample, the electron orbit inverts; and an imaging optical system which acquires a mirror electron image by forming an image of mirror electrons reflected by application of the negative voltage. In the electron beam device, the imaging optical system includes a sensor 32 which obtains a mirror electron image and a stray light suppression part 27 which is provided between the sensor and the stage 31 and which suppresses reaching the sensor of the light emitted from the light irradiation unit.

4. 发明申请

US20140339425A1 SCANNING ELECTRON BEAM DEVICE AND DIMENSION MEASUREMENT METHOD USING SAME 有权
标题翻译：扫描电子束装置和尺寸测量方法
公开(公告)号：US20140339425A1
公开(公告)日：2014-11-20
申请号：US14364392
申请日：2012-11-26
申请人： Hitachi High-technologies Corporation
发明人： Tasuku Yano , Yasunari Sohda , Muneyuki Fukuda , Katsunori Onuki , Hajime Kawano , Naomasa Suzuki
IPC分类号： G01B15/00 , H01J37/244 , H01J37/21
CPC分类号： G01B15/00 , G01B2210/56 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/20 , H01J2237/281 , H01L22/12
摘要： A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for placing a wafer (16); and a controller (15); wherein the stage can be raised and lowered. In the low acceleration voltage region, the controller performs rough adjustment and fine adjustment of the focus in relation to the variation in the height of the wafer using electromagnetic focusing performed through excitation current adjustment of the objective lens. In the high acceleration voltage region, the controller performs rough adjustment of the focus in relation to the variation in the height of the wafer by mechanical focusing performed through raising and lowering of the stage, and performs fine adjustment by electrostatic focusing performed through adjustment of the retarding voltage. It thereby becomes possible to provide a scanning electron beam device that measures, in a highly accurate manner, both the upper part and the bottom part of a groove or a hole having a high aspect ratio.
摘要翻译：一种扫描电子束装置，具有：用于偏转从电子源（1）发射的电子束（17）的偏转器（5）。用于使电子束会聚的物镜（7）; 延迟电极; 用于放置晶片（16）的平台（9）; 和控制器（15）; 其中可以升高和降低载物台。在低加速度电压区域中，控制器使用通过物镜的激励电流调节执行的电磁聚焦，相对于晶片的高度变化而进行粗略调整和微调。在高加速电压区域中，控制器通过机架上升和下降进行机械聚焦，进行相对于晶片高度变化的聚焦的粗略调整，通过调整延迟电压。从而可以提供一种以高度准确的方式测量具有高纵横比的凹槽或孔的上部和底部两者的扫描电子束装置。

5. 发明授权

US11107655B2 Charged particle beam device 有权
公开(公告)号：US11107655B2
公开(公告)日：2021-08-31
申请号：US16645649
申请日：2017-09-20
申请人： Hitachi High-Technologies Corporation
发明人： Tomohiko Ogata , Masaki Hasegawa , Katsunori Onuki , Noriyuki Kaneoka , Hisaya Murakoshi
IPC分类号： H01J37/24 , H01J37/244 , H01J37/22
摘要： In order to optimize defect contrast in a charged particle beam device that inverts charged particles directly above a sample and observes the electrons, this charged particle beam device is provided with a charged particle source, an electron gun control device which applies a first voltage to the charged particle source, a substrate voltage control device which applies a second voltage to a sample, an image forming optical system which includes an imaging lens for imaging charged particles incident from the direction of the sample, a detector which includes a camera for detecting the charged particles, and an image processing device which processes the detected signal, wherein the imaging optical system is configured so as not to image secondary electrons emitted from the sample, but forms an image with mirror electrons bounced back by the electric field formed on the sample by means of the potential difference between the first and the second voltages. The image processing device generates a control signal for controlling the potential difference on the basis of the acquired signal, and optimizes defect contrast by controlling the reflection surface of the mirror electrons.

