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    • 10. 发明授权
    • Semiconductor device, semiconductor integrated circuit device for use of driving plasma display with using same, and plasma display apparatus
    • 半导体装置,使用该驱动等离子体显示器的半导体集成电路装置以及等离子体显示装置
    • US08487343B2
    • 2013-07-16
    • US12825839
    • 2010-06-29
    • Shinji ShirakawaJunichi SakanoKenji Hara
    • Shinji ShirakawaJunichi SakanoKenji Hara
    • H01L29/739
    • H01L29/7394H01L29/0696
    • A horizontal-type IGBT having a large current density, which is formed on a SOI substrate, has an emitter region, which is made up with two (2) or more of base-layers of a second conductivity-type on an oxide film groove, wherein the base-layers of the second conductivity-type in the emitter region are covered with a layer of a first conductivity-type, being high in the conductivity than a drift layer, and length of a gate electrode on the oxide film groove is reduced than the length of the gate electrode on the collector, and further the high-density layer of the first conductivity-type is formed below the base layer of the second conductivity-type on the collector, thereby achieving the high density of the layer of the first conductivity-type while maintaining an endurable voltage, and an increase of the current density.
    • 形成在SOI衬底上的具有大电流密度的水平型IGBT具有发射极区域,其在氧化物膜沟槽上由二(2)个或更多个第二导电类型的基底层构成 其特征在于,所述发射极区域中的所述第二导电型的基极层被覆盖有比漂移层高的导电性的第一导电型层,所述氧化物膜沟槽上的栅电极的长度为 比集电体上的栅电极的长度小,并且在集电体上形成第二导电类型的基底层下方的第一导电型高密度层,从而实现层间的高密度化 第一导电型,同时保持耐久电压,并增加电流密度。