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1. 发明申请

US20190107766A1 183 nm CW Laser and Inspection System 审中-公开
公开(公告)号：US20190107766A1
公开(公告)日：2019-04-11
申请号：US16205032
申请日：2018-11-29
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
IPC分类号： G02F1/35 , G02F1/355
CPC分类号： G02F1/353 , G02F1/3501 , G02F1/3551 , G02F1/3558 , G02F2001/3503 , G02F2001/354 , G02F2201/16
摘要： A laser assembly generates continuous wave (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.

2. 发明授权

US10429719B2 183 nm CW laser and inspection system 有权
公开(公告)号：US10429719B2
公开(公告)日：2019-10-01
申请号：US16205032
申请日：2018-11-29
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
IPC分类号： G02F1/35 , G02F1/355
摘要： An inspection system/method in which first optics direct continuous wave (CW) light at 181-185 nm to an inspected article, and second optics redirect image information affected by the article to detectors. A laser assembly generates the CW light by generating fourth harmonic light from first fundamental CW light having a first wavelength between 1 and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and mixing the fifth harmonic light with second light having a second wavelength between 1.26 and 1.82 μm. An external cavity mixes the first light and the fourth harmonic light using a first nonlinear crystal. The CW light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.

3. 发明申请

US20150372446A1 Laser Repetition Rate Multiplier And Flat-Top Beam Profile Generators Using Mirrors And/Or Prisms 有权
标题翻译：激光重复率乘法器和平顶波束轮廓发生器使用镜子和/或棱镜
公开(公告)号：US20150372446A1
公开(公告)日：2015-12-24
申请号：US14596738
申请日：2015-01-14
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Alex Chuang , Xiaoxu Lu , Justin Dianhuan Liou , J. Joseph Armstrong , Yujun Deng , John Fielden
IPC分类号： H01S3/10
CPC分类号： H01S3/10046 , G03F7/70025 , H01S3/005 , H01S3/0071 , H01S3/08004 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10 , H01S3/10061 , H01S2301/20 , H01S2301/203 , H01S2301/206
摘要： A repetition rate (pulse) multiplier includes one or more beam splitters and prisms forming one or more ring cavities with different optical path lengths that delay parts of the energy of each pulse. A series of input laser pulses circulate in the ring cavities and part of the energy of each pulse leaves the system after traversing the shorter cavity path, while another part of the energy leaves the system after traversing the longer cavity path, and/or a combination of both cavity paths. By proper choice of the ring cavity optical path length, the repetition rate of an output series of laser pulses can be made to be a multiple of the input repetition rate. The relative energies of the output pulses can be controlled by choosing the transmission and reflection coefficients of the beam splitters. Some embodiments generate a time-averaged output beam profile that is substantially flat in one dimension.
摘要翻译：重复率（脉冲）乘法器包括一个或多个分束器和棱镜，其形成具有延迟每个脉冲的能量部分的不同光程长度的一个或多个环形腔。一系列输入激光脉冲在环形腔中循环，并且每个脉冲的能量的一部分在穿过较短腔体路径之后离开系统，而另一部分能量在穿过较长腔体路径后离开系统，和/或组合两个腔道。通过适当选择环腔光程长度，激光脉冲的输出系列的重复率可以是输入重复率的倍数。可以通过选择分束器的透射和反射系数来控制输出脉冲的相对能量。一些实施例产生在一个维度上基本上平坦的时间平均的输出光束轮廓。

4. 发明授权

US10175555B2 183 nm CW laser and inspection system 有权
公开(公告)号：US10175555B2
公开(公告)日：2019-01-08
申请号：US15806953
申请日：2017-11-08
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
IPC分类号： G02F1/35 , G02F1/355
摘要： A laser assembly generates continuous wave (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.

5. 发明申请

US20180188633A1 183 nm CW Laser And Inspection System 审中-公开
公开(公告)号：US20180188633A1
公开(公告)日：2018-07-05
申请号：US15806953
申请日：2017-11-08
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Alex Chuang , Xiaoxu Lu , Baigang Zhang , John Fielden , Vladimir Dribinski
IPC分类号： G02F1/35 , G02F1/355
CPC分类号： G02F1/353 , G02F1/3501 , G02F1/3551 , G02F1/3558 , G02F2001/3503 , G02F2001/354
摘要： A laser assembly generates continuous (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.

6. 发明申请

US20170278694A1 High Brightness Laser-Sustained Plasma Broadband Source 有权
公开(公告)号：US20170278694A1
公开(公告)日：2017-09-28
申请号：US15285333
申请日：2016-10-04
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Alex Chuang , Xiaoxu Lu , Justin Liou , John Fielden
IPC分类号： H01J61/02 , H01J61/20 , H05H1/24 , H01J61/16
CPC分类号： H01J61/025 , H01J61/125 , H01J61/16 , H01J61/20 , H01J61/54 , H01J65/04 , H05H1/24
摘要： A high brightness laser-sustained broadband light source includes a gas containment structure and a pump laser configured to generate a pump beam including illumination of a wavelength at least proximate to a weak absorption line of a neutral gas contained in the gas containment structure. The broadband light source includes one or more anamorphic illumination optics configured to focus the pump beam into an approximately elliptical beam waist positioned in or proximate to the center of the gas containment structure. The broadband light source includes one or more first collection optics configured to collect broadband radiation emitted by the plasma in a direction substantially aligned with a longer axis of the elliptical beam waist.