6. 发明授权

US10056226B2 Charged particle beam apparatus and vibration damper for charged particle beam apparatus 有权
公开(公告)号：US10056226B2
公开(公告)日：2018-08-21
申请号：US15440327
申请日：2017-02-23
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Motohiro Takahashi , Yoshimasa Fukushima , Katsunori Onuki , Tetsuya Niibori
IPC分类号： H01J1/18 , H01J37/20 , H01J37/26
CPC分类号： H01J37/20 , H01J37/16 , H01J37/261 , H01J2237/0216
摘要： There is proposed a column supporting structure that includes a viscoelastic sheet, a supporting plate which holds the viscoelastic sheet, and a fixation portion which connects the supporting plate to each lens barrel. The viscoelastic sheet is disposed to extend in a plane perpendicular to one lens barrel or the other lens barrel.

7. 发明授权

US09644955B2 Scanning electron beam device with focus adjustment based on acceleration voltage and dimension measurement method using same 有权
公开(公告)号：US09644955B2
公开(公告)日：2017-05-09
申请号：US14364392
申请日：2012-11-26
申请人： Hitachi High-Technologies Corporation
发明人： Tasuku Yano , Yasunari Sohda , Muneyuki Fukuda , Katsunori Onuki , Hajime Kawano , Naomasa Suzuki
IPC分类号： H01J37/28 , G01B15/00 , H01J37/21 , H01L21/66 , H01J37/244
CPC分类号： G01B15/00 , G01B2210/56 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/20 , H01J2237/281 , H01L22/12
摘要： A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for placing a wafer (16); and a controller (15); wherein the stage can be raised and lowered. In the low acceleration voltage region, the controller performs rough adjustment and fine adjustment of the focus in relation to the variation in the height of the wafer using electromagnetic focusing performed through excitation current adjustment of the objective lens. In the high acceleration voltage region, the controller performs rough adjustment of the focus in relation to the variation in the height of the wafer by mechanical focusing performed through raising and lowering of the stage, and performs fine adjustment by electrostatic focusing performed through adjustment of the retarding voltage. It thereby becomes possible to provide a scanning electron beam device that measures, in a highly accurate manner, both the upper part and the bottom part of a groove or a hole having a high aspect ratio.

8. 发明申请

US20140042338A1 STAGE APPARATUS AND CHARGED PARTICLE BEAM APPARATUS 审中-公开
标题翻译：阶段装置和充电颗粒光束装置
公开(公告)号：US20140042338A1
公开(公告)日：2014-02-13
申请号：US13789588
申请日：2013-03-07
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Nobuo Shibata , Masahiro Koyama , Hironori Ogawa , Katsunori Onuki , Hiroyuki Kitsunai , Shuichi Nakagawa , Masaki Mizuochi , Satoru Okabe
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , H01J37/244 , H01J37/3005 , H01J2237/2445 , H01J2237/24578
摘要： A stage apparatus includes a column for irradiating a sample with a charged particle beam, a vacuum sample chamber to which the column is attached, moving tables disposed in the vacuum sample chamber to move the sample relatively to the column, and position detectors for detecting positions of the moving tables. The stage apparatus includes an attachment member disposed between the column and the vacuum sample chamber. The attachment member has an opening which restricts movement of the column in a same direction as directions of the moving tables. Reference mirrors in the position detectors for detecting the positions of the tables are attached to the attachment member. Each of the reference mirrors has an adjustment apparatus to adjust a relative angle between the reference mirror and the laser beam.
摘要翻译：舞台装置包括用于用带电粒子束照射样品的柱，附着有柱的真空样品室，设置在真空样品室中的移动台，使样品相对于柱移动，以及位置检测器，用于检测位置的移动桌。舞台装置包括设置在柱和真空样品室之间的附接构件。附接构件具有开口，该开口限制柱在与移动台的方向相同的方向上的移动。用于检测台的位置的位置检测器中的参考镜附接到附接构件。每个参考反射镜具有用于调整参考反射镜和激光束之间的相对角度的调节装置。

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