7. 发明授权

US10044166B2 CW DUV laser with improved stability 有权
公开(公告)号：US10044166B2
公开(公告)日：2018-08-07
申请号：US15335266
申请日：2016-10-26
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Chuang , Xiaoxu Lu , John Fielden
IPC分类号： H01S3/109 , G02F1/355 , H01S3/00 , G02F1/35
摘要： A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and a fifth harmonic generator. The fifth harmonic generator module includes a cavity resonant at the fundamental frequency, and combines the fundamental frequency with the third harmonic in a first NLO crystal to generate a fourth harmonic, then combines the fourth harmonic with unconsumed fundamental frequency in a second NLO crystal to generate the fifth harmonic. One or more lenses are used to focus the third and fourth harmonics in the first and second NLO crystals, respectively.

8. 发明申请

US20180114687A1 High Brightness Laser-Sustained Plasma Broadband Source 审中-公开
公开(公告)号：US20180114687A1
公开(公告)日：2018-04-26
申请号：US15842540
申请日：2017-12-14
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Alex Chuang , Xiaoxu Lu , Justin Liou , John Fielden
IPC分类号： H01J61/02 , H01J61/16 , H01J61/20 , H05H1/24
CPC分类号： H01J61/025 , H01J61/125 , H01J61/16 , H01J61/20 , H01J61/54 , H01J65/04 , H05H1/24
摘要： A high brightness laser-sustained broadband light source includes a gas containment structure and a pump laser configured to generate a pump beam including illumination of a wavelength at least proximate to a weak absorption line of a neutral gas contained in the gas containment structure. The broadband light source includes one or more anamorphic illumination optics configured to focus the pump beam into an approximately elliptical beam waist positioned in or proximate to the center of the gas containment structure. The broadband light source includes one or more first collection optics configured to collect broadband radiation emitted by the plasma in a direction substantially aligned with a longer axis of the elliptical beam waist.

9. 发明授权

US09865447B2 High brightness laser-sustained plasma broadband source 有权
公开(公告)号：US09865447B2
公开(公告)日：2018-01-09
申请号：US15285333
申请日：2016-10-04
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Alex Chuang , Xiaoxu Lu , Justin Liou , John Fielden
IPC分类号： H01J61/16 , H01L21/48 , H01J61/02 , H01J61/20 , H05H1/24
CPC分类号： H01J61/025 , H01J61/125 , H01J61/16 , H01J61/20 , H01J61/54 , H01J65/04 , H05H1/24
摘要： The broadband light source includes a gas containment structure and a pump laser for generating a pump beam including illumination of a wavelength near that of a weak absorption line of a neutral gas contained in the gas containment structure. The broadband light source also includes anamorphic optics for focusing the pump beam into an elliptical beam waist positioned in or near the center of the gas containment structure. The broadband light source also includes collection optics for collecting broadband radiation emitted by the plasma in a direction aligned with a longer axis of the elliptical beam waist.

10. 发明授权

US09509112B2 CW DUV laser with improved stability 有权
标题翻译： CW DUV激光器具有改进的稳定性
公开(公告)号：US09509112B2
公开(公告)日：2016-11-29
申请号：US14294019
申请日：2014-06-02
申请人： KLA-Tencor Corporation
发明人： Yung-Ho Chuang , Xiaoxu Lu , John Fielden
IPC分类号： H01S3/109 , H01S3/00 , G02F1/355 , G02F1/35
CPC分类号： H01S3/109 , G02F1/353 , G02F1/3534 , G02F1/3558 , G02F2001/3507 , G02F2001/354 , G02F2201/17 , G02F2203/15 , H01S3/0092
摘要： A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more periodically poled non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and one of a fourth harmonic generator module and a fifth harmonic generator. The fourth harmonic generator module includes a cavity resonant at the fundamental frequency configured to combine the fundamental frequency with the third harmonic to generate a fourth harmonic. The fourth harmonic generator module includes either a cavity resonant at the fundamental frequency for combining the fundamental frequency with the third harmonic to generate a fifth harmonic, or a cavity resonant at the second harmonic frequency for combining the second harmonic and the third harmonic to generate the fifth harmonic.
摘要翻译：深紫外（DUV）连续波（CW）激光器包括配置为产生具有在约1μm和1.1μm之间的相应波长的基频的基本CW激光器;三次谐波发生器模块，包括一个或多个周期性极化非线性产生三次谐波和可选的二次谐波的线性光学（NLO）晶体，以及四次谐波发生器模块和五次谐波发生器之一。第四谐波发生器模块包括在基频处谐振的腔体，其被配置为将基频与三次谐波组合以产生第四谐波。第四谐波发生器模块包括在基频处共振的腔体，用于将基频与三次谐波组合以产生五次谐波，或者在二次谐波频率下共振谐振以组合二次谐波和三次谐波，以产生五次谐波。

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